scholarly journals Interaction of Long Time Pulses of an Nd3+:YAG Laser Beam with the Heusler AlloyNi45Co5Mn35.5In14.5

Materials ◽  
2021 ◽  
Vol 14 (22) ◽  
pp. 7016
Author(s):  
Patryk Ciupak ◽  
Artur Barłowski ◽  
Piotr Sagan ◽  
Tadeusz Jasiński ◽  
Marian Kuzma
Keyword(s):  
Laser Radiation ◽  
Laser Processing ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Bulk Sample ◽  
Laser Interaction ◽  
Yag Laser ◽  
Long Time ◽  
Layer Sample ◽  
Melting Threshold

In this paper, the laser processing of the surface of bulk and layered samples (of thickness 75 nm) of Ni45Co5Mn35.5In14.5 alloy (NC5MI) was investigated using microsecond laser pulses. A Q-switched pulsed Nd3+:YAG laser, operating in the 1st harmonic (which had a wavelength of 1064 nm) with a pulse duration of 250 µs, was used. NC5MI is a metal resistant to thermal laser processing because its reflection coefficient is close to unity for long wavelengths. The aim of this paper was to learn the forms of laser processing (heating, microprocessing, ablation) for which the above-specified type of laser is useful. The samples were irradiated with various fluences in the interval of 5–32 J·cm−2. The effect of the laser interaction with the surface was explored by SEM microscopy. The threshold fluences for the bulk sample were determined as: the visible damage threshold (Fthd = 2 ± 0.2 J·cm−2), the melting threshold (Fthm = 10 ± 0.5 J·cm−2), and the deep melting threshold (Fthdm = 32 J·cm−2). Unexpectedly, these values wereincreased for the layer sample due to its silicon substrate. We have concluded that this type of laser radiation is advantageous for the annealing and melting of, or drilling holes in, the alloy, but disadvantageousto the ablation of the alloy.

Excimer Laser Interaction with Metals

1992 ◽  
Vol 285 ◽  
Author(s):  
W.W. Duley ◽  
G. Kinsman
Keyword(s):  
Experimental Data ◽  
Laser Radiation ◽  
Excimer Laser ◽  
Metal Surfaces ◽  
Laser Pulses ◽  
Radiative Properties ◽  
Uv Laser ◽  
Laser Interaction ◽  
Excimer Laser Radiation

ABSTRACTExcimer laser radiation may be used to process metal surfaces in a variety of novel ways. The simplest of these involves the use of UV laser pulses for ablation. Ablation occurs as the result of both vaporization and hydrodynamical effects. Experimental data related to these processes will be discussed. In addition, it will be shown how specific irradiation regimes can yield metal surfaces with unique radiative properties.

scholarly journals Sequences of Sub-Microsecond Laser Pulses for Material Processing: Modeling of Coupled Gas Dynamics and Heat Transfer

2019 ◽  
Vol 9 (22) ◽  
pp. 4785
Author(s):  
Gusarov ◽  
Kovalev
Keyword(s):  
Heat Transfer ◽  
Laser Radiation ◽  
Laser Processing ◽  
Gas Dynamics ◽  
Optical Breakdown ◽  
Single Pulse ◽  
Laser Pulses ◽  
High Repetition Rate ◽  
Heat Accumulation ◽  
Pulse Separation

Multipulse laser processing of materials is promising because of the additional possibilities to control the thickness of the treated and the heat-affected zones and the energy efficiency. To study the physics of mutual interaction of pulses at high repetition rate, a model is proposed where heat transfer in the target and gas-dynamics of vapor and ambient gas are coupled by the gas-dynamic boundary conditions of evaporation/condensation. Numerical calculations are accomplished for a substrate of an austenitic steel subjected to a 300 ns single pulse of CO2 laser and a sequence of the similar pulses with lower intensity and 10 μs inter-pulse separation assuring approximately the same thermal impact on the target. It is revealed that the pulses of the sequence interact due to heat accumulation in the target but they cannot interact through the gas phase. Evaporation is considerably more intensive at the single-pulse processing. The vapor is slightly ionized and absorbs the infrared laser radiation by inverse bremsstrahlung. The estimated absorption coefficient and the optical thickness of the vapor domain are considerably greater for the single-pulse regime. The absorption initiates optical breakdown and the ignition of plasma shielding the target from laser radiation. The multipulse laser processing can be applied to avoid plasma ignition.

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals Laser-induced damage thresholds of ultrathin targets and their constraint on laser contrast in laser-driven ion acceleration experiments

2020 ◽  
Vol 8 ◽  
Author(s):  
Dahui Wang ◽  
Yinren Shou ◽  
Pengjie Wang ◽  
Jianbo Liu ◽  
Zhusong Mei ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Wide Band ◽  
Laser Pulses ◽  
Laser Damage Threshold ◽  
Single Shot ◽  
Bulk Materials ◽  
Free Standing ◽  
Wide Band Gap ◽  
Different Types ◽  
Laser Induced Damage

Abstract Single-shot laser-induced damage threshold (LIDT) measurements of multi-type free-standing ultrathin foils were performed in a vacuum environment for 800 nm laser pulses with durations τ ranging from 50 fs to 200 ps. The results show that the laser damage threshold fluences (DTFs) of the ultrathin foils are significantly lower than those of corresponding bulk materials. Wide band gap dielectric targets such as SiN and formvar have larger DTFs than semiconductive and conductive targets by 1–3 orders of magnitude depending on the pulse duration. The damage mechanisms for different types of targets are studied. Based on the measurement, the constrain of the LIDTs on the laser contrast is discussed.

scholarly journals Sputtering of Neutral Molecules and Molecular Ions From the Adenine Crystal Surface Induced by the UV Picosecond Laser Pulse

1982 ◽  
Vol 1 (1) ◽  
pp. 37-43 ◽  
Author(s):  
V. S. Antonov ◽  
V. S. Letokhov ◽  
Yu. A. Matveyets ◽  
A. N. Shibanov
Keyword(s):  
Laser Radiation ◽  
Kinetic Energy ◽  
Crystal Surface ◽  
Picosecond Laser ◽  
Laser Pulses ◽  
Molecular Ions ◽  
Laser Radiation Intensity ◽  
Ion Sputtering ◽  
Absorbed Energy ◽  
Picosecond Laser Pulse

This paper presents the results of observation of sputtering of neutral molecules and ions from the crystal adenine surface induced by fourth-harmonic Nd:YAG laser radiation with a pulse duration of 30 ps. The energy fluence of laser pulses was in the region (1–3) × 10−4 J/cm2. The kinetic energy distribution of the sputtered molecules spreads up to 0.7 eV. The experiment shows that the threshold of adenine molecular ion sputtering is connected with absorbed energy density in upper layers of the crystal surface but not by laser radiation intensity.

GENERATION OF ULTRASHORT ELECTRON BUNCHES IN NANOSTRUCTURES BY FEMTOSECOND LASER PULSES

2007 ◽  
Vol 17 (03) ◽  
pp. 571-576
Author(s):  
A. GLADUN ◽  
V. LEIMAN ◽  
A. ARSENIN ◽  
O. MANNOUN ◽  
V. TARAKANOV
Keyword(s):  
Thin Film ◽  
Laser Radiation ◽  
Femtosecond Laser ◽  
Electric Field ◽  
Surface Plasmon ◽  
Laser Pulses ◽  
Photoelectric Effect ◽  
Femtosecond Laser Pulses ◽  
Electron Bunches ◽  
Internal Photoelectric Effect

We present numerical investigation of anomalous internal photoelectric effect which is realized in thin film (< 100 nm) structures by surface plasmon (SP) excitation and its interaction with primary laser radiation. SP electric field gain and electron temperature in the SP field have been calculated.

scholarly journals Laser-Induced Growth of Titanium Nitride Microcolumns on Biased Titanium Targets

2005 ◽  
Vol 20 (1) ◽  
pp. 62-67 ◽  
Author(s):  
E. György ◽  
A. Pérez del Pino ◽  
P. Serra ◽  
J.L. Morenza
Keyword(s):  
Bias Voltage ◽  
Single Pulse ◽  
Laser Pulses ◽  
High Repetition Rate ◽  
Applied Bias ◽  
Applied Bias Voltage ◽  
Surface Microrelief ◽  
High Repetition ◽  
Melting Threshold ◽  
Biased Samples

Titanium targets with a bias voltage ranging from −500 to +500 V were submitted to multipulse high repetition rate Nd:yttrium aluminum garnet (YAG; λ = 1.064 μm, τ ∼ 300 ns, ν = 30 kHz) laser irradiations in nitrogen at intensity values below the single-pulse melting threshold. The morphology of the TiN structures formed under the cumulative action of the laser pulses on the surface of the unbiased and biased targets was investigated by profilometry and scanning electron microscopy. Under these irradiation conditions, a specific columnar surface microrelief developed. The height of the microcolumns reached about 10–15 μm, and their diameter about 1–2 μm. The development of TiN microcolumns was enhanced by the applied bias voltage. The enhancement in the negative biased samples was stronger than that in the positive biased ones.

electromagnetic field at the particl e has to be computed numerically. An example of such a computation using a program based on [49] is given in Fig. 4. But not only doe s the Mie theory describe an enhancement of the laser intensity in the particles' near field, it also predicts that for certain values of the size parameter nd/X (d denoting the particle diameter, À the laser wavelength) the enhancement should be particularly efficient, resulting in a resonant intensity enhancement, the so-called "Mie-resonances". 3.2.2. Near-field induced substrate damage When inspecting contaminated samples by scanning electron microscopy (SEM) or atomic force microscopy (AFM ) after DLC using ns laser pulses, the consequences of the field enhancement process became obvious: all over the cleaned areas w e found substrate damages localized exactly at the former particle positions [35, 37-39]. These damages manifested as melting pools or even holes in the surface, typical examples can be seen in Fig. 5. The consequences for the laser cleaning process are obvious. The intensity enhancement reduces the maximum laser fluence that can be applied in the process. Usually in laser cleaning studies [19, 31 ] the laser fluence corresponding to the melting threshold of a bare surface is taken as the damage threshold fluence. Our experiments show clearly that this is an inadequate definition. Instead one must take into account the enhanced laser fluence underneath the particles, as it will be discussed in Section 4. Fro m the obtained AFM images we were able to analyse in detail the surface profile at the damaged sites. Here we found that for high field enhancement factors the silicon substrate was not only molten , but that some material was even ablated (see Sec. 4). The momentum transfer to the particles during the ablation process significantly contributes to the cleanin g process and hence local substrate ablation

2003 ◽  
pp. 327-330
Keyword(s):  
Laser Fluence ◽  
Near Field ◽  
Particle Diameter ◽  
Surface Profile ◽  
Field Enhancement ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Laser Wavelength ◽  
Laser Cleaning ◽  
Intensity Enhancement
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