scholarly journals Dislocation Loop Generation Differences between Thin Films and Bulk in EFDA Pure Iron under Self-Ion Irradiation at 20 MeV

Metals ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 2000
Author(s):  
Marcelo Roldán ◽  
Fernando José Sánchez ◽  
Pilar Fernández ◽  
Christophe J. Ortiz ◽  
Adrián Gómez-Herrero ◽  
...  

In the present investigation, high-energy self-ion irradiation experiments (20 MeV Fe+4) were performed on two types of pure Fe samples to evaluate the formation of dislocation loops as a function of material volume. The choice of model material, namely EFDA pure Fe, was made to emulate experiments simulated with computational models that study defect evolution. The experimental conditions were an ion fluence of 4.25 and 8.5 × 1015 ions/cm2 and an irradiation temperature of 350 and 450 °C, respectively. First, the ions pass through the samples, which are thin films of less than 100 nm. With this procedure, the formation of the accumulated damage zone, which is the peak where the ions stop, and the injection of interstitials are prevented. As a result, the effect of two free surfaces on defect formation can be studied. In the second type of experiments, the same irradiations were performed on bulk samples to compare the creation of defects in the first 100 nm depth with the microstructure found in the whole thickness of the thin films. Apparent differences were found between the thin foil irradiation and the first 100 nm in bulk specimens in terms of dislocation loops, even with a similar primary knock-on atom (PKA) spectrum. In thin films, the most loops identified in all four experimental conditions were b ±a0<100>{200} type with sizes of hundreds of nm depending on the experimental conditions, similarly to bulk samples where practically no defects were detected. These important results would help validate computational simulations about the evolution of defects in alpha iron thin films irradiated with energetic ions at large doses, which would predict the dislocation nucleation and growth.

1995 ◽  
Vol 408 ◽  
Author(s):  
A. Madhukar ◽  
W. Yu ◽  
R. Viswanathan ◽  
P. Chen

AbstractAn overview is provided of an evolving atomistic and kinetic model of semiconductor growth that unifies the main features of strain relaxation in low and high lattice misfit heteroepitaxy. The model reveals a kinetic pathway for dislocation formation during growth with little or no energy cost at low misfits, thus providing a way out of the longstanding dilemma of too high dislocation nucleation energies predicted by classical theories of the equilibrium behaviour of a fixed number of particles at low misfits. The essential kinetic processes underlying the model are identified on the basis of comparison of the predictions of kinetic Monte-Carlo simulations of growth with real-time or in-situ data obtained in such experiments as reflection high-energy electron diffraction (RHEED) and scanning probe microscopy (SPM). Relative significance of these atomistic kinetic processes is shown to naturally lead to strain relaxation via defect initiation at low misfits while maintaining smooth surface morphology or at high misfits change to 3-dimensional morphology while initially maintaining coherence. The potential role of steps in providing sources for defect formation is examined through molecular dynamics simulations of Ge overlayers on Si (001) stepped surfaces.


1984 ◽  
Vol 36 ◽  
Author(s):  
W. J. Choyke ◽  
J. A. Spitznagel ◽  
N. J. Doyle ◽  
S. Wood ◽  
R. B. Irwin

ABSTRACTThe formation and annealing of buried damage layers in hydrogen implanted N-type float zone <111> silicon has been studied by Rutherford Backscattering/ion channeling and cross-section transmission electron microscopy. Implantation with 50 keV or 75 keV H+ ions was conducted at temperatures of 95K, 300K and 800K at fluences of 2×1017 H+/cm2, 8×1017 H+/cm2 and 1×1018 H+/cm2. Post implantation annealing was conducted at temperatures up to 800K. The results show a temperature dependent transition from a highly hydrogen doped amorphous zone bounded by strongly diffracting (TEM) 2–5 nm diameter defects for implantation at 95K to a crystalline microstructure containing small dislocation loops and ∼40% of the implanted hydrogen for implantation at 300K. Defect production and annealing and hydrogen trapping in the damage zone are shown to depend on the relative implantation and post implantation annealing temperatures.


1997 ◽  
Vol 11 (21n22) ◽  
pp. 981-987
Author(s):  
H. Q. Yin ◽  
T. Arakawa ◽  
Y. Kaneda ◽  
T. Yoshikawa ◽  
N. Haneji ◽  
...  

La 2-x Sr x CuO 4 ultra-thin films with thickness 200 Å were fabricated by pulsed laser deposition method in oxygen ( O 2) atmosphere. The morphology of deposited films was investigated by reflection high energy electron diffraction (RHEED), atomic force microscopy (AFM) and scanning electronic microscopy (SEM). The strong oxygen ambient pressure dependence of film morphology was observed. In high oxygen ambient pressure, the film growth is dominated by island growth mode. The results imply that the experimental conditions of oxygen ambient pressure and substrate temperature are critical for the layer-by-layer growth mode.


2013 ◽  
Vol 24 ◽  
pp. 133-139 ◽  
Author(s):  
Madhavi Thakurdesai ◽  
A. Mahadkar ◽  
Varsha Bhattacharyya

Ion beam irradiation is a unique non-equilibrium technique for phase formation and material modification. Localized rise in temperature and ultra fast (~1012 s) dissipations of impinging energy make it an attractive tool for nanostructure synthesize. Dense electronic excitation induced spatial and temporal confinement of high energy in a narrow dimension leads the system to a highly non-equilibrium state and the system then relaxes dynamically inducing nucleation of nanocrystals along the latent track. In the present investigation, amorphous thin films of TiO2 are irradiated by 100 MeV Ag ion beam. These irradiated thin films are characterized by Atomic Force Microscopy (AFM), Glancing Angle X-ray Diffraction (GAXRD), Transmission Electron Microscopy (TEM) and UV-VIS absorption spectroscopy. AFM and TEM studies indicate formation of circular nanoparticles of size 10±2 nm in a film irradiated at a fluence of 1×1012 ions.cm-2. Nanophase formation is also inferred from the blueshift observed in UV-VIS absorption band edge.


1995 ◽  
Vol 258 (1-2) ◽  
pp. 123-127 ◽  
Author(s):  
H.C. Barshilia ◽  
Somna Sah ◽  
B.R. Mehta ◽  
V.D. Vankar ◽  
D.K. Avasthi ◽  
...  

2002 ◽  
Vol 92 (6) ◽  
pp. 3304-3310 ◽  
Author(s):  
B. Balamurugan ◽  
B. R. Mehta ◽  
D. K. Avasthi ◽  
Fouran Singh ◽  
Akhilesh K. Arora ◽  
...  

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