Effect of Gold Addition on Electrical and Optical Properties of NiO Films by Rf Sputtering

2010 ◽  
Vol 123-125 ◽  
pp. 647-650 ◽  
Author(s):  
S.C. Chen ◽  
Y.C. Lin ◽  
T.Y. Kuo ◽  
C.L. Chang
Keyword(s):  
Electrical Resistivity ◽  
Optical Properties ◽  
Composite Films ◽  
Rf Sputtering ◽  
The Other ◽  
Electrical And Optical Properties ◽  
Glass Substrates ◽  
High Electrical Resistivity ◽  
Xrd Patterns ◽  
Nio Films

The NiO-Au composite films with Au contents of 0 to 33.7 at.% are deposited on glass substrates. The high electrical resistivity (ρ) of Au-doped NiO films with Au contents below 1.0 at.% is difficlut to measure by four point probe. The ρ value could be reduced to 30.4 Ω-cm as Au content of 1.4 at.% is added into NiO film. It is reduced significantly to 0.375 Ω-cm as Au content is increased to 13.6 at.%. Further increasing the Au content to 33.7 at.%, the ρ value of NiO film is further decreased to 4 x 10-4 Ω-cm. On the other hand, the transmittance of Au doped NiO films also decreases with increasing Au contents. The transmittance for pure NiO film is as high as 96 %. As the Au contents of 1.4, 13.6, and 33.7 % are added into NiO film, they are decreased drastically to 45 %, 20 %, and 9 % respectively. The XRD patterns of Au-doped NiO films with Au content below 9.6 at.% only appear NiO peaks and their (200) peaks shift slightly to low angle as Au content is increased. When Au content is added to above 9.6 at.%, the NiO crystalline become worse. In addition, further increasing the Au content to above 13.6 at.%, the (111) peak of Au also appears in XRD patterns. This indicating that the Au atoms instead of part of Ni atoms results in the enlargement of NiO lattice for Au-doped NiO film with lower Au contents, but large amount of Au atoms are precipitated from the NiO lattice when the content of Au in the NiO film is increased to above 13.6 at.%.

Preparation and Properties of P-Type Transparent Conductive NiO Films

2010 ◽  
Vol 123-125 ◽  
pp. 181-184 ◽  
Author(s):  
S.C. Chen ◽  
T.Y. Kuo ◽  
Y.C. Lin ◽  
C.L. Chang
Keyword(s):  
Electrical Resistivity ◽  
Glass Substrate ◽  
Composite Films ◽  
Cu Content ◽  
High Electrical Resistivity ◽  
Xrd Patterns ◽  
P Type ◽  
Cu Ions ◽  
Type Conduction ◽  
Nio Films

The NiO-Cu composite films with various Cu contents of 0 – 18.17 at.% are deposited on glass substrate. An ultra high electrical resistivity (ρ) is obtained and cannot be detected by four point probe measurement when the Cu contents in the films are lower than 6.97 at.%. The ρ value is reduced significantly to 35.8 Ω-cm as Cu content is increased to 9.18 at.%, and it further decreases to 0.02 Ω-cm when the Cu content further increases to 18.17 at.%. The Hall measurement for all Cu-doped NiO films show p-type conduction. In addition, the transmittance of NiO films also decreases continuously from 96 % to 43 % as Cu content increases from 0 to 18.17 at.%. The XRD patterns of Cu-doped NiO films only appear NiO peaks and the crystallinity of NiO films becomes worse as Cu content is added to above 6.97 at.%. Large amount of lattice sites of Ni2+ ions in NiO crystalline are replaced by the Cu+ ions that leads to p-type conduction and result in the degradation of crystallinity for NiO-Cu composite films having higher Cu content.

Target to Substrate Distance Dependent Optical and Electrical Properties of Sputtered NiO Films

2012 ◽  
Vol 584 ◽  
pp. 33-36
Author(s):  
Avula Mallikarjuna Reddy ◽  
Akepati Sivasankar Reddy ◽  
Pamanji Sreedhara Reddy
Keyword(s):  
Electrical Resistivity ◽  
Electrical Properties ◽  
Optical Transmittance ◽  
Optical And Electrical Properties ◽  
Glass Substrates ◽  
Substrate Distance ◽  
High Electrical Resistivity ◽  
Dc Reactive Magnetron Sputtering ◽  
Direct Band ◽  
Nio Films

Nickel oxide (NiO) thin films were deposited on glass substrates at various target to substrate distances in the range of 60 to 80 mm by dc reactive magnetron sputtering technique. It was observed that target to substrate distance influenced the morphological, optical and electrical properties of the deposited films. The optical results revealed that the optical transmittance of the films increased with increasing the target to substrate distance upto 70 mm, thereafter it was decreased. The increase in transmittance of the films was due to an increase in size of the grains. The NiO films exhibited an optical transmittance of 60 % and direct band gap of 3.82 eV at target to substrate distance of 70 mm. The films showed high electrical resistivity of 37.3 Ωcm at target to substrate distance of 60 mm and low electrical resistivity of 5.1 Ωcm at target to substrate distance of 70 mm. At high target to substrate distance of 80 mm the electrical resistivity of the film was increased.

scholarly journals Influence of Substrate Temperature on Electrical and Optical Properties of Hydrogenated Boron Carbide Thin Films Deposited by RF Sputtering

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 196
Author(s):  
Shraddha Dhanraj Nehate ◽  
Ashwin Kumar Saikumar ◽  
Kalpathy B. Sundaram
Keyword(s):  
Optical Properties ◽  
Substrate Temperature ◽  
Boron Carbide ◽  
Photoelectron Spectroscopy ◽  
Rf Sputtering ◽  
Electrical And Optical Properties ◽  
Glass Substrates ◽  
Radio Frequency Sputtering ◽  
Metal Insulator Metal ◽  
Deposited Films

Amorphous hydrogenated boron carbide films were deposited on silicon and glass substrates using radio frequency sputtering. The substrate temperature was varied from room temperature to 300 °C. The substrate temperature during deposition was found to have significant effects on the electrical and optical properties of the deposited films. X-ray photoelectron spectroscopy (XPS) revealed an increase in sp2-bonded carbon in the films with increasing substrate temperature. Reflection electron energy loss spectroscopy (REELS) was performed in order to detect the presence of hydrogen in the films. Metal-insulator-metal (MIM) structure was developed using Al and hydrogenated boron carbide to measure dielectric value and resistivity. Deposited films exhibited lower dielectric values than pure boron carbide films. With higher substrate deposition temperature, a decreasing trend in dielectric value and resistivity of the films was observed. For different substrate temperatures, the dielectric value of films ranged from 6.5–3.5, and optical bandgap values were between 2.25–2.6 eV.

scholarly journals Electrical behavior and Optical Properties of Copper oxide thin Films

2011 ◽  
Vol 8 (2) ◽  
pp. 638-645
Author(s):  
Baghdad Science Journal
Keyword(s):  
Optical Properties ◽  
Energy Gap ◽  
Spray Pyrolysis Method ◽  
Semiconductor Films ◽  
Electrical Behavior ◽  
Electrical And Optical Properties ◽  
Glass Substrates ◽  
Correlated Barrier Hopping ◽  
Pyrolysis Method ◽  
Substrate Temperatures

In this work the structural, electrical and optical Properties of CuO semiconductor films had been studied, which prepared at three thickness (100, 200 and 500 nm) by spray pyrolysis method at 573K substrate temperatures on glass substrates from 0.2M CuCl2•2H2O dissolved in alcohol. Structural Properties shows that the films have only a polycrystalline CuO phase with preferential orientation in the (111) direction, the dc conductivity shows that all films have two activation energies, Ea1 (0.45-0.66 eV) and Ea2 (0.055-.0185 eV), CuO films have CBH (Correlated Barrier Hopping) mechanism for ac-conductivity. The energy gap between (1.5-1.85 eV).

INFLUENCE OF POLARIZING ELECTRIC FIELDS ON THE ELECTRICAL AND OPTICAL PROPERTIES OF POLYMER–CLAY COMPOSITE SYSTEM

2010 ◽  
Vol 24 (01) ◽  
pp. 65-73 ◽  
Author(s):  
CONSTANTIN ROSU ◽  
D. MANAILA-MAXIMEAN ◽  
D. DONESCU ◽  
S. FRUNZA ◽  
A. R. STERIAN
Keyword(s):  
Optical Properties ◽  
Electric Fields ◽  
Optical Transmission ◽  
Composite System ◽  
Electrical And Optical Properties ◽  
Nano Composite ◽  
Divinyl Benzene ◽  
New Material ◽  
Xrd Patterns ◽  
Thermally Stimulated Depolarization

We examined the electrical and optical properties of a new material containing polymer–clay nano-composite dispersed in a nematic liquid. The clay (Cloisite-type) was modified by copolymerization of maleic anhydride and divinyl benzene, using azobisisobutytironitrile as the initiator. The final polymer–clay nano-composite has an intercalated structure according to XRD patterns. We measured the thermally stimulated depolarization currents and determined the activation energies. Simultaneously we measured the optical transmission and we studied the influence of the previously applied polarizing electric fields.

Sign in / Sign up

Export Citation Format

Share Document