Preparation of Stoichiometric TiNx Films by Laser CVD with Metalorganic Precursor
2011 ◽
Vol 239-242
◽
pp. 318-321
Keyword(s):
Nearly stoichiometric TiNxfilms were deposited on Al2O3substrates by laser enhanced chemical vapor deposition (CVD) with tetrakis (diethylamido) titanium (TDEAT) and ammonia as the source materials. Emphases were given on the effects of laser power (PL) and pre-heating temperature (Tpre) on the composition and deposition rate of TiNxfilms. Single phase of TiNxfilms with columnar cross section were obtained. The ratio of N to Ti in TiNxfilms increased with increasingPLand was close to stoichiometric atPL> 150 W. The deposition rate of TiNxfilms with a depositing area of 300 mm2was about 18-90 µm/h, which decreased with increasingPLandTpre.
2012 ◽
Vol 508
◽
pp. 279-282
◽
2008 ◽
Vol 26
(5)
◽
pp. 1213-1217
◽
Keyword(s):
Keyword(s):