Effect of N Incorporation on Growth Behavior of InGaAsN/GaAs/Ge Multi-Layered Structure by MOVPE

2013 ◽  
Vol 802 ◽  
pp. 129-133 ◽  
Author(s):  
Pornsiri Wanarattikan ◽  
Sakuntam Sanorpim ◽  
Somyod Denchitcharoen ◽  
Kenjiro Uesugi ◽  
Takehiko Kikuchi ◽  
...  
Keyword(s):  
Low Temperature ◽  
Buffer Layer ◽  
Domain Size ◽  
Matching Condition ◽  
Growth Behavior ◽  
Lattice Matching ◽  
Transmission Electron ◽  
Gaas Buffer Layer ◽  
N Incorporation ◽  
Low Temperature Gaas

We have investigated an effect of N incorporation on InGaAsN on Ge (001), which is proposed to be a part of the InGaP(N)/InGaAs/InGaAsN/Ge four-junction solar cell, and on its growth behavior. Results obtained from high resolution X-ray diffraction and Raman scattering demonstrated that high quality In0.11Ga0.89As1-yNy films with N (y) contents up to 5% were successfully grown on n-type doped Ge (001) substrate by metalorganic vapor phase epitaxy using low-temperature (500°C) GaAs buffer layer. As expectation, the In0.11Ga0.89As0.96N0.04 film is examined to be under lattice-matching condition. Anti-phase domains were observed for the film without N incorporation, which exhibits submicron-size domains oriented along the [110] direction on the grown surface. With increasing N content, the domains become less orientation, and present in a larger domain size. Based on results of transmission electron microscopy, a high density of anti-phase domains was clearly observed at the interface of low-temperature GaAs buffer layer and Ge substrate. On the other hand, it is found to drastically reduce within the N-contained InGaAsN region. Furthermore, the lattice-matched In0.11Ga0.89As0.96N0.04 film is well developed to reduce the density of anti-phase domains.

Laser Quality AlGaAs-GaAs Quantum Wells Grown on Low Temperature GaAs

1991 ◽  
Vol 241 ◽  
Author(s):  
Y. Hwang ◽  
D. Zhang ◽  
T. Zhang ◽  
M. Mytych ◽  
R. M. Kolbas
Keyword(s):  
Molecular Beam Epitaxy ◽  
Low Temperature ◽  
Quantum Wells ◽  
Barrier Layer ◽  
Molecular Beam ◽  
Optical Quality ◽  
First Order ◽  
Gaas Buffer Layer ◽  
Low Temperature Gaas ◽  
Lt Gaas

ABSTRACTIn this work we demonstrate that photopumped quantum wellheterostructure lasers with excellent optical quality can be grown ontop of a LT GaAs buffer layer by molecular beam epitaxy. Hightemperature thermal annealing of these lasers blue-shifts the laseremission wavelengths but the presence/absence of a LT GaAs layerhad little effect on the overall laser thresholds. Also, to first order itwas not necessary to include an AlAs barrier layer to preventadverse effects (as has been necessary in the gate stack of MESFETs to prevent carrier compensation).

Growth and Characterizations of Gaas on Inp with Different Buffer Structures by Molecular Beam Epitaxy

1989 ◽  
Vol 148 ◽  
Author(s):  
Xiaoming Liu ◽  
Henry P. Lee ◽  
Shyh Wang ◽  
Thomas George ◽  
Eicke R. Weber ◽  
...  
Keyword(s):  
Low Temperature ◽  
Buffer Layer ◽  
Gaas Layer ◽  
Optical Quality ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Layer Structures ◽  
Gaas Films ◽  
Initial Deposition ◽  
Strained Layer Superlattices

ABSTRACTWe report the growth and characterizations of 31μm thick GaAs films grown on (100) InP substrates by MBE employing different buffer layer structures during the initial deposition. The buffer layer structures under study are: 1) GaAs layer grown at low temperature; 2) GaAs layer grown at low temperature plus two sets of In0.08Ga0.92As/GaAs strained layer superlattices (SLS) and 3) a transitional compositionally graded InxGal-xAs layer between the InP substrate and the GaAs film. After the buffer layer deposition, the growth was continued by conventionalMBE to a total thickness of 3μm for all samples. From the 77K photoluminescence (PL) measurement, it was found that the sample with SLS layers has the highest PL intensity and the narrowest PL linewidth. Cross-sectional transmission electron microscopy (TEM) studies showed that the SLS is effective in reducing the propagation of threading dislocations and explains the observed superior optical quality from the PL measurement.

Influences of thickness and temperature of low temperature GaAs buffer layer on two-step MOVPE grown GaAs/Ge heterostructures

2020 ◽  
Vol 90 (2) ◽  
pp. 20301
Author(s):  
Ilkay Demir ◽  
Ahmet Emre Kasapoğlu ◽  
Hasan Feyzi Budak ◽  
Emre Gür ◽  
Sezai Elagoz
Keyword(s):  
Buffer Layer ◽  
Growth Parameters ◽  
Internal Quantum Efficiency ◽  
Optical Quality ◽  
Structural Quality ◽  
Atomic Step ◽  
Organic Vapor ◽  
Gaas Buffer Layer ◽  
Metal Organic ◽  
Low Temperature Gaas

We investigate influence of GaAs buffer layer (BL) growth parameters such as temperature and thickness on the structural, morphological, crystalline and optical quality of metal organic vapor phase epitaxy (MOVPE) grown heterostructures of GaAs on Ge. It was found that the optimal BL conditions significantly decrease the effects of anti-phase boundaries (APBs) even when grown on offcut Ge substrate by two-step growth technique with AsH3 pre-flow to promote double atomic step formation. It is observed that as the growth temperature increases, the growth rate of the GaAs BL increases, too. Improvement on the structural quality is observed up to BLs temperature of 535 °C, then it decreases. On the other hand, as the different thick BLs, 12, 25, 75 nm are considered, the epilayer grown on the 25 nm thick BL has shown the lowest full width at half maximum (FWHM) value, large photoluminescence peak intensity and internal quantum efficiency (IQE).

scholarly journals Influence of Low Temperature-Grown GaAs on Lateral Thermal Oxidation of Al0.98Ga0.02As

2000 ◽  
Vol 623 ◽  
Author(s):  
J. C. Ferrer ◽  
Z. Liliental-Weber ◽  
H. Reese ◽  
Y.J. Chiu ◽  
E. Hu
Keyword(s):  
Low Temperature ◽  
Thermal Oxidation ◽  
Oxidation Process ◽  
Gaas Layer ◽  
Transmission Electron ◽  
Low Temperature Gaas ◽  
Reference Samples ◽  
Thermal Oxidation Process ◽  
Low Temperature Grown Gaas

AbstractThe lateral thermal oxidation process of Al0.98Ga0.02As layers has been studied by transmission electron microscopy. Growing a low-temperature GaAs layer below the Al0.98Ga0.02As has been shown to result in better quality of the oxide/GaAs interfaces compared to reference samples. While the later have As precipitation above and below the oxide layer and roughness and voids at the oxide/GaAs interface, the structures with low-temperature have less As precipitation and develop interfaces without voids. These results are explained in terms of the diffusion of the As toward the low temperature layer. The effect of the addition of a Si02 cap layer is also discussed.

TEM Analysis of Planar Defects in InGaAsN and GaAs Grown on Ge (001) by MOVPE

2016 ◽  
Vol 675-676 ◽  
pp. 639-642
Author(s):  
Pornsiri Wanarattikan ◽  
Sakuntam Sanorpim ◽  
Somyod Denchitcharoen ◽  
Visittapong Yordsri ◽  
Chanchana Thanachayanont ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Buffer Layer ◽  
Growth Direction ◽  
Dark Field ◽  
Tem Analysis ◽  
Cross Sectional ◽  
Planar Defects ◽  
Transmission Electron ◽  
Gaas Buffer Layer ◽  
Field Emission Electron Microscopy

InGaAsN on Ge (001) is proposed to be a part of the InGaP(N)/InGaAs/InGaAsN/Ge four-junction solar cell to increase a conversion efficiency over 40%. In this work, InGaAsN lattice-matched film and GaAs buffer layer grown on Ge (001) substrate by metal organic vapor phase epitaxy (MOVPE) were examined by transmission electron microscopy (TEM). Electron diffraction pattern of InGaAsN taken along the [110]-zone axis illustrates single diffracted spots, which represent a layer with a uniformity of alloy composition. Cross-sectional bright field TEM image showed line contrasts generated at the GaAs/Ge interface and propagated to the InGaAsN layer. Dark field TEM images of the same area showed the presence of boundary-like planar defects lying parallel to the growth direction in the InGaAsN film and GaAs buffer layer but not in the Ge substrate. TEM images with the (002) and (00-2) reflections and the four visible {111} planes reflections illustrated planar defects which are expected to attribute to antiphase boundaries (APBs). Moreover, the results observed from atomic force microscopy (AFM) and field emission electron microscopy (FE-SEM) demonstrated the surface morphology of InGaAsN film with submicron-sized domains, which is a characteristic of the APBs.

Tem Study of the Structure of Mbe GaAs Layers Grown at Low Temperature

1990 ◽  
Vol 198 ◽  
Author(s):  
Zuzanna Liliental-Weber
Keyword(s):  
Electron Microscopy ◽  
Low Temperature ◽  
Molecular Beam ◽  
Critical Thickness ◽  
Stacking Faults ◽  
Structural Quality ◽  
Crystalline Perfection ◽  
Transmission Electron ◽  
Low Temperature Gaas

ABSTRACTThe structural quality of GaAs layers grown at 200°C by molecular beam epitaxy (MBE) was investigated by transmission electron microscopy (TEM). We found that a high crystalline perfection can be achieved in the layers grown at this low temperature for thickness up to 3 μm. In some samples we observed pyramid-shaped defects with polycrystalline cores surrounded by microtwins, stacking faults and dislocations. The size of these cores increased as the growth temperature was decreased and as the layer thickness was increased. The upper surface of layers with pyramidal defects became polycrystalline at a critical thickness of the order of 3μm. We suggested that the low-temperature GaAs becomes polycrystalline at a critical thickness either because of a decrease in substrate temperature during growth or because strain induced by excess As incorporated in these layers leads to the formation of misoriented GaAs nuclei, thereby initiating polycrystalline growth. The pyramidal shape of the defects results from a growth-rate hierarchy of the low index planes in GaAs.

Effects of GaAs buffer layer and lattice-matching on deep levels in Zn(S)Se/GaAs heterostructures

1996 ◽  
Vol 25 (2) ◽  
pp. 217-222 ◽  
Author(s):  
Mitsuru Funato ◽  
Hiroaki Kitani ◽  
Shizuo Fujita ◽  
Shigeo Fujita
Keyword(s):  
Buffer Layer ◽  
Deep Levels ◽  
Lattice Matching ◽  
Gaas Buffer Layer

Epitaxial Relations in Fluoride Films Grown on GaAs{lll} and Ge(lll) Substrates

1985 ◽  
Vol 47 ◽  
Author(s):  
K. Tsutsui ◽  
H. Ishiwarya ◽  
T. Asano ◽  
S. Fijrukawa
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Type A ◽  
Matching Condition ◽  
Type B ◽  
Substrate Type ◽  
Lattice Matching ◽  
Lattice Constants ◽  
Ion Channeling ◽  
Transmission Electron

ABSTRACTEpitaxial relations in Cax Sr1−xF2(0⫶×⫶l) and BaF2 films grown on GaAs(111), (111) and Ge(111) substrates were investigated by He ion channeling analysis and transmission electron microscopy. Though the lattice constants of GaAs and Ge are nearly the same, the relations were found to be completely different. That is, the fluoride films on GaAs prefered to have an orientation identical to that of the substrate (type A orientation), whereas the orientation of the films on Ge was mainly rotated by 180° about the surface normal 〈111〉 axis (type B orientation). A hypothesis is proposed that the epitaxial relations in these systems are affected by the ionicity of the substrate as well as the lattice matching condition.

Material and Device Characteristics of MBE Microwave Power FETs with Buffer Layers Grown at Low Temperature (300°C)

1991 ◽  
Vol 241 ◽  
Author(s):  
J. M. Ballingall ◽  
Pin Ho ◽  
R. P. Smith ◽  
S. Wang ◽  
G. Tessmer ◽  
...  
Keyword(s):  
Low Temperature ◽  
Hall Effect ◽  
Buffer Layer ◽  
Active Layer ◽  
Cross Sections ◽  
Microwave Power ◽  
Buffer Layers ◽  
Heat Treated ◽  
Gaas Buffer Layer ◽  
5 Ghz

ABSTRACTMBE GaAs grown at low temperature (300°C) is evaluated for its suitability as a buffer layer for microwave power FETs. Hall effect and capacitance-voltage (C-V) measurements show that low temperature (LT) buffers may have strong deleterious effects on the electronic quality of FET active layers unless they are heat-treated in-situ at 600'C and topped with a thin (∼0. lμm) 600°C GaAs buffer prior to growth of the FET active layer. The voltage isolation properties of the LT buffers are found to be thermally stable to rapid thermal anneals up to 870°C for 10 seconds.Transmission electron microscopy (TEM) cross-sections were examined on FET layers with LT buffer layers which ranged in thickness from 0.1μm to 1.0μm. The TEM reveals a high density (∼1017 cm−3) of small (<100Å) arsenic precipitates in all of the buffer layers studied. In cases where the LT buffer is not heat treated and topped with a thin 600°C GaAs buffer layer, dislocations and arsenic precipitates extend from the buffer layer into the FET active layer. Their presence in the active layer correlates with the degradation in electronic properties observed with Hall effect and CV. Microwave power FETs were measured at DC and 5 GHz. DC and RF results for devices with LT buffer layers are comparable to devices with conventional buffer layers.

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