Micro-Photoluminescence Mapping of Defect Structures in SiC Wafers
2007 ◽
Vol 556-557
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pp. 383-386
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Keyword(s):
Micro-photoluminescence can be used to image electrically active structural defects in SiC. Under suitable excitation conditions it is possible to observe both band-edge PL and near bandedge PL from recombination via a shallow boron acceptor. The intensity of the band-edge emission is related to the carrier lifetime – and is reduced by the presence of structural or interfacial defects. The intensity of the deep level PL is a complex function of the number of radiative centers and the number of centers limiting carrier lifetime. Micro-PL mapping can provide information on the spatial distribution of electrically active defects in SiC.
2006 ◽
Vol 527-529
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pp. 711-716
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1998 ◽
Vol 13
(9)
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pp. 2480-2497
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Keyword(s):
2013 ◽
Vol 740-742
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pp. 633-636
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Keyword(s):
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2017 ◽
Vol 114
(29)
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pp. 7519-7524
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Keyword(s):
2017 ◽
Vol 705
◽
pp. 492-496
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