Structure and Properties of Sputtered Ti-O-N Nanocomposite Films

2020 ◽  
Vol 990 ◽  
pp. 250-255
Author(s):  
Jheng Long Huang ◽  
Ming Show Wong
Keyword(s):  
Visible Light ◽  
Thick Layer ◽  
Nanocomposite Films ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
Nitrogen Flow Rate ◽  
Flow Rates ◽  
Nitrogen Doped ◽  
Nitrogen Concentrations ◽  
Light Absorbance

Nitrogen-doped titanium oxide (Ti-O-N) thin films were deposited by reactive magnetron sputtering a titanium dioxide ceramic target in Ar/N2 plasma. By changing different flow rates of the nitrogen, various nitrogen concentrations and phases are formed in the films. With more nitrogen incorporated into the films, the absorption edge of the films exhibit a redshift which improve the visible light absorbance of the films. When the nitrogen flow rate was 20 sccm, a Ti-O-N nanocomposite film was formed containing 16.9 at% of nitrogen and phases of anatase TiO2, Ti3O5 and TiN, and the film possessed an absorbance in the visible light 3-4 times higher than that of pristine TiO2 thin film, but its photocatalytical performance was not enhanced accordingly. Only when a 50 nm thick layer of anatase was added to the Ti-O-N films forming a hetero-junction, the photocatalytic activity was then enhanced significantly. The photocatalytical properties of the films were affected not only by the film absorbance but also by the microstructure and the architecture of the films.

scholarly journals Structure and Properties of Nanocrystalline (TiZr)xN1−xThin Films Deposited by DC Unbalanced Magnetron Sputtering

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Yu-Wei Lin ◽  
Chia-Wei Lu ◽  
Ge-Ping Yu ◽  
Jia-Hong Huang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Nitrogen Flow Rate ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and properties of TiZrN films. Nanocrystalline TiZrN thin films were deposited on Si (001) substrates by unbalanced magnetron sputtering. The major effects of the nitrogen flow rate were on the phase, texture, N/(Ti + Zr) ratio, thickness, hardness, residual stress, and resistivity of the TiZrN films. The nitrogen content played an important role in the phase transition. With increasing nitrogen flow rate, the phase changed from mixed TiZr and TiZrN phases to a single TiZrN phase. The X-ray diffraction results indicated that (111) was the preferred orientation for all TiZrN specimens. The N/(Ti + Zr) ratio of the TiZrN films first increased with increasing nitrogen flow rate and then stabilized when the flow rate further increased. When the nitrogen flow rate increased from 0.4 to 1.0 sccm, the hardness and residual stress of the TiZrN thin film increased, whereas the electrical resistivity decreased. None of the properties of the TiZrN thin films changed with nitrogen flow rate above 1.0 sccm because the films contained a stable single phase (TiZrN). At high nitrogen flow rates (1.0–2.5 sccm), the average hardness and resistivity of the TiZrN thin films were approximately 36 GPa and 36.5 μΩ·cm, respectively.

GROWTH STRUCTURE EFFECT ON THE CORROSION RESISTANCE AND MECHANICAL PROPERTIES OF CrNx COATING

2019 ◽  
Vol 27 (01) ◽  
pp. 1950091 ◽  
Author(s):  
JIAOJIAO DU ◽  
HAIBIN ZHOU ◽  
CAIXIA SUN ◽  
HAIJIANG KOU ◽  
ZHONGWEI MA ◽  
...  
Keyword(s):  
Corrosion Resistance ◽  
Corrosion Behavior ◽  
Flow Rate ◽  
Steel Substrate ◽  
Face Centered Cubic ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Flow Rates ◽  
Sputtering Deposition ◽  
Growth Structure

A new approach was adopted to improve the corrosion behavior of the chromium nitride (CrNx) hard coating through magnetron sputtering deposition at different nitrogen flow rates. The influence of the nitrogen flow rates on the chemical composition, microstructure, mechanical property and corrosion behavior in artificial seawater of the CrNx coatings was investigated. The results show that with the increase of the nitrogen flow rates, the growth structure of the coatings varied from dense granular growth to coarse columnar growth. Increasing the nitrogen flow rates was helpful to decrease the Cr/N ratio and induce the phase transforming from mixed hexagonal Cr2N and face-centered cubic CrN to single CrN. However, the coatings under different nitrogen flow rates significantly improved the corrosion resistance and hardness of the steel substrate. Furthermore, at high nitrogen flow rate, the coating had high corrosion velocity and low protective capability against the substrate corrosion due to the fast corrosion channels acted by the columnar grain boundaries. While at the middle nitrogen flow rate, the coating with CrN phase, densely granular growth structure and moderate grain size resulted in excellent corrosion resistance and highest hardness.

scholarly journals Effect of Material and Process Variables on Characteristics of Nitridation-Induced Self-Formed Aluminum Matrix Composites—Part 2: Effect of Nitrogen Flow Rates and Processing Temperatures

Materials ◽  
2020 ◽  
Vol 13 (5) ◽  
pp. 1213
Author(s):  
Dae-Young Kim ◽  
Pil-Ryung Cha ◽  
Ho-Seok Nam ◽  
Hyun-Joo Choi ◽  
Kon-Bae Lee
Keyword(s):  
Matrix Composite ◽  
Flow Rate ◽  
Volume Fraction ◽  
Aluminum Matrix ◽  
Aluminum Matrix Composite ◽  
Aluminum Matrix Composites ◽  
Processing Temperature ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Flow Rates

The nitridation-induced self-formed aluminum matrix composite (NISFAC) process is based on the nitridation reaction, which can be significantly influenced by the characteristics of the starting materials (e.g., the chemical composition of the aluminum powder and the type, size, and volume fraction of the ceramic reinforcement) and the processing variables (e.g., process temperature and time, and flow rate of nitrogen gas). Since these variables do not independently affect the nitridation behavior, a systematic study is necessary to examine the combined effect of these variables upon nitridation. In this second part of our two-part report, we examine the effect of nitrogen flow rates and processing temperatures upon the degree of nitridation which, in turn, determines the amount of exothermic reaction and the amount of molten Al in the nitridation-induced self-formed aluminum matrix composite (NISFAC) process. When either the nitrogen flow rate or the set temperature was too low, high-quality composites were not obtained because the level of nitridation was insufficient to fill the powder voids with molten Al. Hence, since the filling of the voids in the powder bed by molten Al is essential to the NISFAC process, the conditions should be optimized by manipulating the nitrogen flow rate and processing temperature.

scholarly journals Cold plasma: an alternative to reduce the viability of Aspergillus flavus conidia in lentil beans

2019 ◽  
Vol 4 (3) ◽  
pp. 21-31
Author(s):  
Marlenne Gómez-Ramírez ◽  
Lizbeth Soto-Ruvalcaba ◽  
Martín Nieto-Pérez ◽  
Norma G. Rojas-Avelizapa
Keyword(s):  
Aspergillus Flavus ◽  
Flow Rate ◽  
Cold Plasma ◽  
Argon Plasma ◽  
Lethal Effect ◽  
Nitrogen Flow ◽  
Log10 Reduction ◽  
Nitrogen Flow Rate ◽  
Flow Rates ◽  
Germination Process

Microbiological food safety is a major issue and the genus Aspergillus is of great interest given the frequency of its toxin contamination in grains. This paper describes the use of cold plasma generated with argon and a mixture of argonnitrogen as a method of sanitizing lentil beans. Lentil beans were sanitized and exposed to Aspergillus flavus conidia then four different experimental sets were prepared, using only argon and a mixture of argon-nitrogen to generate plasma at nitrogen flow rates of 1.2, 0.81 and 0.32 L/min. Each lentil bean was exposed for 5, 10 and 15 min to plasma. Assays were performed in triplicate. Beans not exposed to plasma were used as controls. All plasma treatments caused a lethal effect on A. flavus conidia within exposure periods of 5 to 15 min. The application of argon plasma showed a log10 reduction of 0.81 (84%) after 15 min. The mixture of argon: nitrogen at 0.81 and 0.32 L/min had a higher lethal effect than argon alone. Although lentil beans sterilization was not completely achieved, an important log10 reduction of 1.43 (96.44 %) and 5.53 (99.99 %) of A. flavus conidia was obtained after 15 min of exposure to the plasma generated by argon-nitrogen mixture using nitrogen at flow rates of 0.81 and 0.32 L/min, respectively. Nitrogen flow rate of 0.32 L/min showed a reduction above 3.0 logarithmic units, so this treatment showed a fungicidal activity. The lowest reduction, 0.3 logarithmic units (50.3 %) was observed at a nitrogen flow rate of 1.2 L/min. Additionally, as a consequence of plasma exposure, conidia of A. flavus showed a delay in germination process and also conidia formation was affected. It was concluded that cold plasma could be used as an alternative to sanitize grains and avoid contamination by microorganisms, which cause grain deterioration and affect its nutritional properties.

Structural State and Mechanical Characteristics of the ZrN Films Prepared by Sputtering

2013 ◽  
Vol 440 ◽  
pp. 9-12
Author(s):  
Chien Cheng Liu ◽  
Kuang I Liu ◽  
Yung Chih Chou ◽  
Yung Mao Cheng ◽  
Chih Lung Lin
Keyword(s):  
Flow Rate ◽  
Diffraction Field ◽  
Nitrogen Flow ◽  
X Ray Diffraction ◽  
Nitrogen Flow Rate ◽  
Flow Rates ◽  
Microstructure Morphology ◽  
Pin On Disk ◽  
Steel Substrates ◽  
Hardness Values

ZrN films were prepared by magnetron sputtering on die steel substrates. The objective of this study was to investigate the effect of nitrogen flow rate on the microstructure ,morphology, nanohardness properties determined by X-ray diffraction, field-emission scanning electron microscope, nanoindentation, and pin-on-disk, respectively. The XRD shows that ZrN has (111) and (200) preferred orientation under lower nitrogen flow rates. The surface of coatings revealed smaller grains and uniform dense under lower nitrogen flow rates. With increasing the nitrogen flow rates, this result showed ZrN films lead to poor mechanical properties and hardness values. However, films consisted of up high ernitrogen flow rate had much lower friction coefficient.

scholarly journals Effect of Nitrogen Flow Rate on Structure and Adhesion Strength of Magnetron Sputtered Ti-Si-N Nanocomposite Films

2016 ◽  
Vol 67 ◽  
pp. 04015 ◽  
Author(s):  
Chunlin He ◽  
Leipeng Xie ◽  
Yuechang Zhu ◽  
Rui Li ◽  
Guofeng Ma ◽  
...  
Keyword(s):  
Adhesion Strength ◽  
Flow Rate ◽  
Nanocomposite Films ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate

scholarly journals Structure, Mechanical and Tribological Properties of MoSN/MoS2 Multilayer Films

Coatings ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 108 ◽  
Author(s):  
Yanlong Fu ◽  
Tengfei He ◽  
Wu Yang ◽  
Jiao Xu ◽  
Bo Mu ◽  
...  
Keyword(s):  
Tribological Properties ◽  
Flow Rate ◽  
Multilayer Film ◽  
Multilayer Films ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Compact Structure ◽  
Flow Rates ◽  
Mechanical And Tribological Properties ◽  
Mos2 Film

MoSN/MoS2 multilayer films were deposited by a sputtering MoS2 target in alternate Ar and Ar/N2 mixed atmospheres with different nitrogen flow rates. The influence of nitrogen flow rates on the microstructure, mechanical and tribological properties of the prepared films were investigated. The multilayer film exhibited the preferred orientation of (002) plane for MoS2 sublayers and amorphous structure for MoSN sublayers. Introducing N2 into the source gas resulted in a much more compact structure for multilayer films due to the suppression of columnar growth of MoS2 film. With the increase of the nitrogen flow rate, the hardness of the multilayer film firstly increased from 2.3 to 10.5 GPa as the nitrogen flow rate increased from 4 to 10 sccm and then turned downwards to 6.5 GPa at 20 sccm. MoSN/MoS2 film deposited with an optimized microstructure exhibited low friction coefficients below 0.03 and a wear life higher than 1.8×105 revolutions in vacuum. Meanwhile, the optimized film showed an ultralow friction coefficient of 0.004~0.01 and wear rate of 4.7 × 10−7 mm3/N·m in an ultrahigh vacuum. Both the enhanced hardness by N-doping and sustainable formed MoS2 tribofilm contributed to the improved tribological property of MoSN/MoS2 multilayer film.

Effect of Nitrogen Flow Rate on the Structure and Properties of TiN Thin Films Deposited onto β-Type Ti-15Mo-3Nb-3Al-0.2Si Alloy Substrates by Reactive Magnetron Sputtering

2012 ◽  
Vol 557-559 ◽  
pp. 1998-2001 ◽  
Author(s):  
Jun Hee Lee ◽  
A. Joseph Nathanael ◽  
Sun Ig Hong
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Concentration ◽  
Rf Magnetron Sputtering ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
Nitrogen Flow Rate ◽  
Average Roughness ◽  
Tin Thin Films

Titanium Nitride (TiN) thin film was deposited on β-type Ti-15Mo-3Nb-3Al-0.2Si alloy plates by RF magnetron sputtering method. The effect of nitrogen flow rate on the structure and properties of the TiN thin films were studied. The preferred orientation of TiN thin films changed from (111) to (200) as the nitrogen flow rate increased due to the effect of the kinetic energy of the bombarding particles. The coating thickness was found to decrease with increasing nitrogen concentration, which also favors (200) orientation with increasing nitrogen flow rate. With increase of nitrogen flow, the morphology of the TiN thin films films changed from characteristic pyramidal shaped grains to columnar-shaped grains. The roughness analysis of the coating shows that the average roughness of the coating decreased with increasing nitrogen flow rate. The increase of hardness with increasing nitrogen flow rate is attributed to the decrease in grain size.

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