scholarly journals Microstructural and Nonlinear Properties of Zn-V-Mn-Nb-O Varistor Ceramics with Gd2O3 Substitution for Low Voltage Application

2017 ◽  
Vol 268 ◽  
pp. 181-185 ◽  
Author(s):  
Nor Hasanah Isa ◽  
Zakaria Azmi ◽  
Raba’ah Syahidah Azis ◽  
Zahid Rizwan
Keyword(s):  
Electrical Properties ◽  
Grain Growth ◽  
Leakage Current Density ◽  
Current Density ◽  
Triple Point ◽  
Low Voltage ◽  
Nonlinear Coefficient ◽  
Electrical Field ◽  
Nonlinear Properties ◽  
Voltage Application

The effect of Gd2O3 substitution on the microstructural and electrical properties of Zn-V-Mn-Nb-O varistor ceramics sintered at 900°C was investigated. XRD, SEM, and EDAX results show that the GdMnO3 and GdVO4 phases formed at the grain boundaries and triple point junctions. Gd2O3 substitution inhibited the grain growth from 3.85 to 3.06 μm and increased the sintered ceramics density from 5.12 to 5.19 g/cm3.The samples containing the amount of 0.03 mol% Gd2O3 exhibit an optimum nonlinear coefficient α value which is 9.91, highest breakdown electrical field which is 88.48 V/mm and lowest leakage current density which is 0.11 mA/cm2 in low voltage application.

Effect of La2O3 on the Microstructure and Electrical Properties of (Ti,Sn)O2 Varistor Ceramics

2010 ◽  
Vol 152-153 ◽  
pp. 1391-1394
Author(s):  
Mao Hua Wang ◽  
Gang Li ◽  
Chao Yao
Keyword(s):  
Electrical Properties ◽  
Grain Boundary ◽  
Experimental Evidence ◽  
Low Voltage ◽  
Nonlinear Coefficient ◽  
Electrical Characteristics ◽  
Electrical Behavior ◽  
Optimal Doping ◽  
Nonlinear Properties ◽  
Ceramic Sintering

(Ti,Sn)O2 varistors doped with different amount of La2O3 were obtained by ceramic sintering processing at 1250 . The effect of La2O3 on the microstructure and nonlinear electrical behavior of the (Ti,Sn)O2 ceramics were investigated. The ceramics have nonlinear coefficients of α=6.2–8.5. Experimental evidence shows that small quantities of La2O3 improve the nonlinear properties of the samples significantly. It was found that an optimal doping composition of 1.0mol% La2O3 leads to a low breakdown voltage of 18.1V/mm, a high nonlinear coefficient of 8.5, which is consistent with the highest and narrowest grain boundary barriers of the ceramics.In view of these electrical characteristics, the (Ti,Sn)O2 varistors with 1.0mol% La2O3 ceramic is a viable candidate for low voltage varistor devices. The characteristics of the ceramics can be explained by the effect of the substitution of La3+ for Ti4+ or Sn4+.

Influence of Sintering Temperature on the Electrical Properties of (La, Ta)-Doped TiO2 Capacitor-Varistor Ceramics

2011 ◽  
Vol 197-198 ◽  
pp. 294-297 ◽  
Author(s):  
Qun Qin ◽  
Tian Guo Wang ◽  
Wen Jun Zhang
Keyword(s):  
Electrical Properties ◽  
Grain Boundary ◽  
Breakdown Voltage ◽  
Barrier Layer ◽  
Low Voltage ◽  
Sintering Temperature ◽  
Nonlinear Coefficient ◽  
Nonlinear Properties

An investigation was made of low voltage TiO2 varistors doped with Ta2O5 and La2O3. TiO2 ceramics doped with 0.7 mol% La2O3 and 0.1 mol% Ta2O5 were sintered at different temperature ranging from 1350 to 1450°С . The influence of sintering temperature on microstructure and nonlinear properties of the (La, Ta)-doped TiO2 ceramics was studied. The varistor of 99.2 mol%-0.7 mol%La2O3-0.1 mol% Ta2O5 composite sintered at 1380°С has a maximal nonlinear coefficient of α =5.2 and a low breakdown voltage of 7.6 V/mm, which is consistent with its highest grain-boundary barriers. According to these results, it is suggested that the sample sintered at 1380°С forms the most efficient boundary barrier layer. Therefore, the sintering temperature is a very important varible which should not be despised in the project of TiO2 based varistors production.

scholarly journals Microstructure and Electrical Properties of Low-Voltage Barium Titanate Doped Zinc Oxide Varistor Ceramics

2019 ◽  
Vol 8 (4) ◽  
pp. 2713-2718
Keyword(s):  
Zinc Oxide ◽  
Electrical Properties ◽  
Barium Titanate ◽  
Grain Boundary ◽  
Barrier Height ◽  
Current Density ◽  
Low Voltage ◽  
X Ray ◽  
Highly Nonlinear ◽  
Zno Varistors

In the present, varistor ceramics through the combination of zinc oxide (ZnO) with a perovskite material have become widespread because of their unique properties for a wide range of applications in electronic protection devices. Low-voltage zinc oxide (ZnO) varistors with fast response and highly nonlinear electrical properties for overvoltage protection in an integrated circuit are increasingly significant in the application of low-voltage electronics. The present study highlights the interaction between barium titanate (BaTiO3 ) and ZnO varistors through the employment of solid-state reaction method in the production of low-voltage varistors. The effects of BaTiO3 on the microstructure of ZnO varistors were analyzed through scanning electron microscopy (SEM), energy dispersive X-ray analysis spectroscopy (EDS) and X-ray diffraction (XRD). The EDS analysis and XRD measurements suggest the presence of ZnO and BaTiO3 phases. The electrical properties of BaTiO3 -doped ZnO varistors were examined based on the current density-electric field (J-E) characteristics measurement. The varistor properties showed the nonlinear coefficient (α) from 1.8 to 4.8 with the barrier height (φB) ranged from 0.70 to 0.88 eV. The used of BaTiO3 additive in ZnO varistors produced varistor voltages of 4.7 to 14.1 V/mm with the voltage per grain boundary (Vgb) was measured in the ranges 0.03 to 0.05 V. The lowest leakage current density was 348 µA/cm2 , obtained at the samples containing 12 wt.% BaTiO3 with high barrier height. The reduction in barrier height with increasing BaTiO3 content was associated with the excessive amount of BaTiO3 phase, hence cause the deterioration of active grain boundary due to the variation of oxygen (O) vacancies in the grain boundary.

Effect of WO3 Doping on Microstructural and Electrical Properties of ZnO-Pr6O11 Based Varistor Materials

2013 ◽  
Vol 591 ◽  
pp. 54-60
Author(s):  
Xiu Li Fu ◽  
Yan Xu Zang ◽  
Zhi Jian Peng
Keyword(s):  
Grain Size ◽  
Electrical Properties ◽  
Grain Growth ◽  
Doping Level ◽  
Nonlinear Coefficient ◽  
Current Voltage ◽  
Average Grain Size ◽  
Current Voltage Characteristics ◽  
Voltage Performance

The effect of WO3doping on microstructural and electrical properties of ZnO-Pr6O11based varistor materials was investigated. The doped WO3plays a role of inhibitor in ZnO grain growth, resulting in decreased average grain size from 2.68 to 1.68 μm with increasing doping level of WO3from 0 to 0.5 mol%. When the doping level of WO3was lower than 0.05 mol%, the nonlinear current-voltage characteristics of the obtained varistors could be improved significantly with increasing amount of WO3doped. But when the doping level of WO3became higher, their nonlinear current-voltage performance would be dramatically deteriorated when more WO3was doped. The optimum nonlinear coefficient, varistor voltage, and leakage current of the samples were about 13.71, 710 V/mm and 13 μA/cm2, respectively, when the doping level of WO3was in the range from 0.03 to 0.05 mol%.

Electrical Properties of a TiO2-SrO Varistor System

2014 ◽  
Vol 975 ◽  
pp. 168-172
Author(s):  
Tiago Delbrücke ◽  
Igor Schmidt ◽  
Sergio Cava ◽  
Vânia Caldas Sousa
Keyword(s):  
Titanium Dioxide ◽  
Electrical Properties ◽  
Field Strength ◽  
Leakage Current ◽  
Low Voltage ◽  
Nonlinear Coefficient ◽  
Breakdown Field ◽  
Strontium Oxide ◽  
Breakdown Field Strength

The addition of different dopants affects the densification and electrical properties of TiO2 based varistor ceramics. The nonlinear current (I) and voltage (V) characteristics of titanium dioxide are examined when doped with small quantities (0.5-2 at.%) of strontium oxide. This paper discusses the electrical properties of such an SrO doped TiO2 system, and demonstrates that some combinations produce electrical properties suitable for use as low voltage varistors. The high value of the nonlinear coefficient (α) (6.6), the breakdown field strength (Eb) (328 V/cm) and the leakage current (Ir) (0.22 mA/cm2) obtained in a system newly doped with SrO, are all adequate properties for application in low voltage varistors.

Preparation and Characterization of (Sr1−xTix)O3 and (Ba1−xSrx)TiO3 Thin Films using ECR Plasma Assisted MOCVD

1996 ◽  
Vol 433 ◽  
Author(s):  
Kwangsoo No ◽  
Joon Sung Lee ◽  
Han Wook Song ◽  
Won Jong Lee ◽  
Byoung Gon Yu ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Electrical Properties ◽  
Dielectric Loss ◽  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Breakdown Field ◽  
Carrier Gas ◽  
Ecr Plasma

AbstractBa(TMHD)2, Sr(TMHD)2 and Ti-isopropoxide were used to fabricate the (SrxTi1 x)O3 and (Ba1 x Srx)TiO3 thin films. The decomposition and degradation characteristics of Ba(TMHD)2 and Sr(TMHD)2 with storage time were analyzed using a differential scanning calorimeter (DSC). The thin films were fabricated on Si(p-type 100) and Pt/SiO2/Si substrates with Ar carrier gas using ECR plasma (or without ECR plasma) assisted MOCVD. Experimental results showed that the ECR oxygen plasma increased the deposition rate, the ratio of Sr/Ti, the dielectric constant and the leakage current density of the film. The dependency of the crystallinity and the electrical properties on the Sr/Ti ratio of films were investigated. However, almost of the films deposited with Ar carrier gas had slightly high dielectric loss and high leakage current density and showed non-uniform compositional depth profiles. NH3 gas was also used to decrease the degradation of the MO-sources. Mass spectra in-situ monitoring of source vapors in ECR-PAMOCVD system were obtained. By introducing NH3 as a carrier gas, a significant improvement was achieved in the volatility and the thermal stability of the precursors, and the vaporization temperatures of the precursors were reduced compared to Ar carrier gas. The uniform compositional depth profile, less hydrogen and carbon content and the good electrical properties of (SrxTi1−x)O3 thin films were obtained with NH3 carrier gas. The (Ba1−xSrx)TiO3 thin film were fabricated to have very fine and uniform microstructure, the dielectric constant of 456, the dielectric loss of 0.0128, the leakage current density of 5.01 × 10−8A/cm2 at 1V and the breakdown field of 3.65MV/cm.

Electrical Properties of Metal-Oxide-Semiconductor (MOS) Structures on 4H-SiC(0001) Formed by Oxidizing Pre-Deposited SixNy

2007 ◽  
Vol 556-557 ◽  
pp. 647-650 ◽  
Author(s):  
Jeong Hyun Moon ◽  
Dong Hwan Kim ◽  
Ho Keun Song ◽  
Jeong Hyuk Yim ◽  
Wook Bahng ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Metal Oxide ◽  
Current Density ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Electrical Field ◽  
Mos Capacitors ◽  
Dielectric Layers ◽  
Capacitance Voltage ◽  
Mos Structures

We have fabricated advanced metal-oxide-semiconductor (MOS) capacitors with ultra thin (5 nm) remote-PECVD SixNy dielectric layers and investigated electrical properties of nitrided SiO2/4H-SiC interface after oxidizing the SixNy in dry oxygen at 1150 °C for 30, 60, 90 min. Improvements of electrical properties have been revealed in capacitance-voltage (C-V) and current density-electrical field (J-E) measurements in comparison with dry oxide. The improvements of SiC MOS capacitors formed by oxidizing the pre-deposited SixNy have been explained in this paper.

Influence of Ta2O5, TiO2, and ZrO2 Interfacial Layers on Structural and Electrical Properties of Laser Ablated Ba0.5Sr0.5TiO3 Thin Films

2002 ◽  
Vol 748 ◽  
Author(s):  
Suprem R. Das ◽  
Rasmi R. Das ◽  
P. Bhattacharya ◽  
Ram S. Katiyar
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Buffer Layers ◽  
Bst Thin Films ◽  
Interfacial Layers ◽  
Average Grain Size ◽  
Structural And Electrical Properties

ABSTRACTPulsed laser deposition technique was used to fabricate Ba0.5Sr0.5TiO 3 (BST) thin-films on Pt/TiO 2/SiO2/Si substrates. The influence of thin interfacial layers of Ta2O5, TiO2, and ZrO2, on the structural and electrical properties of BST thin films was investigated. Insertion of interfacial layers does not affect the perovskite phase formation of BST thin films. Buffer layers helped to make uniform distribution of grains and resulted in a relative increase in the average grain size. The dielectric tunability of BST thin films was reduced with the presence of buffer layers. A BST thin film having a dielectric permitivity of 470 reduced to 337, 235 and 233 in the presence of Ta2O5, TiO2, and ZrO2 layers, respectively. The reduction of the relative dielectric permittivity of BST films with the insertion of interfacial layers was explained in terms of a series capacitance effect, due to the low dielectric constant of interfacial layers. The TiO2 layer did not show any appreciable change in the leakage current density. Deposition of thin Ta2O5 and ZrO2 interfacial layer on top of Pt reduced the leakage current density by an order of magnitude.

Effect of Temperature on Microstructure and Electrical Properties of (Y, Ta)-Doped TiO2 Capacitor-Varistor Ceramics

2011 ◽  
Vol 214 ◽  
pp. 173-177
Author(s):  
Tian Guo Wang ◽  
Qun Qin ◽  
Wen Jun Zhang
Keyword(s):  
Dielectric Properties ◽  
Electrical Properties ◽  
Breakdown Voltage ◽  
Sintering Temperature ◽  
Nonlinear Coefficient ◽  
Effect Of Temperature ◽  
Electrical Characteristics ◽  
Electrical Behavior ◽  
Nonlinear Properties ◽  
Electrical Permittivity

The microstructure and nonlinear electrical behavior and dielectric properties of the varistor, which are composed of (Y2O3, Ta2O5)-doped TiO2 ceramics, were investigated for various sintering temperatures. It is assumed that the moderate sintering temperature improves the permitivity of TiO2 ceramics, together with high nonlinear properties. The varistor of 99.6 mol%-0.3 mol%Y2O3-0.1 nol%Ta2O5 composite sintered at 1400 °C has a maximal nonlinear coefficient of α =4.4, a low breakdown voltage of 10.8 V/mm, the ultrahigh electrical permittivity of 7.73× 104 and low tanδ of 0.34. The sintering temperature plays an important an important role on the nonlinear electrical characteristics and dielectric properties of the ceramics through its influences on the microstructure of samples.

Microstructure Control of (Ba, Sr)TiO3 Films for Gigabit Dram

1997 ◽  
Vol 493 ◽  
Author(s):  
H. Shen ◽  
D. E. Kotecki ◽  
R. J. Murphy ◽  
M. Zaitz ◽  
R. B. Laibowitz ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Leakage Current ◽  
Leakage Current Density ◽  
Current Density ◽  
Nucleation And Growth ◽  
Process Conditions ◽  
Charge Storage ◽  
Storage Density ◽  
Final Microstructure ◽  
A Charge

ABSTRACT(Ba, Sr)TiO3 films were deposited on Pt-coated SiO2/Si wafers by the MOCVD method. Experiments were conducted to investigate the mechanisms of nucleation and growth. It was observed that the diameter of the (Ba, Sr)TiO3 grains is established in the early stages of nucleation and does not increase substantially during the growth of the film. By controlling the process conditions, it is possible to control the final microstructure and improve the electrical properties of (Ba, Sr)TiO3 films. I-V and C-V measurements show that (Ba, Sr)TiO3 films with a thickness of approximately 15nm can produce a charge storage density of >120 fF/μm2 with a leakage current density of < 10 nA/cm2 at IV, making them suitable for Gigabit-scale DRAM applications.

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