Complex fine-scale diffusion coating formed at low temperature on high-speed steel substrate

2018 ◽  
Vol 437 ◽  
pp. 257-270 ◽  
Author(s):  
A.S. Chaus ◽  
P. Pokorný ◽  
Ľ. Čaplovič ◽  
M.V. Sitkevich ◽  
J. Peterka
Keyword(s):  
Low Temperature ◽  
High Speed ◽  
Steel Substrate ◽  
Diffusion Coating ◽  
High Speed Steel ◽  
Fine Scale

scholarly journals Formed nano-W - WC coatings on the high-speed steel substrate by the electrodischarge explosion

2019 ◽  
Vol 1393 ◽  
pp. 012084
Author(s):  
E G Grigoryev ◽  
K L Smirnov ◽  
E L Strizhakov ◽  
S V Neskoromniy
Keyword(s):  
High Speed ◽  
Steel Substrate ◽  
High Speed Steel

scholarly journals The effect of the interlayer CrN on adhesion characteristics of ta-C films on high-speed steel substrate

2013 ◽  
Vol 62 (9) ◽  
pp. 096802
Author(s):  
Han Liang ◽  
Liu De-Lian ◽  
Chen Xian ◽  
Zhao Yu-Qing
Keyword(s):  
High Speed ◽  
Steel Substrate ◽  
High Speed Steel

Study on Low Temperature Deposition of TiN Films and their Tribological Properties

2011 ◽  
Vol 189-193 ◽  
pp. 925-930 ◽  
Author(s):  
Xiu Qin Bai ◽  
Jian Li
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
High Speed ◽  
High Speed Steel ◽  
Film Structure ◽  
Tin Films ◽  
Low Temperature Deposition ◽  
Tin Thin Films ◽  
Temperature Deposition

The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperature magnetron sputtering and the counter-parts of rubbing pairs.

Direct Fractographic Evaluation of Multilayer CNx/TiN Films by Magnetron Sputtering

MRS Advances ◽  
2018 ◽  
Vol 3 (18) ◽  
pp. 949-955
Author(s):  
Gongsheng Song ◽  
Qiang Fu ◽  
Chunxu Pan
Keyword(s):  
Fracture Surface ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
High Speed ◽  
Steel Substrate ◽  
High Speed Steel ◽  
Interfacial Strength ◽  
High Hardness ◽  
Tin Films ◽  
Dc Reactive Magnetron Sputtering

ABSTRACTIn this paper, a multilayer CNx/TiN composite film on high-speed steel substrate was prepared by using a multi-arc assisted DC reactive magnetron sputtering system. The cross-section observations of the fracture surface reveal that the films show a pure cleavage fracture due to its super-high hardness, and the interfacial strength between the film and substrate is associates with the film thickness, i.e., 2μm is a critical thickness for the present deposition. That is to say, there is no disbonding or cracking at the interface when the film thickness is less than 2μm, while the interfacial failure is generated if the film thickness is larger than 2μm. This direct SEM observation of the fracture surface provides a distinct image for evaluating the mechanical property and also analyzing the failure mechanism of the films.

Evolution of TiN Coating Surface Roughness during Physical Vapor Deposition on High Speed Steel Substrate

2014 ◽  
Vol 604 ◽  
pp. 67-70
Author(s):  
Leonid Kupchenko ◽  
Rauno Tali ◽  
Eron Adoberg ◽  
Valdek Mikli ◽  
Vitali Podgursky
Keyword(s):  
Surface Roughness ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
High Speed ◽  
Steel Substrate ◽  
High Speed Steel ◽  
Growth Exponent ◽  
Force Microscopy ◽  
Tin Coatings ◽  
Atomic Force

TiN coatings with different thickness were prepared by arc ion plating (AIP) physical vapor deposition (PVD) on high speed steel (HSS) substrates. TiN coatings surface roughness was investigated by atomic force microscopy (AFM) and 3D optical profilometry and growth kinetics was described using scaling exponents β and α. The growth exponent β is 0.91-1.0 and the roughness exponent α is 0.77-0.81. Due to relatively high value of the exponent α, the surface diffusion is likely predominant smoothening mechanism of TiN growth.

Microstructure and Properties of CBN Diffusion Coating on High-Speed Steel

2011 ◽  
Vol 312-315 ◽  
pp. 542-547 ◽  
Author(s):  
Alexander S. Chaus ◽  
Lubomír Čaplovič ◽  
Ján Porubský
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Tool Life ◽  
High Speed ◽  
Diffusion Coating ◽  
High Speed Steel ◽  
X Ray ◽  
End Mills ◽  
The Relationship ◽  
Scanning Electron

CBN diffusion coating on the ball nose end mills made of AISI-M35 high speed steel (HSS) has been produced thermo-chemically. The microstructure and component depth profiles of the CBN diffusion layer have been studied by scanning electron microscopy and energy dispersive X-ray spectrometry. The results on laboratory cutting tests of ball nose end mills made of AISI-M35 HSS with and without complex CBN diffusion coating are also introduced in the paper. The relationship between wear kinetics and tool life has been established. It was shown that under the used cutting conditions the tool life of the mills with the coating was a factor of 1.6 higher than that of the mills without the coating. The higher tribological stability of the coating in cutting process was supported by metallographic observations of the worn surfaces using scanning electron microscopy.

Study of Residue Stress and Phase Structure of c-BN Films with BNx Implanted Buffer Interlayer on High Speed Steel Substrate

2012 ◽  
Vol 155-156 ◽  
pp. 795-799
Author(s):  
Jia Wu He ◽  
Zhi Hai Cai ◽  
Yue Lan Di ◽  
Zhen Yang
Keyword(s):  
Grain Size ◽  
Buffer Layer ◽  
Phase Structure ◽  
High Speed ◽  
Steel Substrate ◽  
High Speed Steel ◽  
Growth Conditions ◽  
Xps Analysis ◽  
Interfacial Mixing

In this paper, the influence of the BNx implanted buffer layer on growth and residue stress of c-BN films were mainly investigated. The experiment results showed that the introduce of BNx implanted buffer interlayer can increase the c-BN content in the films and reduce the residue stress obviously. When the nitrogen dose was 9.6×1017 N+/cm2, the residue stress of c-BN films reached the least value of 3.0GPa. AFM showed that the surface of the c-BN film on the BNx implanted buffer layer is low in roughness and small in grain size. XPS analysis results show an interfacial mixing in the buffer layer have an even N/B distribution. And the surface of buffer interlayer was mainly in BN phase, which is the main reason to improve the growth conditions and reduce the residue stress of c-BN films.

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