Erratum to “A method for the estimation of the film thickness and plate tilt angle in thin film misaligned plate–plate rheometry” [J. Non-Newtonian Fluid Mech. 165 (2010) 1419–1421]

2011 ◽  
Vol 166 (14-15) ◽  
pp. 882 ◽  
Author(s):  
Efrén Andablo-Reyes ◽  
Roque Hidalgo-Álvarez ◽  
Juan de Vicente
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Newtonian Fluid ◽  
Tilt Angle

scholarly journals Non-Newtonian Film Thickness Formation in Ultra-thin Film

2019 ◽  
Vol 16 (1) ◽  
pp. 6230-6244
Author(s):  
M. F. Abd Alsamieh
Keyword(s):  
Thin Film ◽  
Shear Stress ◽  
Film Thickness ◽  
Newtonian Fluid ◽  
Intermolecular Forces ◽  
Operating Conditions ◽  
Hydrodynamic Action ◽  
Newtonian Model ◽  
Newtonian Case ◽  
Ultra Thin Film

This paper aims to show the characteristics of ultra-thin films for non-Newtonian fluid using Ree-Eyring model where intermolecular forces of solvation and Van der Waal's are considered in addition to the hydrodynamic action to fulfill an identified need for such a conjunction. In this case, the film thickness and pressure distribution are obtained by simultaneous solution of the modified Reynolds’ equation incorporating the effect of non-Newtonian fluid, film thickness equation including elastic deformation caused by all contributing pressures and the load balance equation using Newton-Raphson method with Gauss-Seidel iterations. Effect of changing the operating conditions of speed, load, Eyring shear stress and slide-roll ratio on the characteristic of the contact has been studied. The results show that, for the case where the hydrodynamic action is the only pressure acting to support the applied load capacity, the film thickness and the pressure gradient at the exit of the contact obtained using non-Newtonian model is different than that formed using the Newtonian model especially for the increased value of slide-roll ratio. The main results of this study are that for ultra-thin film, the film thickness formed using non-Newtonian model is smaller compared to that obtained using Newtonian case and the discretization of the film thickness as the gap is reduced occurs similar to the results obtained using Newtonian model. The pressure shape shows no difference compared to that formed using the Newtonian case in which an oscillation around the Hertizan contact pressure shape due to the solvation effect appears. The results also show that for ultra-thin film, changing the Eyring shear stress does not affect the film thickness formation.

A method for the estimation of the film thickness and plate tilt angle in thin film misaligned plate–plate rheometry

2010 ◽  
Vol 165 (19-20) ◽  
pp. 1419-1421 ◽  
Author(s):  
Efrén Andablo-Reyes ◽  
Roque Hidalgo-Álvarez ◽  
Juan de Vicente
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Tilt Angle

scholarly journals Sub-Micron Moulding Topological Mass Transport Regimes in Angled Vortex Fluidic Flow

2020 ◽  
Author(s):  
Thaar M. D. Alharbi ◽  
Matt Jellicoe ◽  
Xuan Luo ◽  
Kasturi Vimalanathan ◽  
Ibrahim K Alsulami ◽  
...  
Keyword(s):  
Thin Film ◽  
Fluid Flow ◽  
Mass Transport ◽  
Film Thickness ◽  
Tilt Angle ◽  
Mechanical Energy ◽  
Transitional Region ◽  
Equilibrium Conditions ◽  
Fluidic Device ◽  
Topological Mass

<b>Induced mechanical energy in a thin film of liquid in an inclined rapidly rotating tube in the vortex fluidic device (VFD) can be harnessed for generating non-equilibrium conditions, which are optimal at 45<sup>o</sup> tilt angle, but the nature of the fluid flow is not understood. Through understanding that the fluid exhibits resonance behaviours from the confining boundaries of the glass surface and the meniscus that determines the liquid film thickness, we have established specific topological mass transport regimes. These topologies have been established through materials processing, as circular flow normal to the surface of the tube, double-helical flow across the thin film, and spicular flow, a transitional region where both effects contribute. This includes new phenomenological shear stressed crystallization and molecular drilling. The manifestation of these patterns has been observed by monitoring mixing times, temperature profiles, and film thickness against rotational speed of liquids in the tube. The grand sum of the different behavioural regimes is a general fluid flow model that accounts for all processing in the VFD at an optimal tilt angle of 45<sup>o</sup>, and provides a new concept in the fabrication of novel nanomaterials and controlling the organisation of matter.</b>

scholarly journals Sub-Micron Moulding Topological Mass Transport Regimes in Angled Vortex Fluidic Flow

2020 ◽  
Author(s):  
Thaar M. D. Alharbi ◽  
Matt Jellicoe ◽  
Xuan Luo ◽  
Kasturi Vimalanathan ◽  
Ibrahim K Alsulami ◽  
...  
Keyword(s):  
Thin Film ◽  
Fluid Flow ◽  
Mass Transport ◽  
Film Thickness ◽  
Tilt Angle ◽  
Mechanical Energy ◽  
Transitional Region ◽  
Equilibrium Conditions ◽  
Fluidic Device ◽  
Topological Mass

<b>Induced mechanical energy in a thin film of liquid in an inclined rapidly rotating tube in the vortex fluidic device (VFD) can be harnessed for generating non-equilibrium conditions, which are optimal at 45<sup>o</sup> tilt angle, but the nature of the fluid flow is not understood. Through understanding that the fluid exhibits resonance behaviours from the confining boundaries of the glass surface and the meniscus that determines the liquid film thickness, we have established specific topological mass transport regimes. These topologies have been established through materials processing, as circular flow normal to the surface of the tube, double-helical flow across the thin film, and spicular flow, a transitional region where both effects contribute. This includes new phenomenological shear stressed crystallization and molecular drilling. The manifestation of these patterns has been observed by monitoring mixing times, temperature profiles, and film thickness against rotational speed of liquids in the tube. The grand sum of the different behavioural regimes is a general fluid flow model that accounts for all processing in the VFD at an optimal tilt angle of 45<sup>o</sup>, and provides a new concept in the fabrication of novel nanomaterials and controlling the organisation of matter.</b>

Organic thin film thickness-dependent photocurrents polarity in graphene heterojunction phototransistor

Carbon ◽  
2021 ◽  
Vol 178 ◽  
pp. 506-514
Author(s):  
Meiyu He ◽  
Jiayue Han ◽  
Xingwei Han ◽  
Jun Gou ◽  
Ming Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Organic Thin Film ◽  
Thin Film Thickness

scholarly journals Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation

Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 23
Author(s):  
Weiguang Zhang ◽  
Jijun Li ◽  
Yongming Xing ◽  
Xiaomeng Nie ◽  
Fengchao Lang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Integrated Circuits ◽  
Film Thickness ◽  
Depth Range ◽  
Micro Electro Mechanical Systems ◽  
Si Substrates ◽  
Sio2 Thin Film ◽  
Average Grain Size

SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the dependence of the hardness of the SiO2 thin film with its thickness was analyzed. The results showed that the average grain size of SiO2 thin film increased with increasing film thickness. For the three SiO2 thin films with different thicknesses, the same relative penetration depth range of ~0.4–0.5 existed, above which the intrinsic hardness without substrate influence can be determined. The average intrinsic hardness of the SiO2 thin film decreased with the increasing film thickness and average grain size, which showed the similar trend with the Hall-Petch type relationship.

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

scholarly journals Optimization of Fiber Bragg Gratings Inscribed in Thin Films Deposited on D-Shaped Optical Fibers

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 4056
Author(s):  
José Javier Imas ◽  
Carlos R. Zamarreño ◽  
Ignacio del Villar ◽  
Ignacio R. Matías
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Optical Fibers ◽  
Flat Surface ◽  
Sno2 Thin Film ◽  
Thin Film Thickness ◽  
A Value ◽  
Surrounding Refractive Index ◽  
Reflected Power ◽  
Fabrication Parameters

A fiber Bragg grating patterned on a SnO2 thin film deposited on the flat surface of a D-shaped polished optical fiber is studied in this work. The fabrication parameters of this structure were optimized to achieve a trade-off among reflected power, full width half maximum (FWHM), sensitivity to the surrounding refractive index (SRI), and figure of merit (FOM). In the first place, the influence of the thin film thickness, the cladding thickness between the core and the flat surface of the D-shaped fiber (neck), and the length of the D-shaped zone over the reflected power and the FWHM were assessed. Reflected peak powers in the range from −2 dB to −10 dB can be easily achieved with FWHM below 100 pm. In the second place, the sensitivity to the SRI, the FWHM, and the FOM were analyzed for variations of the SRI in the 1.33–1.4 range, the neck, and the thin-film thickness. The best sensitivities theoretically achieved for this device are next to 40 nm/RIU, while the best FOM has a value of 114 RIU−1.

Sign in / Sign up

Export Citation Format

Share Document