Effect of substrate temperature and preferred orientation on the tribological properties of Tantalum nitride coatings

2020 ◽  
Author(s):  
J. Jenis Samuel ◽  
P. Krishna Kumar ◽  
D. Dinesh Kumar ◽  
A.M. Kamalan Kirubaharan ◽  
T. Arjun Raj ◽  
...  
Keyword(s):  
Substrate Temperature ◽  
Tribological Properties ◽  
Preferred Orientation ◽  
Tantalum Nitride ◽  
Nitride Coatings

scholarly journals Effect of Bias Voltage on Microstructure and Properties of Tantalum Nitride Coatings Deposited by RF Magnetron Sputtering

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 911
Author(s):  
Wei Dai ◽  
Yunzhan Shi
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Rf Magnetron Sputtering ◽  
Amorphous Structure ◽  
Tribological Performance ◽  
Tantalum Nitride ◽  
Growth Morphology ◽  
Low Friction ◽  
Nitride Coatings ◽  
Overall Performance

TaNx coatings were deposited by RF magnetron sputtering with different bias voltages. The growth morphology, crystalline structure, chemical bond structure, hardness and elastic modulus, adhesion strength and tribological performance of the coatings were studied as a function of the bias voltage. The results showed that an increasing bias voltage refines the coating grains and facilitates structure densification. Simultaneously, the structure of the TaNx coatings transfers from a composite structure consisting of TaN and Ta2N crystals, through a single composite mainly composed of the Ta2N crystal, to an amorphous structure as the bias voltage increases from low to high, indicating that the phase composition of the TaNx coatings can be varied by the bias voltage. The coating composed of Ta2N crystal showed a good overall performance including enhanced hardness, enhanced adhesive strength, and good tribological performance with enhanced wear resistance and a low friction coefficient of 0.18.

Characterisation of Titanium Nitride Thin Films Deposited by Cathodic Arc Plasma Technique on AISI D6 Tool Steel

2005 ◽  
Vol 498-499 ◽  
pp. 717-721 ◽  
Author(s):  
R.A. Vieira ◽  
Maria do Carmo de Andrade Nono
Keyword(s):  
Thin Film ◽  
Substrate Temperature ◽  
Tool Steel ◽  
Preferred Orientation ◽  
Interface Region ◽  
Tin Films ◽  
Tin Film ◽  
Electron Image ◽  
Steel Substrates ◽  
Cathodic Arc

TiN thin film has been produced on the surface of AISI D6 tool steel by using a titanium interlayer. In this work, the morphology, the microstructure and interface depth profile of TiN films deposited at two substrate temperatures (220 oC and 450 oC) in the coating process are presented and discussed. The AISI D6 tool steel substrates were coated with titanium thin film as the underlayer and with TiN thin film as the top layer. They were deposited by conventional cathodic arc process. The surfaces of TiN films were observed by scanning electron microscopy (SEM). The microstructure of these samples was analysed by X-ray diffractometry (XRD). The influence of the substrate temperature on the TiN film-Ti film-AISI D6 interface region were investigated by energy dispersive spectrometry (EDS) and its cross section were observed using backscattered electron image (BEI). The results showed that TiN films deposited at 220 oC formed a film of strongly (111) preferred orientation, while in 450 oC formed a film of (111) and (220) preferred orientation. The thickness of the TiN films increased with increasing substrate temperature. The results show that the interface region of the TiN film-Ti film-AISI D6 substrate system was significantly improved when higher substrate temperature during deposition is used.

Composition, structure and tribological properties of amorphous carbon nitride coatings

1994 ◽  
Vol 68-69 ◽  
pp. 611-615 ◽  
Author(s):  
Dong Li ◽  
Eric Cutiongco ◽  
Yip-Wah Chung ◽  
Ming-Show Wong ◽  
William D. Sproul
Keyword(s):  
Amorphous Carbon ◽  
Tribological Properties ◽  
Carbon Nitride ◽  
Nitride Coatings ◽  
Amorphous Carbon Nitride ◽  
Composition Structure

Nanoporosity improves the damage tolerance of nanostructured tantalum nitride coatings

2017 ◽  
Vol 133 ◽  
pp. 86-91 ◽  
Author(s):  
Song Xu ◽  
Jiang Xu ◽  
Paul Munroe ◽  
Zong-Han Xie
Keyword(s):  
Damage Tolerance ◽  
Tantalum Nitride ◽  
Nitride Coatings

scholarly journals Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 227 ◽  
Author(s):  
Ming Hu ◽  
Yi Dong ◽  
Yan Wang ◽  
Desheng Wang ◽  
Dong Jiang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Substrate Temperature ◽  
Tribological Properties ◽  
Room Temperature ◽  
Compact Structure ◽  
Radio Frequency Sputtering ◽  
Initial Substrate ◽  
Wear Life ◽  
Induced Changes ◽  
Deposited Film

Pure WS2 films were prepared by the radio frequency sputtering of a WS2 target with the initial substrate temperature controlled to −40, −25, 0 °C and room temperature by cooling the holder with liquid nitrogen, respectively. The influence of the substrate temperature on the microstructures and the tribological properties of the prepared films have been evaluated and the wear mechanism of the films was explained. It revealed that with decreasing the substrate temperature, the prepared WS2 film changed from the loose and coarse columnar plate structure for film deposited at room temperature to a much more compact morphology for film deposited at −40 °C. The WS2 film deposited at low temperature of −40 or −25 °C exhibited a long wear life higher than 5.0 × 105 sliding cycles, while this was about 1.5 × 105 cycles for the WS2 deposited at room temperature. The improved tribological properties for the low temperature-deposited film were mainly attributed to the much lower wear rate resulted from the compact structure as well as the sustained and steadily formed transform layer on the counterpart ball.

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