HREM Observations of Mg2Si-Based Multilayers for Soft X-Ray Optics
Multilayers fabricated with alternating materials having significant differences in X-ray scattering powers are being investigated for applications in soft X-ray optics. Multilayers consisting of combinations of W, Rh, Fe, Si3N4, SiO2 and Si, C, B4C have been studied in the past. Mg2Si based multilayer structures are theoretically efficient reflectors of wavelengths above the Mg-Kα line (9.89 Å) and the Mg-Lα line (251.5 Å) because of their low absorption in the respective wavelength regimes due to the presence of magnesium. In the present study, Mg2Si based multilayers fabricated on silicon substrates by ultra high vacuum rf sputtering have been characterized by HREM. W, Si, and Mg2Si targets in conjunction with the introduction of nitrogen were employed to deposit alternate Mg2Si and W or Si3N4 layers. We report here our preliminary observations of a characteristic short period W/Mg2Si layered structure used above the Mg-Kα line and two long period multilayers based on W/Mg2Si and Si3N4/Mg2Si used above the Mg-Lα line.