Effects of Molecular Cross-Sectional Areas of Adsorbed Nitrogen on the Brunauer–Emmett–Teller Analysis for Carbon-Based Slit Pores

Langmuir ◽  
2020 ◽  
Vol 36 (48) ◽  
pp. 14656-14665
Author(s):  
Jie Zou ◽  
Chunyan Fan ◽  
Xiu Liu
Keyword(s):  
Cross Sectional ◽  
Adsorbed Nitrogen ◽  
Slit Pores ◽  
Carbon Based

Electrical Properties of Carbon-Based Thin Film on Al2O3/Si

2015 ◽  
Vol 1112 ◽  
pp. 85-88
Author(s):  
Heldi Alfiadi ◽  
Angga Virdian ◽  
Yudi Darma
Keyword(s):  
Thin Film ◽  
Electrical Properties ◽  
Energy Band Diagram ◽  
Carbon Layer ◽  
Mis Structure ◽  
Cross Sectional ◽  
Unbalanced Magnetron Sputtering ◽  
Carbon Thin Film ◽  
Unbalanced Magnetron ◽  
Carbon Based

The electrical properties of Metal Insulator Semiconductor (MIS) structure comprise of carbon-based thin film grown on γ-Al2O3/Si have been studied. The carbon based thin film is deposited by using DC unbalanced magnetron sputtering using Fe doped carbon pellet as a target. Electrical properties of this structure have been analyzed through I-V characteristics measurements using cross-sectional electrode configurations. In-plane I-V measurement confirms the electrical conductivity of carbon layer is higher than Al2O3. The role of carbon thin film has been investigated by comparing the I-V characteristic of MIS structure with and without carbon thin film. Carbon layer and interface states of carbon/γ-Al2O3 have a significant contribution to enhance the cross-sectional current density. A simple energy band diagram model and theoretical calculation have been developed to further analyze this I-V characteristics data. This study is expected to be an alternative way to support the realization of future carbon-based electronic devices.

Comparative Investigation into the Electromagnetic Wave Shielding Effectiveness of Different Type Carbon-Based Fabrics

2019 ◽  
Vol 803 ◽  
pp. 81-87
Author(s):  
Hyun Ji Kim ◽  
Sung Hoon Kim
Keyword(s):  
Electromagnetic Wave ◽  
Nonwoven Fabric ◽  
Woven Fabric ◽  
Operating Frequency ◽  
Shielding Effectiveness ◽  
Frequency Range ◽  
Cross Sectional ◽  
Operating Frequency Range ◽  
Wide Operating ◽  
Carbon Based

Different type carbon-based fabrics, namely woven or nonwoven fabric, were employed to investigate the electromagnetic wave shielding effectiveness of the fabrics in the wide operating frequency range, namely 0.4GHz to 40GHz. The surface and cross sectional morphologies of the fabrics, their electrical conductivities, and their electromagnetic wave shielding effectiveness were investigated. In the case of woven fabric, the value of the electrical conductivity was much different according to the measuring direction in the woven fabric. For the nonwoven fabric, however, this value was independent on the measuring direction. The shielding effectiveness of the woven fabric was above 20dB in the range of 0.04GHz to 4GHz and then it decreased to below 20dB in the range of 4GHz to 40GHz. In contrast, the shielding effectiveness of nonwoven fabric was above 40dB in the whole operating frequency range in this work. Based on these results, the dependence of the shielding effectiveness of the woven or nonwoven fabrics according to the operating frequency and the optimal shielding effectiveness material in the wide operating frequency range was suggested and discussed.

scholarly journals Compton Scattering Imaging of Liquid Water in Porous Carbon-Based Materials

2021 ◽  
Vol 11 (9) ◽  
pp. 3851
Author(s):  
Naruki Tsuji ◽  
Yoichiro Tsuji ◽  
Yoshiharu Uchimoto ◽  
Hideto Imai ◽  
Yoshiharu Sakurai
Keyword(s):  
Compton Scattering ◽  
Liquid Water ◽  
Porous Carbon ◽  
Light Element ◽  
High Energy ◽  
Gas Diffusion ◽  
X Rays ◽  
Cross Sectional ◽  
Depth Dependency ◽  
Carbon Based

Synchrotron-based Compton scattering imaging with intense high-energy X-rays allows the visualization of light element substances in an electrochemical device under an operando condition. In this study, we apply this imaging technique to a water-contained, porous carbon-based composite, which is used as a material for the gas diffusion layer in polymer electrolyte fuel cells. Analyses of the two-dimensional intensity images of Compton scattered X-rays provide the cross-sectional distributions of liquid water, as well as the depth dependency of the water content. In addition, the analyses reveal a significant interaction between the carbon materials and water droplets.

SEM Cold Stage Techniques for the Observation of Vegetative and Floral Apices of Oat (Avena sativa L.) Plants

1977 ◽  
Vol 35 ◽  
pp. 590-591
Author(s):  
B. K. Kirchoff ◽  
L.F. Allard ◽  
W.C. Bigelow
Keyword(s):  
Critical Point ◽  
Avena Sativa ◽  
Substantial Improvement ◽  
Fresh Tissue ◽  
Cold Stage ◽  
Critical Point Drying ◽  
Almost All ◽  
Cell Collapse ◽  
Conductive Paint ◽  
Carbon Based

In attempting to use the SEM to investigate the transition from the vegetative to the floral state in oat (Avena sativa L.) it was discovered that the procedures of fixation and critical point drying (CPD), and fresh tissue examination of the specimens gave unsatisfactory results. In most cases, by using these techniques, cells of the tissue were collapsed or otherwise visibly distorted. Figure 1 shows the results of fixation with 4.5% formaldehyde-gluteraldehyde followed by CPD. Almost all cellular detail has been obscured by the resulting shrinkage distortions. The larger cracks seen on the left of the picture may be due to dissection damage, rather than CPD. The results of observation of fresh tissue are seen in Fig. 2. Although there is a substantial improvement over CPD, some cell collapse still occurs.Due to these difficulties, it was decided to experiment with cold stage techniques. The specimens to be observed were dissected out and attached to the sample stub using a carbon based conductive paint in acetone.

Automated Image Analysis Of Nuclear And Cytoplasmic Changes In Exfoliated Cells From Tracheas Treated With Carcinogen

1977 ◽  
Vol 35 ◽  
pp. 220-221
Author(s):  
S.F. Stinson ◽  
J.C. Lilga ◽  
M.B. Sporn
Keyword(s):  
Image Analysis ◽  
Pattern Analysis ◽  
Relative Proportion ◽  
Automated Image Analysis ◽  
Image Analyzer ◽  
Cross Sectional ◽  
Exfoliated Cells ◽  
Neoplastic Lesions ◽  
Analysis System ◽  
Morphologic Criterion

Increased nuclear size, resulting in an increase in the relative proportion of nuclear to cytoplasmic sizes, is an important morphologic criterion for the evaluation of neoplastic and pre-neoplastic cells. This paper describes investigations into the suitability of automated image analysis for quantitating changes in nuclear and cytoplasmic cross-sectional areas in exfoliated cells from tracheas treated with carcinogen.Neoplastic and pre-neoplastic lesions were induced in the tracheas of Syrian hamsters with the carcinogen N-methyl-N-nitrosourea. Cytology samples were collected intra-tracheally with a specially designed catheter (1) and stained by a modified Papanicolaou technique. Three cytology specimens were selected from animals with normal tracheas, 3 from animals with dysplastic changes, and 3 from animals with epidermoid carcinoma. One hundred randomly selected cells on each slide were analyzed with a Bausch and Lomb Pattern Analysis System automated image analyzer.

X-Ray Replication of Submicrometer Linewidth Patterns

1977 ◽  
Vol 35 ◽  
pp. 136-137
Author(s):  
Henry I. Smith ◽  
D.C. Flanders
Keyword(s):  
Electron Beam Lithography ◽  
Cross Sectional ◽  
X Ray ◽  
Electron Backscattering ◽  
Spatial Frequencies ◽  
Cross Sectional Profile ◽  
Carbon Foils ◽  
Sectional Profile ◽  
And Control ◽  
Soft Radiation

Scanning electron beam lithography has been used for a number of years to write submicrometer linewidth patterns in radiation sensitive films (resist films) on substrates. On semi-infinite substrates, electron backscattering severely limits the exposure latitude and control of cross-sectional profile for patterns having fundamental spatial frequencies below about 4000 Å(l),Recently, STEM'S have been used to write patterns with linewidths below 100 Å. To avoid the detrimental effects of electron backscattering however, the substrates had to be carbon foils about 100 Å thick (2,3). X-ray lithography using the very soft radiation in the range 10 - 50 Å avoids the problem of backscattering and thus permits one to replicate on semi-infinite substrates patterns with linewidths of the order of 1000 Å and less, and in addition provides means for controlling cross-sectional profiles. X-radiation in the range 4-10 Å on the other hand is appropriate for replicating patterns in the linewidth range above about 3000 Å, and thus is most appropriate for microelectronic applications (4 - 6).

A Field Emission System For Transmission Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 298-299
Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Optical System ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Objective Lens ◽  
Electron Optical System ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

Microstructural characterization of CoPtCr/Cr thin film disks by cross-section TEM and elongated probe micro-diffraction

1991 ◽  
Vol 49 ◽  
pp. 762-763
Author(s):  
M.A. Parker ◽  
K.E. Johnson ◽  
C. Hwang ◽  
A. Bermea
Keyword(s):  
Magnetic Recording ◽  
Electron Probe ◽  
Microstructural Characterization ◽  
Crystallographic Structure ◽  
Recording Media ◽  
Layer By Layer ◽  
Cross Sectional ◽  
New Techniques ◽  
Polished Side

We have reported the dependence of the magnetic and recording properties of CoPtCr recording media on the thickness of the Cr underlayer. It was inferred from XRD data that grain-to-grain epitaxy of the Cr with the CoPtCr was responsible for the interaction observed between these layers. However, no cross-sectional TEM (XTEM) work was performed to confirm this inference. In this paper, we report the application of new techniques for preparing XTEM specimens from actual magnetic recording disks, and for layer-by-layer micro-diffraction with an electron probe elongated parallel to the surface of the deposited structure which elucidate the effect of the crystallographic structure of the Cr on that of the CoPtCr.XTEM specimens were prepared from magnetic recording disks by modifying a technique used to prepare semiconductor specimens. After 3mm disks were prepared per the standard XTEM procedure, these disks were then lapped using a tripod polishing device. A grid with a single 1mmx2mm hole was then glued with M-bond 610 to the polished side of the disk.

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