High electrical conductivity of graphene-based transparent conductive films with silver nanocomposites

RSC Advances ◽  
2015 ◽  
Vol 5 (130) ◽  
pp. 108044-108049 ◽  
Author(s):  
Haibin Sun ◽  
Guixian Ge ◽  
Jiejun Zhu ◽  
Hailong Yan ◽  
Yang Lu ◽  
...  

Polycrystalline graphene films grown by chemical vapor deposition (CVD) possess outstanding electrical and optical properties, which make them alternative materials for applications in transparent conductive films (TCF).

2020 ◽  
Vol 44 (3) ◽  
pp. 780-790 ◽  
Author(s):  
Hui Zhao ◽  
Wenming Geng ◽  
Wei-Wei Cao ◽  
Jian-Gong Wen ◽  
Tao Wang ◽  
...  

PEDOT:PSS/GO-SWCNT films with a double-layer structure have high electrical conductivity and stability during bending.


Author(s):  
Yuri Ogura ◽  
Yuta Arata ◽  
Hiroyuki NISHINAKA ◽  
Masahiro YOSHIMOTO

Abstract We studied the phase diagram of (In x Ga1−x )2O3 thin films with a composition of x = 0 to 1 on Aluminum Nitride (AlN) templates grown using mist chemical vapor deposition. From X-ray diffraction results, we observed that the (In x Ga1−x )2O3 thin films exhibited three different single-phase crystal structures depending on the value of x: orthorhombic (κ)-(In x Ga1−x )2O3 for x ≤ 0.186, hexagonal (hex)-(In x Ga1−x )2O3 for 0.409 ≤ x ≤ 0.634, and body-centered cubic (bcc)-(In x Ga1−x )2O3 for x ≥ 0.772. The optical bandgap of (In x Ga1−x )2O3 was tuned from 3.27 eV (bcc-In2O3) and 4.17 eV (hex-InGaO3) to 5.00 eV (κ-Ga2O3). Moreover, hex-(In x Ga1−x )2O3 exhibited a wide bandgap (4.30 eV) and a low resistivity (7.4×10‒1 Ω·cm). Furthermore, hex-(In x Ga1−x )2O3 thin films were successfully grown on GaN and AlGaN/GaN templates. Therefore, hex-(In x Ga1−x )2O3 can be used in transparent conductive films for deep-ultraviolet LEDs.


2015 ◽  
Vol 6 ◽  
pp. 2028-2038 ◽  
Author(s):  
Andrea Capasso ◽  
Theodoros Dikonimos ◽  
Francesca Sarto ◽  
Alessio Tamburrano ◽  
Giovanni De Bellis ◽  
...  

Graphene films were produced by chemical vapor deposition (CVD) of pyridine on copper substrates. Pyridine-CVD is expected to lead to doped graphene by the insertion of nitrogen atoms in the growing sp2 carbon lattice, possibly improving the properties of graphene as a transparent conductive film. We here report on the influence that the CVD parameters (i.e., temperature and gas flow) have on the morphology, transmittance, and electrical conductivity of the graphene films grown with pyridine. A temperature range between 930 and 1070 °C was explored and the results were compared to those of pristine graphene grown by ethanol-CVD under the same process conditions. The films were characterized by atomic force microscopy, Raman and X-ray photoemission spectroscopy. The optical transmittance and electrical conductivity of the films were measured to evaluate their performance as transparent conductive electrodes. Graphene films grown by pyridine reached an electrical conductivity of 14.3 × 105 S/m. Such a high conductivity seems to be associated with the electronic doping induced by substitutional nitrogen atoms. In particular, at 930 °C the nitrogen/carbon ratio of pyridine-grown graphene reaches 3%, and its electrical conductivity is 40% higher than that of pristine graphene grown from ethanol-CVD.


RSC Advances ◽  
2017 ◽  
Vol 7 (83) ◽  
pp. 52555-52560 ◽  
Author(s):  
Jianhua Zhang ◽  
Zhangfu Chen ◽  
Xiaoxue Xu ◽  
Wei Liao ◽  
Lianqiao Yang

In this paper, a novel and scalable method to fabricate graphene/carbon nanotube (CNT) hybrid transparent conductive films on Cu substrates, which combines electroplating and chemical vapor deposition (CVD) is proposed and demonstrated.


2021 ◽  
Author(s):  
Jijun Qiu ◽  
Yun Liu ◽  
Zhihua Cai ◽  
Quang Phan ◽  
Zhisheng Shi

Infrared transparent and conductive coatings (ITCCs) are in significant demand in infrared imaging applications. The combination of high optical transparency in infrared range (1-12 μm) and high electrical conductivity, however,...


1996 ◽  
Vol 424 ◽  
Author(s):  
Hong-Seok Choi ◽  
Jae-Hong Jun ◽  
Keun-Ho Jang ◽  
Min-Koo Han

AbstractThe material properties of laser-annealed a-Si:Nx films were investigated. The a-Si:Nx films for laser-annealing were deposited by rf plasma enhanced chemical vapor deposition (PECVD) with NH3 and SiH4 gas mixtures. At the 0.35 of NH3/SiH4 ratio, the optical band-gap was abruptly increased to 2.82 eV from 2.05 eV by laser-annealing which indicates that Si-N bonding comes to be notable at that ratio. The electrical conductivity showed the maximum value of 4× 10-6 S/cm at the 0.11 of NH3/SiH4 ratio where the grain growth and the increase of Si-N bonding are optimized for the enhancement of electrical conductivity. The σP/σD ratio which is related to the defects states for photo generation centers was decreased with increasing NH 3/SiH 4 ratio. Our experimental data showed that the optical band gap and electrical conductivity of laserannealed a-Si:Nx films were dominantly affected by the NH3/SiH4 ratio at the 250 mJ/cm2 of laser-annealing energy density.


1991 ◽  
Vol 243 ◽  
Author(s):  
A. Greenwald ◽  
M. Horenstein ◽  
M. Ruane ◽  
W. Clouser ◽  
J. Foresi

AbstractSpire Corporation has deposited strontium-barium-niobate by chemical vapor deposition at atmospheric pressure using Ba(TMHD), Sr(TMHD), and Nb ethoxide. Deposition temperature as 550°C in an isothermal furnace. Films were deposited upon silicon (precoated with silica), platinum, sapphire, and quartz. Materials were characterized by RBS, X-ray diffraction, EDS, electron, and optical microscopy. Electrical and optical properties were measured at Boston University.


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