scholarly journals High-performance ITO thin films for on-cell touch sensor of foldable OLED displays

Author(s):  
Dong-pil Park ◽  
Won-hyeok Park ◽  
Jang-kun Song ◽  
Sang Soo Kim
2017 ◽  
Vol 64 (6) ◽  
pp. 2549-2555 ◽  
Author(s):  
Dan Chen ◽  
Jianguo Lu ◽  
Rongkai Lu ◽  
Lingxiang Chen ◽  
Zhizhen Ye

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Ryoko Suzuki ◽  
Yasutaka Nishi ◽  
Masaki Matsubara ◽  
Atsushi Muramatsu ◽  
Kiyoshi Kanie

AbstractIndium tin oxide (ITO) thin films with low resistivity and high transparency in the visible light region have been prepared on flexible plastic films by a deposition method using water mist containing ITO nanoparticles (NPs) under atmospheric conditions. The ITO NP-mist was generated by ultrasonic irradiation of a water dispersion. Our developed protrusion-rich ITO NPs were applied as the ITO NPs. The ITO NPs show high dispersion stability in water without the use of any dispersant. Comparison investigations revealed that utilization of the ITO NPs played a critical role in fabricating high-performance ITO thin films on flexible films, and the resistivity reached 9.0 × 10−3 Ω cm. The system could be expected to provide promising advances in the development of a mild and sustainable fabrication procedure for ITO thin films under mild atmospheric conditions without the use of expensive vacuum production systems or harmful and environmentally undesirable chemicals.


2021 ◽  
Author(s):  
Ryoko Suzuki ◽  
Yasutaka Nishi ◽  
Masaki Matsubara ◽  
Atsushi Muramatsu ◽  
Kiyoshi Kanie

Abstract Indium tin oxide (ITO) thin films with low resistivity and high transparency in the visible light region have been prepared on flexible plastic films by a deposition method using water mist containing ITO nanoparticles (NPs) under atmospheric conditions. The ITO NP-mist was generated by ultrasonic irradiation of a water dispersion. Our developed protrusion-rich ITO NPs were applied as the ITO NPs. The ITO NPs show high dispersion stability in water without the use of any dispersant. Comparison investigations revealed that utilization of the ITO NPs played a critical role in fabricating high-performance ITO thin films on flexible films, and the resistivity reached 9.0 x 10− 3 Ω·cm. The system could be expected to provide promising advances in the development of a mild and sustainable fabrication procedure for ITO thin films under mild atmospheric conditions without the use of expensive vacuum production systems or harmful and environmentally undesirable chemicals.


Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 153
Author(s):  
Chuen-Lin Tien ◽  
Tsai-Wei Lin

This paper proposes a measuring apparatus and method for simultaneous determination of the thermal expansion coefficient and biaxial Young’s modulus of indium tin oxide (ITO) thin films. ITO thin films simultaneously coated on N-BK7 and S-TIM35 glass substrates were prepared by direct current (DC) magnetron sputtering deposition. The thermo-mechanical parameters of ITO thin films were investigated experimentally. Thermal stress in sputtered ITO films was evaluated by an improved Twyman–Green interferometer associated with wavelet transform at different temperatures. When the heating temperature increased from 30 °C to 100 °C, the tensile thermal stress of ITO thin films increased. The increase in substrate temperature led to the decrease of total residual stress deposited on two glass substrates. A linear relationship between the thermal stress and substrate heating temperature was found. The thermal expansion coefficient and biaxial Young’s modulus of the films were measured by the double substrate method. The results show that the out of plane thermal expansion coefficient and biaxial Young’s modulus of the ITO film were 5.81 × 10−6 °C−1 and 475 GPa.


2021 ◽  
Vol 9 (13) ◽  
pp. 4522-4531
Author(s):  
Chao Yun ◽  
Matthew Webb ◽  
Weiwei Li ◽  
Rui Wu ◽  
Ming Xiao ◽  
...  

Interfacial resistive switching and composition-tunable RLRS are realized in ionically conducting Na0.5Bi0.5TiO3 thin films, allowing optimised ON/OFF ratio (>104) to be achieved with low growth temperature (600 °C) and low thickness (<20 nm).


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