The influence of Au film thickness and annealing conditions on the VLS-assisted growth of ZnO nanostructures

2014 ◽  
Vol 25 (21) ◽  
pp. 215601 ◽  
Author(s):  
K Govatsi ◽  
A Chrissanthopoulos ◽  
V Dracopoulos ◽  
S N Yannopoulos
Keyword(s):  
Film Thickness ◽  
Zno Nanostructures ◽  
Au Film ◽  
Annealing Conditions

Kinetics of a-Si:H Crystallization Induced by Gold at Low Temperatures

1992 ◽  
Vol 258 ◽  
Author(s):  
A.A. Pasa ◽  
M.B. Schubert ◽  
C.-D. Abel ◽  
W. Beyer ◽  
W. Losch ◽  
...  
Keyword(s):  
Activation Energy ◽  
Glow Discharge ◽  
Film Thickness ◽  
Raman Spectra ◽  
Low Temperatures ◽  
Crystallization Rate ◽  
Au Film ◽  
Annealing Conditions ◽  
Kinetics Of ◽  
Induced Crystallization

ABSTRACTThe Au-induced crystallization of a-Si:H has been studied by evaporating Au films of different thicknesses onto intrinsic glow discharge deposited a-Si:H layers. The presence of a sharp peak in the Raman spectra (FWHM≈9 cm-1, ω516 cm-1) of samples with a Au thickness larger than 2 nm, which have been annealed in vacuum at 400K≤T≤600K, indicate that the crystallites have approximately the same size (6nm) regardless of the annealing conditions. An investigation of crystallization versus Au-film thickness revealed, that the total crystallized volume is increasing with Au thickness, and furthermore a saturation of the crystallized volume takes place, most probably due to an exhaustion of the Au reservoir. The increase of crystallization rate with temperature follows an Arrhenius-like dependence with an activation energy of 1.1 eV. Changes in hydrogen content as a consequence of the crystallization have been monitored by H-effusion measurements: Au-coated a-Si:H samples show a strong H2 evolution at temperatures substantially lower than uncoated ones.

The effects of Au film thickness on the reliability of Sn-Pb solder joints

2015 ◽  
Author(s):  
Xiaorui Lv ◽  
Pengrong Lin ◽  
Yingzhuo Huang ◽  
Xueming Jiang ◽  
Binhao Lian ◽  
...  
Keyword(s):  
Film Thickness ◽  
Solder Joints ◽  
Au Film

Effects of annealing conditions and film thickness on electrical and optical properties of epitaxial Al-doped ZnO films

2016 ◽  
Vol 599 ◽  
pp. 19-26 ◽  
Author(s):  
S. Kuprenaite ◽  
A. Abrutis ◽  
V. Kubilius ◽  
T. Murauskas ◽  
Z. Saltyte ◽  
...  
Keyword(s):  
Optical Properties ◽  
Film Thickness ◽  
Zno Films ◽  
Electrical And Optical Properties ◽  
Annealing Conditions ◽  
Doped Zno

scholarly journals Gold Nanofilm-Coated Porous Silicon as Surface-Enhanced Raman Scattering Substrate

2019 ◽  
Vol 9 (22) ◽  
pp. 4806 ◽  
Author(s):  
Ibrahim Khalil ◽  
Chia-Man Chou ◽  
Kun-Lin Tsai ◽  
Steven Hsu ◽  
Wageeh A. Yehye ◽  
...  
Keyword(s):  
Thin Film ◽  
Porous Silicon ◽  
Raman Scattering ◽  
Film Thickness ◽  
Sers Substrate ◽  
Au Film ◽  
Surface Enhanced ◽  
Surface Enhanced Raman ◽  
Enhanced Raman Scattering ◽  
Au Thin Film

Metallic film-coated porous silicon (PSi) has been reported as a lucrative surface-enhanced Raman scattering (SERS) substrate. The solution-based fabrication process is facile and easy; however, it requires additional reducing agent and extra chemical treatment, as well as hinders the suitability as a reproducible SERS substrate due to irregular hot spot generation via irregular deposition of metallic nanocrystallites. To address this issue, we report a unique one-step electronic beam (e-beam) physical vapor deposition (PVD) method to fabricate a consistent layer of gold (Au) nanofilm on PSi. Moreover, to achieve the best output as a SERS substrate, PSi prepared by electrochemical etching was used as template to generate an Au layer of irregular surface, offering the surface roughness feature of the PSi–Au thin film. Furthermore, to investigate the etching role and Au film thickness, Au-nanocrystallites of varying thickness (5, 7, and 10 nm) showing discrete surface morphology were characterized and evaluated for SERS effect using Rhodamine 6G (R6G). The SERS signal of R6G adsorbed on PSi–Au thin film showed a marked enhancement, around three-fold enhancement factor (EF), than the Si–Au thin film. The optimal SERS output was obtained for PSi–Au substrate of 7 nm Au film thickness. This study thus indicates that the SERS enhancement relies on the Au film thickness and the roughness feature of the PSi–Au substrate.

Effects of Film Thickness and Annealing Conditions on 2223 Phase Growth in BSCCO Films Produced by Pb Vapor Doping

1990 ◽  
Vol 29 (Part 2, No. 6) ◽  
pp. L943-L946 ◽  
Author(s):  
Hirotoshi Hayakawa ◽  
Keikichi Nakamura ◽  
Shozo Ikeda ◽  
Keiichi Ogawa ◽  
Satoshi Takahashi
Keyword(s):  
Film Thickness ◽  
Phase Growth ◽  
Annealing Conditions

Continuous microscratch measurements of the practical and true works of adhesion for metal/ceramic systems

1996 ◽  
Vol 11 (12) ◽  
pp. 3133-3145 ◽  
Author(s):  
S. Venkataraman ◽  
D. L. Kohlstedt ◽  
W. W. Gerberich
Keyword(s):  
Thin Film ◽  
Energy Dissipation ◽  
Film Thickness ◽  
Annealing Temperature ◽  
Plastic Work ◽  
Practical Work ◽  
Work Of Adhesion ◽  
Plastic Energy ◽  
Annealing Conditions ◽  
Metal Ceramic

Using a continuous microscratch technique, the adhesion strengths of Pt, Cr, Ti, and Ta2N metallizations to NiO and Al2O3 substrates have been characterized. The practical work of adhesion was determined as a function of both thickness and annealing conditions. For all except the Ta2N films, the practical work of adhesion increases nonlinearly from a few tenths of a J/m2 to several J/m2 as the thickness of the thin film is increased, indicating that a greater amount of plastic work is expended in delaminating thicker films. Further, the practical work of adhesion also increases with increasing annealing temperature, indicating stronger bonding at the interface. In the limit that the film thickness tends to zero, the plastic energy dissipation in the film tends to zero. As a result, the extrapolation to zero thickness yields the true work of adhesion for that system.

scholarly journals Formation of precise 2D Au particle arrays via thermally induced dewetting on pre-patterned substrates

2011 ◽  
Vol 2 ◽  
pp. 318-326 ◽  
Author(s):  
Dong Wang ◽  
Ran Ji ◽  
Peter Schaaf
Keyword(s):  
Film Thickness ◽  
Au Nanoparticle ◽  
Patterned Substrates ◽  
Large Area ◽  
Thermally Induced ◽  
Patterned Substrate ◽  
Au Film ◽  
Patterned Structures ◽  
Circular Holes ◽  
Curvature Driven

The fabrication of precise 2D Au nanoparticle arrays over a large area is presented. The technique was based on pre-patterning of the substrate before the deposition of a thin Au film, and the creation of periodic particle arrays by subsequent dewetting induced by annealing. Two types of pre-patterned substrates were used: The first comprised an array of pyramidal pits and the second an array of circular holes. For the dewetting of Au films on the pyramidal pit substrate, the structural curvature-driven diffusion cooperates with capillarity-driven diffusion, resulting in the formation of precise 2D particle arrays for films within a structure dependent thickness-window. For the dewetting of Au films on the circular hole substrate, the periodic discontinuities in the films, induced by the deposition, can limit the diffusion paths and lead to the formation of one particle per individual separated region (holes or mesas between holes), and thus, result in the evolution of precise 2D particle arrays. The influence of the pre-patterned structures and the film thickness is analyzed and discussed. For both types of pre-patterned substrate, the Au film thickness had to be adjusted in a certain thickness-window in order to achieve the precise 2D particle arrays.

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