scholarly journals A multipurpose ultra-high vacuum-compatible chamber for in situ X-ray surface scattering studies over a wide range of temperature and pressure environment conditions

2013 ◽  
Vol 425 (13) ◽  
pp. 132002 ◽  
Author(s):  
P Ferrer ◽  
J Rubio-Zuazo ◽  
C Heyman ◽  
F Esteban-Betegón ◽  
G R Castro
Keyword(s):  
High Vacuum ◽  
Ultra High Vacuum ◽  
Surface Scattering ◽  
X Ray ◽  
Wide Range ◽  
Temperature And Pressure

Using a Moderate Vacuum, Hot/Cryo-Stage Equipped AFM for In-Situ Observation of α-Phase Growth In 60SN40PB Hypoeutectic Solder

1998 ◽  
Vol 4 (S2) ◽  
pp. 316-317
Author(s):  
D. N. Leonard ◽  
P.E. Russell
Keyword(s):  
Surface Science ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Scanning Tunneling ◽  
In Situ Observation ◽  
Atmospheric Conditions ◽  
Tunneling Microscopy ◽  
Wide Range ◽  
Gas Environment

Atomic force microscopy (AFM) was introduced in 1984, and proved to be more versatile than scanning tunneling microscopy (STM) due to the AFM's capabilities to scan non-conductive samples under atmospheric conditions and achieve atomic resolution. Ultra high vacuum (UHV) AFM has been used in surface science applications when control of oxidation and corrosion of a sample's surface are required. Expensive equipment and time consuming sample exchanges are two drawbacks of the UHV AFM system that limit its use. Until recently, no hot/cryo-stage, moderate vacuum, controlled gas environment AFM was commonly available.We have demonstrated that phase transformations are easily observable in metal alloys and polymers with the use of a moderate vacuum AFM that has in-situ heating/cooling capabilities and quick (within minutes) sample exchange times. This talk will describe the results of experiments involving a wide range of samples designed to make use of the full capabilities of a hot/cryo-stage, controlled gas environment AFM.

A compact UHV X-ray diffractometer for studying surfaces and interfaces

1998 ◽  
Vol 5 (3) ◽  
pp. 887-889
Author(s):  
Yoshikazu Fujii ◽  
Takeshi Nakamura ◽  
Mutsumi Kai ◽  
Kentaroh Yoshida
Keyword(s):  
High Vacuum ◽  
Layer Growth ◽  
Ultra High Vacuum ◽  
Layer By Layer ◽  
Crystal Surfaces ◽  
X Ray ◽  
Surfaces And Interfaces ◽  
Optical Table ◽  
Specimen Orientation

A compact ultra-high-vacuum (UHV) X-ray diffractometer for surface glancing X-ray scattering has been constructed. All the equipment, including a rotating-anode source of 18 kW and a UHV specimen chamber, is arranged on one optical table of dimensions 70 × 90 cm. The specimen chamber is 14 cm in diameter and 20 cm high and can be evacuated up to 3 × 10−8 Pa. It is equipped with two Be windows of thicknesses 0.2 and 0.4 mm. Specimen orientation in the vacuum is controlled from the outside. The specimen can be heated up to 773 K. The chamber has two evaporation cells and can be used for in situ observations of growing crystal surfaces. Using this instrument, we observed a mechanically polished Ag surface and successfully made an in situ observation of the layer-by-layer growth of a PbSe(111) surface. The instrument will be useful for preliminary experiments using laboratory sources, prior to final measurements at synchrotron radiation facilities.

Electron induced surface reactions of (η5-C5H5)Fe(CO)2Mn(CO)5, a potential heterobimetallic precursor for focused electron beam induced deposition (FEBID)

2018 ◽  
Vol 20 (11) ◽  
pp. 7862-7874 ◽  
Author(s):  
Ilyas Unlu ◽  
Julie A. Spencer ◽  
Kelsea R. Johnson ◽  
Rachel M. Thorman ◽  
Oddur Ingólfsson ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Electron Beam ◽  
Photoelectron Spectroscopy ◽  
Surface Reactions ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
X Ray ◽  
Electron Beam Induced Deposition

Electron-induced surface reactions of (η5-C5H5)Fe(CO)2Mn(CO)5were exploredin situunder ultra-high vacuum conditions using X-ray photoelectron spectroscopy and mass spectrometry.

Ultra-High Vacuum Grazing Incidence Small Angle X-Ray Scattering Camera for in Situ Surface Analysis

1993 ◽  
Vol 37 ◽  
pp. 413-418
Author(s):  
Joanne Levine Parrill ◽  
Jerome B. Cohen ◽  
Yip-Wah Chung
Keyword(s):  
Surface Analysis ◽  
Small Angle ◽  
High Vacuum ◽  
Grazing Incidence ◽  
Ultra High Vacuum ◽  
X Ray ◽  
X Ray Scattering ◽  
Position Sensitive ◽  
Ray Scattering

AbstractAn ultra-high vacuum chamber designed for in situ grazing incidence small angle x-ray scattering (GISAXS) surface analysis is described. Unique features of this equipment are the precision rotary feedthrough for angular alignment of the sample, the sample heating design, the Be window arrangement, and the compatibility of this chamber with both a rotating anode and a synchrotron beamline. This chamber was used as part of a GISAXS camera utilizing a 18 kW Rigaku rotating anode, pin-hole collimation, and a position sensitive detector. The resolution of this camera was 0.007 A-1 with a 1.4 mm wide beamstop and CuKα

UHV Preparation and In-Situ Surface Analysis of MNFE/Nife Exchange Structures: Interfacial Impurity Incorporation

1993 ◽  
Vol 313 ◽  
Author(s):  
Susan L. Cohen ◽  
John M. Baker ◽  
Michael A. Russak ◽  
Gerald J. Scilla ◽  
Cherngye Hwang ◽  
...  
Keyword(s):  
Surface Analysis ◽  
Photoelectron Spectroscopy ◽  
Exchange Coupling ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Impurity Incorporation ◽  
X Ray ◽  
Manufacturing Applications ◽  
Analysis System

ABSTRACTMnFe/NiFe exchange structures have been prepared in an ultra-high vacuum sputtering/surface analysis system. Controlled introduction of residual gas impurities such as O2 and H2O at the MnFe/NiFe interface is studied by in-situ x-ray photoelectron spectroscopy (XPS) and the exchange structures are magnetically characterized. Due to the extreme reactivity of the NiFe surface towards O2, the exchange coupling is severely degraded by only small exposures of this molecule to the NiFe surface. In contrast, H2O does not oxidize the NiFe surface and therefore can be tolerated in greater quantities in the sputtering chamber without detrimental loss of exchange. This understanding of the basic surface chemistry of the MnFe and NiFe surfaces can lead to improved sputtering practices in actual manufacturing applications.

An ultra-high vacuum electrochemical flow cell for in situ/operando soft X-ray spectroscopy study

2014 ◽  
Vol 85 (4) ◽  
pp. 043106 ◽  
Author(s):  
Debajeet K. Bora ◽  
Per-Anders Glans ◽  
John Pepper ◽  
Yi-Sheng Liu ◽  
Chun Du ◽  
...  
Keyword(s):  
High Vacuum ◽  
Flow Cell ◽  
Ultra High Vacuum ◽  
Spectroscopy Study ◽  
X Ray ◽  
Electrochemical Flow Cell
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