scholarly journals Highly Coherent Electron Beam from a Laser-Triggered Tungsten Needle Tip

2015 ◽  
Vol 114 (22) ◽  
Author(s):  
Dominik Ehberger ◽  
Jakob Hammer ◽  
Max Eisele ◽  
Michael Krüger ◽  
Jonathan Noe ◽  
...  
Keyword(s):  
Electron Beam ◽  
Tungsten Needle

scholarly journals A Universal Method to Weld Individual One-Dimensional Nanostructures with a Tungsten Needle Based on Synergy of the Electron Beam and Electrical Current

Nanomaterials ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 469
Author(s):  
Peng Zhao ◽  
Yu Zhang ◽  
Shuai Tang ◽  
Runze Zhan ◽  
Juncong She ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ohmic Contact ◽  
Welded Joints ◽  
Electrical Current ◽  
Universal Method ◽  
One Dimensional ◽  
1D Nanostructures ◽  
1D Nanostructure ◽  
Tungsten Needle

One-dimensional (1D) nanostructures are extensively used in the design of novel electronic devices, sensors, and energy devices. One of the major challenges faced by the electronics industry is the problem of contact between the 1D nanostructure and electrode, which can limit or even jeopardize device operations. Herein, a universal method that can realize good Ohmic and mechanical contact between an individual 1D nanostructure and a tungsten needle at sub-micron or micron scale is investigated and presented in a scanning electron microscope (SEM) chamber with the synergy of an electron beam and electrical current flowing through the welded joint. The linear I‒V curves of five types of individual 1D nanostructures, characterized by in-situ electrical measurements, demonstrate that most of them demonstrate good Ohmic contact with the tungsten needle, and the results of in-situ tensile measurements demonstrate that the welded joints possess excellent mechanical performance. By simulation analysis using the finite element method, it is proved that the local heating effect, which is mainly produced by the electrical current flowing through the welded joints during the welding process, is the key factor in achieving good Ohmic contact.

Voltage Measurement by Electron-Beam Probing

1988 ◽  
Vol 46 ◽  
pp. 196-197
Author(s):  
J.D. Reimer
Keyword(s):  
Electron Beam ◽  
Integrated Circuits ◽  
Electron Probe ◽  
Mechanical Damage ◽  
Alternative Technique ◽  
Voltage Measurement ◽  
Physical Damage ◽  
Needle Probe ◽  
Fine Tungsten ◽  
Tungsten Needle

Ihe voltage measurement technique, commonly used to probe internal nodes to determine signal delays or voltage levels in integrated circuits (ICs), is undergoing a fundamental change. Until recently, fine tungsten needles have been used almost exclusively to carry out these measurements. Advances in IC processing technology have allowed IC interconnection linewidth of 2 μm or less to become a reality. Ihis has caused the tungsten needle to remain at a disproportionate, unsuitable size (Fig. 1), typically causing substantial mechanical damage to the device surface being probed. In anticipation of this dilemma, an alternative technique has been developed, which uses an electron probe instead of a tungsten needle. Since the electron beam (e-beam) does not make contact, no physical damage occurs. Furthermore, it does not present the detrimental loading effect, as does the needle probe, which causes delays or possible device malfunction. Strategies for e-beam probing have been reviewed extensively.

Techniques for Transmission Electron Microscopy of Fiber-Matrix Interfaces in Aluminum Alloy-Boron Composites by Ion Erosio

1971 ◽  
Vol 29 ◽  
pp. 204-205
Author(s):  
G. G. Shaw
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Aluminum Alloy ◽  
Electron Beam ◽  
Pure Aluminum ◽  
Ion Milling ◽  
Transmission Electron ◽  
Fiber Matrix ◽  
Ion Erosion ◽  
Row Of Fibers

The morphology and composition of the fiber-matrix interface can best be studied by transmission electron microscopy and electron diffraction. For some composites satisfactory samples can be prepared by electropolishing. For others such as aluminum alloy-boron composites ion erosion is necessary.When one wishes to examine a specimen with the electron beam perpendicular to the fiber, preparation is as follows: A 1/8 in. disk is cut from the sample with a cylindrical tool by spark machining. Thin slices, 5 mils thick, containing one row of fibers, are then, spark-machined from the disk. After spark machining, the slice is carefully polished with diamond paste until the row of fibers is exposed on each side, as shown in Figure 1.In the case where examination is desired with the electron beam parallel to the fiber, preparation is as follows: Experimental composites are usually 50 mils or less in thickness so an auxiliary holder is necessary during ion milling and for easy transfer to the electron microscope. This holder is pure aluminum sheet, 3 mils thick.

Temperature Dependence of the Critical Electron Dose for Fatty Acid Monolayers

1982 ◽  
Vol 40 ◽  
pp. 78-79
Author(s):  
Kenneth H. Downing ◽  
Robert M. Glaeser
Keyword(s):  
Electron Beam ◽  
Fatty Acid ◽  
Inelastic Scattering ◽  
Temperature Dependence ◽  
Structural Damage ◽  
Direct Result ◽  
Second Step ◽  
Strong Temperature Dependence ◽  
Electron Dose ◽  
Covalent Bonds

The structural damage of molecules irradiated by electrons is generally considered to occur in two steps. The direct result of inelastic scattering events is the disruption of covalent bonds. Following changes in bond structure, movement of the constituent atoms produces permanent distortions of the molecules. Since at least the second step should show a strong temperature dependence, it was to be expected that cooling a specimen should extend its lifetime in the electron beam. This result has been found in a large number of experiments, but the degree to which cooling the specimen enhances its resistance to radiation damage has been found to vary widely with specimen types.

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Domain Formation in Synthetic Quartz

1971 ◽  
Vol 29 ◽  
pp. 156-157
Author(s):  
Joseph J. Comer
Keyword(s):  
Electron Beam ◽  
Room Temperature ◽  
Domain Formation ◽  
Synthetic Quartz ◽  
Transmission Electron ◽  
Black Spots ◽  
Diffraction Mode ◽  
Domain Boundaries ◽  
Kikuchi Lines ◽  
Straight Lines

Domains visible by transmission electron microscopy, believed to be Dauphiné inversion twins, were found in some specimens of synthetic quartz heated to 680°C and cooled to room temperature. With the electron beam close to parallel to the [0001] direction the domain boundaries appeared as straight lines normal to <100> and <410> or <510> directions. In the selected area diffraction mode, a shift of the Kikuchi lines was observed when the electron beam was made to traverse the specimen across a boundary. This shift indicates a change in orientation which accounts for the visibility of the domain by diffraction contrast when the specimen is tilted. Upon exposure to a 100 KV electron beam with a flux of 5x 1018 electrons/cm2sec the boundaries are rapidly decorated by radiation damage centers appearing as black spots. Similar crystallographio boundaries were sometimes found in unannealed (0001) quartz damaged by electrons.

Materials for Electron Beam Information Storage

1969 ◽  
Vol 27 ◽  
pp. 152-153 ◽  
Author(s):  
D. E. Speliotis
Keyword(s):  
Magnetic Field ◽  
Electron Beam ◽  
Recent Literature ◽  
Electron Beams ◽  
Information Storage ◽  
The Subject ◽  
The Magnetic Field

The interaction of electron beams with a large variety of materials for information storage has been the subject of numerous proposals and studies in the recent literature. The materials range from photographic to thermoplastic and magnetic, and the interactions with the electron beam for writing and reading the information utilize the energy, or the current, or even the magnetic field associated with the electron beam.

Application of Improved Voltage Compensation in the SEM to Imaging of Organic Materials

1973 ◽  
Vol 31 ◽  
pp. 444-445
Author(s):  
P.J. Killingworth ◽  
M. Warren
Keyword(s):  
Electron Beam ◽  
Organic Materials ◽  
Operating Parameters ◽  
Low Density ◽  
Beam Diameter ◽  
Incident Electron Beam ◽  
Specimen Material ◽  
Voltage Compensation ◽  
Selection Of ◽  
Scanning Electron

Ultimate resolution in the scanning electron microscope is determined not only by the diameter of the incident electron beam, but by interaction of that beam with the specimen material. Generally, while minimum beam diameter diminishes with increasing voltage, due to the reduced effect of aberration component and magnetic interference, the excited volume within the sample increases with electron energy. Thus, for any given material and imaging signal, there is an optimum volt age to achieve best resolution.In the case of organic materials, which are in general of low density and electric ally non-conducting; and may in addition be susceptible to radiation and heat damage, the selection of correct operating parameters is extremely critical and is achiev ed by interative adjustment.

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