Electrostatic discharge (ESD) and failure analysis: models, methodologies and mechanisms

Author(s):  
S.H. Voldman

2014 ◽  
Vol 44 ◽  
pp. 62-70 ◽  
Author(s):  
P. Denis ◽  
P. Dherbécourt ◽  
O. Latry ◽  
C. Genevois ◽  
F. Cuvilly ◽  
...  


2008 ◽  
Vol 50 (2) ◽  
pp. 268-276 ◽  
Author(s):  
Giorgi Muchaidze ◽  
Jayong Koo ◽  
Qing Cai ◽  
Tun Li ◽  
Lijun Han ◽  
...  


2009 ◽  
Vol 48 (5) ◽  
pp. 052102 ◽  
Author(s):  
Hiroyuki Ichikawa ◽  
Shinji Matsukawa ◽  
Kotaro Hamada ◽  
Akira Yamaguchi ◽  
Takashi Nakabayashi




2007 ◽  
Vol 47 (9-11) ◽  
pp. 1818-1822 ◽  
Author(s):  
J. Ruan ◽  
N. Nolhier ◽  
M. Bafleur ◽  
L. Bary ◽  
F. Coccetti ◽  
...  


Author(s):  
Tan Ewe Chhong

Abstract This paper presents electrostatic discharge (ESD) damage simulation results on good units of the RF monolithic microwave integrated circuit device. Two ESD test models, human body model and machine model, simulators were used to simulate the ESD damage on the good units of the RF MMIC devices in different pin configurations. The paper presents the failure analysis results on the field returned units, the ESD damage simulation results, and the failure analysis results on radio frequency operating life failure units. Based on the simulation results obtained, it was concluded that the ESD wounded devices would exhibit a short failure (catastrophic failure) and a low Id failure (latent failure) after being used in the application or field. It is recommended that the static electricity should be eliminated in the workplace at customer site by grounding the operators, equipment and devices in order to prevent the ESD damage.



Author(s):  
Scott M. Hull

Abstract Field failures of nichrome thin-film resistors have been investigated recently for several pieces of spaceflight hardware. These failures have involved resistance shifts ranging from a few percent to complete open circuits. Failure analysis and duplication of these failures have revealed that the failures were caused by electrostatic discharge. The failure characteristics and the circuit conditions necessary for failure have been studied for several types of thin-film resistors, including nichrome and tantalum nitride resistive elements. The effects of latent damage and resistive pattern design will also be discussed.



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