Emulation of double gate transistor in ultra-thin body with thin buried oxide SOI MOSFETs

Author(s):  
M. K. MdArshad ◽  
U. Hashim
Keyword(s):  
2008 ◽  
Vol 17 (8) ◽  
pp. 3077-3082 ◽  
Author(s):  
Luan Su-Zhen ◽  
Liu Hong-Xia

2016 ◽  
Vol 117 ◽  
pp. 100-116 ◽  
Author(s):  
Pierre Morin ◽  
Sylvain Maitrejean ◽  
Frederic Allibert ◽  
Emmanuel Augendre ◽  
Qing Liu ◽  
...  

2020 ◽  
Vol 15 (1) ◽  
pp. 1-6
Author(s):  
Ricardo Cardoso Rangel ◽  
Katia R. A. Sasaki ◽  
Leonardo Shimizu Yojo ◽  
João Antonio Martino

This work analyzes the third generation BESOI MOSFET (Back-Enhanced Silicon-On-Insulator Metal-Oxide-Semiconductor Field-Effect-transistor) built on UTBB (Ultra-Thin Body and Buried Oxide), comparing it to the BESOI with thick buried oxide (first generation). The stronger coupling between front and back interfaces of the UTBB BESOI device improves in 67% the current drive, 122% the maximum transconductance and 223% the body factor. Operating with seven times lower back gate bias, the UTBB BESOI MOSFET presented more compatibility with standard SOI CMOS (Complementary MOS) technology than the BESOI with thick buried oxide.


2006 ◽  
Vol 53 (6) ◽  
pp. 3363-3371 ◽  
Author(s):  
D. Munteanu ◽  
V. Ferlet-Cavrois ◽  
J. L. Autran ◽  
P. Paillet ◽  
J. Baggio ◽  
...  

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