Simulation of transportation channel of output electron beam from synchrotron “Pakhra”

NSC KIPT subcritical facility “Neutron Source” uses rectangular tungsten or uranium target of 6464 mm top cross-section. To generate maximum neutron flux, prevent overheating of the target and reduce thermal stress during the facility power operation one should provide uniform electron beam distribution at the target top surface. During the facility design three different possibilities of electron beam density redistribution above the target surface were considered. These were the fast beam scanning with two dimensional scanning magnets; the method of uniform beam distribution formation with linear focusing elements (dipole and quadrupole magnets) and nonlinear focusing elements (octupole magnets), when final required rectangular beam shape with homogeneous beam density is formed at target; and combined method, when one forms the small rectangular beam with homogeneous beam density distribution and scan it over the target surface with scanning magnets. In the paper the all three methods are considered and discussed taking into account the layout of the transportation channel of NSC KIPT subcritical facility “Neutron Source”. For the first stage of the facility start-up and pilot operation the fast scanning method was chosen, realised and tested. The results of the beam distribution measurements over the surface of the target during the facility adjustment and start up are presented.

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Methods of increasing the dielectric strength of the accelerating gap in an electron source with a plasma cathode

Journal of Physics Conference Series ◽

10.1088/1742-6596/2064/1/012119 ◽

2021 ◽

Vol 2064 (1) ◽

pp. 012119

Author(s):

P V Moskvin ◽

V N Devyatkov ◽

V I Shin ◽

M S Vorobyov ◽

N N Koval ◽

...

Keyword(s):

Electron Beam ◽

Dielectric Strength ◽

Plasma Source ◽

Beam Deflection ◽

Cathode Plasma ◽

Plasma Cathode ◽

Transport Length ◽

Transportation Channel ◽

Breakdown Probability ◽

Long Pulse

Abstract This work represents the investigations for decreasing acceleration gap breakdown probability of plasma source of electrons SOLO, with grid stabilization of the boundaries of the arc cathode plasma. We increased the distance to the treated target, bent the transportation channel of the electron beam, created additional plasma in the anode space, and increased the beam front. The effect of the above measures on the breakdown probability when the target is exposed of a low-energy electron beam with a power density of up to 0.5 MW/cm2 with a diameter of 2.5 cm was investigated separately. Beam deflection is most effective at relatively long pulse durations of 150 μs and accelerating voltage of 20 kV, rather than a lower one. It was possible to double the maximum power for the same beam transport length applied to a low-melting target. Preionization in the anode proved to be effective for relatively short beams of 15 μs duration.

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DYNAMICS OF THE ELECTRON BEAM GENERATED BY THE MAGNETRON GUN WITH DIFFERENT CONFIGURATIONS OF THE MAGNETIC FIELD IN THE TRANSPORTATION CHANNEL

10.46813/2021-136-121 ◽

2021 ◽

pp. 121-125

Author(s):

O.S. Mazmanishvili ◽

M.G. Reshetnyak ◽

V.P. Romasko ◽

I.A. Chertishchev

Keyword(s):

Magnetic Field ◽

Experimental Data ◽

Electron Beam ◽

Secondary Emission ◽

Beam Diameter ◽

Gradient Magnetic Field ◽

Cathode Voltage ◽

Transport Channel ◽

Transportation Channel ◽

The Magnetic Field

The dynamics of the dimensions of the electron beam generated by the magnetron gun in the particle transport channel and the efficiency of focusing the tubular electron beam in the gradient magnetic field are investigated. The experiments were carried out with magnetron guns with secondary-emission cathodes (cathode diameters 36 and 16 mm, anodes diameters 78 and 36 mm) at cathode voltage of 20...80 kV. Magnetic fields were created both by the solenoid and jointly by the solenoid and the permanent magnet. The dependence of the radial distribution of the beam on metal targets on the amplitude and gradient of the magnetic field along the axis of the system is inves-tigated. The possibility of controlling the beam diameter by varying the magnetic field is shown. The imprints of collimated beams were obtained experimentally on targets located at selected distances. The obtained experimental data agree with the results of numerical simulation. It is shown that with an increase in the amplitude of the gradient magnetic field, the effect of radial focusing of the beam is more pronounced.

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Techniques for Transmission Electron Microscopy of Fiber-Matrix Interfaces in Aluminum Alloy-Boron Composites by Ion Erosio

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100065079 ◽

1971 ◽

Vol 29 ◽

pp. 204-205

Author(s):

G. G. Shaw

Keyword(s):

Electron Microscopy ◽

Transmission Electron Microscopy ◽

Aluminum Alloy ◽

Electron Beam ◽

Pure Aluminum ◽

Ion Milling ◽

Transmission Electron ◽

Fiber Matrix ◽

Ion Erosion ◽

Row Of Fibers

The morphology and composition of the fiber-matrix interface can best be studied by transmission electron microscopy and electron diffraction. For some composites satisfactory samples can be prepared by electropolishing. For others such as aluminum alloy-boron composites ion erosion is necessary.When one wishes to examine a specimen with the electron beam perpendicular to the fiber, preparation is as follows: A 1/8 in. disk is cut from the sample with a cylindrical tool by spark machining. Thin slices, 5 mils thick, containing one row of fibers, are then, spark-machined from the disk. After spark machining, the slice is carefully polished with diamond paste until the row of fibers is exposed on each side, as shown in Figure 1.In the case where examination is desired with the electron beam parallel to the fiber, preparation is as follows: Experimental composites are usually 50 mils or less in thickness so an auxiliary holder is necessary during ion milling and for easy transfer to the electron microscope. This holder is pure aluminum sheet, 3 mils thick.

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Temperature Dependence of the Critical Electron Dose for Fatty Acid Monolayers

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100053188 ◽

1982 ◽

Vol 40 ◽

pp. 78-79

Author(s):

Kenneth H. Downing ◽

Robert M. Glaeser

Keyword(s):

Electron Beam ◽

Fatty Acid ◽

Inelastic Scattering ◽

Temperature Dependence ◽

Structural Damage ◽

Direct Result ◽

Second Step ◽

Strong Temperature Dependence ◽

Electron Dose ◽

Covalent Bonds

The structural damage of molecules irradiated by electrons is generally considered to occur in two steps. The direct result of inelastic scattering events is the disruption of covalent bonds. Following changes in bond structure, movement of the constituent atoms produces permanent distortions of the molecules. Since at least the second step should show a strong temperature dependence, it was to be expected that cooling a specimen should extend its lifetime in the electron beam. This result has been found in a large number of experiments, but the degree to which cooling the specimen enhances its resistance to radiation damage has been found to vary widely with specimen types.

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Lithography below 100 nm

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100074367 ◽

1983 ◽

Vol 41 ◽

pp. 96-99

Author(s):

L. D. Jackel

Keyword(s):

Spatial Distribution ◽

Electron Beam ◽

Electron Scattering ◽

Electron Beam Lithography ◽

Substrate Material ◽

Local Electron ◽

Electron Dose ◽

Positive Resist ◽

Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

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Domain Formation in Synthetic Quartz

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100064839 ◽

1971 ◽

Vol 29 ◽

pp. 156-157

Author(s):

Joseph J. Comer

Keyword(s):

Electron Beam ◽

Room Temperature ◽

Domain Formation ◽

Synthetic Quartz ◽

Transmission Electron ◽

Black Spots ◽

Diffraction Mode ◽

Domain Boundaries ◽

Kikuchi Lines ◽

Straight Lines

Domains visible by transmission electron microscopy, believed to be Dauphiné inversion twins, were found in some specimens of synthetic quartz heated to 680°C and cooled to room temperature. With the electron beam close to parallel to the [0001] direction the domain boundaries appeared as straight lines normal to <100> and <410> or <510> directions. In the selected area diffraction mode, a shift of the Kikuchi lines was observed when the electron beam was made to traverse the specimen across a boundary. This shift indicates a change in orientation which accounts for the visibility of the domain by diffraction contrast when the specimen is tilted. Upon exposure to a 100 KV electron beam with a flux of 5x 1018 electrons/cm2sec the boundaries are rapidly decorated by radiation damage centers appearing as black spots. Similar crystallographio boundaries were sometimes found in unannealed (0001) quartz damaged by electrons.

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Materials for Electron Beam Information Storage

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100062671 ◽

1969 ◽

Vol 27 ◽

pp. 152-153 ◽

Cited By ~ 1

Author(s):

D. E. Speliotis

Keyword(s):

Magnetic Field ◽

Electron Beam ◽

Recent Literature ◽

Electron Beams ◽

Information Storage ◽

The Subject ◽

The Magnetic Field

The interaction of electron beams with a large variety of materials for information storage has been the subject of numerous proposals and studies in the recent literature. The materials range from photographic to thermoplastic and magnetic, and the interactions with the electron beam for writing and reading the information utilize the energy, or the current, or even the magnetic field associated with the electron beam.

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Application of Improved Voltage Compensation in the SEM to Imaging of Organic Materials

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100072666 ◽

1973 ◽

Vol 31 ◽

pp. 444-445

Author(s):

P.J. Killingworth ◽

M. Warren

Keyword(s):

Electron Beam ◽

Organic Materials ◽

Operating Parameters ◽

Low Density ◽

Beam Diameter ◽

Incident Electron Beam ◽

Specimen Material ◽

Voltage Compensation ◽

Selection Of ◽

Scanning Electron

Ultimate resolution in the scanning electron microscope is determined not only by the diameter of the incident electron beam, but by interaction of that beam with the specimen material. Generally, while minimum beam diameter diminishes with increasing voltage, due to the reduced effect of aberration component and magnetic interference, the excited volume within the sample increases with electron energy. Thus, for any given material and imaging signal, there is an optimum volt age to achieve best resolution.In the case of organic materials, which are in general of low density and electric ally non-conducting; and may in addition be susceptible to radiation and heat damage, the selection of correct operating parameters is extremely critical and is achiev ed by interative adjustment.

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Nucleation and Early Growth of Sputtered thin Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100069570 ◽

1970 ◽

Vol 28 ◽

pp. 516-517

Author(s):

Dudley M. Sherman ◽

Thos. E. Hutchinson

Keyword(s):

Thin Films ◽

Electron Beam ◽

Ion Beam ◽

Ion Source ◽

Water Cooling ◽

Stages Of Growth ◽

Lens Assembly ◽

Microscope Technique ◽

Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

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