The role of surface forces in metal–metal contacts

1985 ◽  
Vol 3 (3) ◽  
pp. 757-761 ◽  
Author(s):  
M. D. Pashley ◽  
J. B. Pethica
2015 ◽  
Vol 79 (5) ◽  
pp. 1099-1109 ◽  
Author(s):  
Luca Bindi ◽  
Emil Makovicky

AbstractWe have characterized the crystal structure of natural kutinaite, a rare mineral from the ores of Černý Důl, Czech Republic, by single-crystal X-ray diffraction and chemical analysis. We found that the structure of natural kutinaite is not identical to that of synthetic Cu14Ag6As7, previously reported to be cubic, space group Pm3m. Although topologically similar, the structure of natural kutinaite is indeed tetragonal, space group P4/mmm, with cell parameters: a = 11.789(2), c = 11.766(2) Å, V = 1635.5(4) Å3 and Z = 4. Electron microprobe analyses pointed to the (K,Tl)0.25Cu14Ag6As6.75 stoichiometry (Z = 4), or (K, Tl)Cu56Ag24As27 with Z = 16. The crystal structure of an untwinned crystal has been refined to R1 = 2.61%. It consists of clusters of eight edge-sharing tetrahedra of Cu, which alternate in a 3D chess-board manner with octahedral clusters of six Ag atoms. The latter are surrounded by triangularly coordinated copper in eight faces of a cuboctahedron. The last structure components are large cavities containing partly occupied (K,Tl) sites, coordinated by 18 Ag and As ligands. The structure is full of direct metal-metal contacts although As plays the role of anion, associating especially with copper.


Author(s):  
L.J. Chen ◽  
Y.F. Hsieh

One measure of the maturity of a device technology is the ease and reliability of applying contact metallurgy. Compared to metal contact of silicon, the status of GaAs metallization is still at its primitive stage. With the advent of GaAs MESFET and integrated circuits, very stringent requirements were placed on their metal contacts. During the past few years, extensive researches have been conducted in the area of Au-Ge-Ni in order to lower contact resistances and improve uniformity. In this paper, we report the results of TEM study of interfacial reactions between Ni and GaAs as part of the attempt to understand the role of nickel in Au-Ge-Ni contact of GaAs.N-type, Si-doped, (001) oriented GaAs wafers, 15 mil in thickness, were grown by gradient-freeze method. Nickel thin films, 300Å in thickness, were e-gun deposited on GaAs wafers. The samples were then annealed in dry N2 in a 3-zone diffusion furnace at temperatures 200°C - 600°C for 5-180 minutes. Thin foils for TEM examinations were prepared by chemical polishing from the GaA.s side. TEM investigations were performed with JE0L- 100B and JE0L-200CX electron microscopes.


2020 ◽  
Author(s):  
Shubham Deolka ◽  
Orestes Rivada Wheelaghan ◽  
Sandra Aristizábal ◽  
Robert Fayzullin ◽  
Shrinwantu Pal ◽  
...  

We report selective formation of heterobimetallic PtII/CuI complexes that demonstrate how facile bond activation processes can be achieved by altering reactivity of common organoplatinum compounds through their interaction with another metal center. The interaction of the Cu center with Pt center and with a Pt-bound alkyl group increases the stability of PtMe2 towards undesired rollover cyclometalation. The presence of the CuI center also enables facile transmetalation from electron-deficient tetraarylborate [B(ArF)4]- anion and mild C-H bond cleavage of a terminal alkyne, which was not observed in the absence of an electrophilic Cu center. The DFT study indicates that the role of Cu center acts as a binding site for alkyne substrate, while activating its terminal C-H bond.


2012 ◽  
Vol 31 (17) ◽  
pp. 6063-6070 ◽  
Author(s):  
Sabrina Trupia ◽  
Thomas E. Bitterwolf ◽  
William E. Geiger

2021 ◽  
Vol 130 (18) ◽  
pp. 185102
Author(s):  
Salvatore Timpa ◽  
Mehrdad Rahimi ◽  
Jacko Rastikian ◽  
Stéphan Suffit ◽  
François Mallet ◽  
...  
Keyword(s):  

2014 ◽  
Vol 117 ◽  
pp. 13-17 ◽  
Author(s):  
A. Soultati ◽  
D.G. Georgiadou ◽  
A. Douvas ◽  
P. Argitis ◽  
D. Alexandropoulos ◽  
...  

2009 ◽  
Vol 255 (16) ◽  
pp. 7380-7384 ◽  
Author(s):  
Silvia A. Fuente ◽  
Patricia G. Belelli ◽  
María M. Branda ◽  
Ricardo M. Ferullo ◽  
Norberto J. Castellani

Energies ◽  
2020 ◽  
Vol 13 (7) ◽  
pp. 1589 ◽  
Author(s):  
Simone M. P. Meroni ◽  
Katherine E. A. Hooper ◽  
Tom Dunlop ◽  
Jenny A. Baker ◽  
David Worsley ◽  
...  

The fully printable carbon triple-mesoscopic perovskite solar cell (C-PSC) has already demonstrated good efficiency and long-term stability, opening the possibility of lab-to-fab transition. Modules based on C-PSC architecture have been reported and, at present, are achieved through the accurate registration of each of the patterned layers using screen-printing. Modules based on this approach were reported with geometric fill factor (g-FF) as high as 70%. Another approach to create the interconnects, the so-called scribing method, was reported to achieve more than 90% g-FF for architectures based on evaporated metal contacts, i.e., without a carbon counter electrode. Here, for the first time, we adopt the scribing method to selectively remove materials within a C-PSC. This approach allowed a deep and selective scribe to open an aperture from the transparent electrode through all the layers, including the blocking layer, enabling a direct contact between the electrodes in the interconnects. In this work, a systematic study of the interconnection area between cells is discussed, showing the key role of the FTO/carbon contact. Furthermore, a module on 10 × 10 cm2 substrate with the optimised design showing efficiency over 10% is also demonstrated.


2018 ◽  
Vol 924 ◽  
pp. 339-344 ◽  
Author(s):  
Fabrizio Roccaforte ◽  
Marilena Vivona ◽  
Giuseppe Greco ◽  
Raffaella Lo Nigro ◽  
Filippo Giannazzo ◽  
...  

The physics and technology of metal/semiconductor interfaces are key-points in the development of silicon carbide (SiC) based devices. Although in the last decade, the metal to 4H-SiC contacts, either Ohmic or Schottky type, have been extensively investigated with important achievements, these remain even now an intriguing topic since metal contacts are fundamental bricks of all electronic devices. Hence, their comprehension is at the base of the improvement of the performances of simple devices and complex systems. In this context, this paper aims to highlight some relevant aspects related to metal/semiconductor contacts to SiC, both on n-type and p-type, with an emphasis on the role of the barrier and on the carrier transport mechanisms at the interfaces.


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