The design and optimization of high-contrast all-dielectric metastructures for visible-range applications (Conference Presentation)

Author(s):  
Hao Yang ◽  
He Liu ◽  
Boxaing Song ◽  
Yuanrui Li ◽  
Deming Meng ◽  
...  
Author(s):  
Paulo Lourenco ◽  
Alessandro Fantoni ◽  
João Costa ◽  
Miguel Fernandes ◽  
Manuela Vieira

1973 ◽  
Vol 2 (5) ◽  
pp. 445-449 ◽  
Author(s):  
Valentin G Dmitriev ◽  
R A Eremeeva ◽  
A G Ershov ◽  
I Ya Itskhoki ◽  
E P Karpova

Nanomaterials ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 67
Author(s):  
Elena A. Shakhno ◽  
Quang D. Nguyen ◽  
Dmitry A. Sinev ◽  
Elizaveta V. Matvienko ◽  
Roman A. Zakoldaev ◽  
...  

Laser-induced thermochemical recording of nano- and microsized structures on thin films has attracted intense interest over the last few decades due to essential applications in the photonics industry. Nevertheless, the relationship between the laser parameters and the properties of the formed oxide structures, both geometrical and optical, is still implicit. In this work, direct laser interference patterning of the titanium (Ti) film in the oxidative regime was applied to form submicron periodical structures. Depending on the number of laser pulses, the regime of high contrast structures recording was observed with the maximum achievable thickness of the oxide layer. The investigation revealed high transmittance of the formed oxide layers, i.e., the contrast of recorded structures reached up to 90% in the visible range. To analyze the experimental results obtained, a theoretical model was developed based on calculations of the oxide formation dynamics. The model operates on Wagner oxidation law and the corresponding optical properties of the oxide–metal–glass substrate system changing nonlinearly after each pulse. A good agreement of the experimental results with the modeling estimations allowed us to extend the model application to other metals, specifically to those with optically transparent oxides, such as zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), and tantalum (Ta). The performed analysis highlighted the importance of choosing the correct laser parameters due to the complexity and nonlinearity of optical, thermal, and chemical processes in the metal film during its laser-induced oxidation in the air. The developed model allowed selecting the suitable temporal–energetic regimes and predicting the optical characteristics of the structures formed with an accuracy of 10%. The results are promising in terms of their implementation in the photonics industry for the production of optical converters.


Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Haoran Zhang ◽  
Tao Wang ◽  
Jingyi Tian ◽  
Jiacheng Sun ◽  
Shaoxian Li ◽  
...  

Abstract In this work, we propose and numerically investigate a two-dimensional microlaser based on the concept of bound states in the continuum (BIC). The device consists of a thin gain layer (Rhodamine 6G dye-doped silica) sandwiched between two high-contrast-grating layers. The structure supports various BIC modes upon a proper choice of topological parameters; in particular it supports a high-Q quasi-BIC mode when partially breaking a bound state in the continuum at Γ point. The optically-pumped gain medium provides sufficient optical gain to compensate the quasi-BIC mode losses, enabling lasing with ultra-low pump threshold (fluence of 17 μJ/cm2) and very narrow optical linewidth in the visible range. This innovative device displays distinguished sensing performance for gas detection, and the emission wavelength sensitively shifts to the longer wavelength with the changing of environment refractive index (in order of 5 × 10−4). The achieved bulk sensitivity is 221 nm/RIU with a high signal to noise ratio, and a record-high figure of merit reaches to 4420 RIU−1. This ultracompact and low threshold quasi-BIC laser facilitated by the ultra-narrow resonance can serve as formidable candidate for on-chip gas sensor.


Author(s):  
Russell L. Steere ◽  
Eric F. Erbe ◽  
J. Michael Moseley

We have designed and built an electronic device which compares the resistance of a defined area of vacuum evaporated material with a variable resistor. When the two resistances are matched, the device automatically disconnects the primary side of the substrate transformer and stops further evaporation.This approach to controlled evaporation in conjunction with the modified guns and evaporation source permits reliably reproducible multiple Pt shadow films from a single Pt wrapped carbon point source. The reproducibility from consecutive C point sources is also reliable. Furthermore, the device we have developed permits us to select a predetermined resistance so that low contrast high-resolution shadows, heavy high contrast shadows, or any grade in between can be selected at will. The reproducibility and quality of results are demonstrated in Figures 1-4 which represent evaporations at various settings of the variable resistor.


Author(s):  
F. A. Ponce ◽  
R. L. Thornton ◽  
G. B. Anderson

The InGaAlP quaternary system allows the production of semiconductor lasers emitting light in the visible range of the spectrum. Recent advances in the visible semiconductor diode laser art have established the viability of diode structures with emission wavelengths comparable to the He-Ne gas laser. There has been much interest in the growth of wide bandgap quaternary thin films on GaAs, a substrate most commonly used in optoelectronic applications. There is particular interest in compositions which are lattice matched to GaAs, thus avoiding misfit dislocations which can be detrimental to the lifetime of these materials. As observed in Figure 1, the (AlxGa1-x)0.5In0.5P system has a very close lattice match to GaAs and is favored for these applications.In this work, we have studied the effect of silicon diffusion in GaAs/InGaAlP structures. Silicon diffusion in III-V semiconductor alloys has been found to have an disordering effect which is associated with removal of fine structures introduced during growth. Due to the variety of species available for interdiffusion, the disordering effect of silicon can have severe consequences on the lattice match at GaAs/InGaAlP interfaces.


Author(s):  
J.N. Turner ◽  
M. Siemens ◽  
D. Szarowski ◽  
D.N. Collins

A classic preparation of central nervous system tissue (CNS) is the Golgi procedure popularized by Cajal. The method is partially specific as only a few cells are impregnated with silver chromate usualy after osmium post fixation. Samples are observable by light (LM) or electron microscopy (EM). However, the impregnation is often so dense that structures are masked in EM, and the osmium background may be undesirable in LM. Gold toning is used for a subtle but high contrast EM preparation, and osmium can be omitted for LM. We are investigating these preparations as part of a study to develop correlative LM and EM (particularly HVEM) methodologies in neurobiology. Confocal light microscopy is particularly useful as the impregnated cells have extensive three-dimensional structure in tissue samples from one to several hundred micrometers thick. Boyde has observed similar preparations in the tandem scanning reflected light microscope (TSRLM).


Author(s):  
Uwe Lücken ◽  
Michael Felsmann ◽  
Wim M. Busing ◽  
Frank de Jong

A new microscope for the study of life science specimen has been developed. Special attention has been given to the problems of unstained samples, cryo-specimens and x-ray analysis at low concentrations.A new objective lens with a Cs of 6.2 mm and a focal length of 5.9 mm for high-contrast imaging has been developed. The contrast of a TWIN lens (f = 2.8 mm, Cs = 2 mm) and the BioTWTN are compared at the level of mean and SD of slow scan CCD images. Figure 1a shows 500 +/- 150 and Fig. 1b only 500 +/- 40 counts/pixel. The contrast-forming mechanism for amplitude contrast is dependent on the wavelength, the objective aperture and the focal length. For similar image conditions (same voltage, same objective aperture) the BioTWIN shows more than double the contrast of the TWIN lens. For phasecontrast specimens (like thin frozen-hydrated films) the contrast at Scherzer focus is approximately proportional to the √ Cs.


Author(s):  
Akira Tonomura

Electron holography is a two-step imaging method. However, the ultimate performance of holographic imaging is mainly determined by the brightness of the electron beam used in the hologram-formation process. In our 350kV holography electron microscope (see Fig. 1), the decrease in the inherently high brightness of field-emitted electrons is minimized by superposing a magnetic lens in the gun, for a resulting value of 2 × 109 A/cm2 sr. This high brightness has lead to the following distinguished features. The minimum spacing (d) of carrier fringes is d = 0.09 Å, thus allowing a reconstructed image with a resolution, at least in principle, as high as 3d=0.3 Å. The precision in phase measurement can be as high as 2π/100, since the position of fringes can be known precisely from a high-contrast hologram formed under highly collimated illumination. Dynamic observation becomes possible because the current density is high.


Author(s):  
A. Olsen ◽  
J.C.H. Spence ◽  
P. Petroff

Since the point resolution of the JEOL 200CX electron microscope is up = 2.6Å it is not possible to obtain a true structure image of any of the III-V or elemental semiconductors with this machine. Since the information resolution limit set by electronic instability (1) u0 = (2/πλΔ)½ = 1.4Å for Δ = 50Å, it is however possible to obtain, by choice of focus and thickness, clear lattice images both resembling (see figure 2(b)), and not resembling, the true crystal structure (see (2) for an example of a Fourier image which is structurally incorrect). The crucial difficulty in using the information between Up and u0 is the fractional accuracy with which Af and Cs must be determined, and these accuracies Δff/4Δf = (2λu2Δf)-1 and ΔCS/CS = (λ3u4Cs)-1 (for a π/4 phase change, Δff the Fourier image period) are strongly dependent on spatial frequency u. Note that ΔCs(up)/Cs ≈ 10%, independent of CS and λ. Note also that the number n of identical high contrast spurious Fourier images within the depth of field Δz = (αu)-1 (α beam divergence) decreases with increasing high voltage, since n = 2Δz/Δff = θ/α = λu/α (θ the scattering angle). Thus image matching becomes easier in semiconductors at higher voltage because there are fewer high contrast identical images in any focal series.


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