THE EFFECT OF FILM THICKNESS ON THE MICROSTRUCTURE OF La0.5Ca0.5MnO3 FILMS

2002 ◽  
Vol 16 (23) ◽  
pp. 3439-3447 ◽  
Author(s):  
X. M. CHEN ◽  
Y. WANG ◽  
C. X. LIU ◽  
Y. N. ZHAO ◽  
Z. H. MAI ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
High Resolution ◽  
Critical Thickness ◽  
Interface Structure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Surface And Interface ◽  
Atomic Force ◽  
Different Thickness

La 0.5 Ca 0.5 MnO 3 (LCMO) thin films grown on SrTiO 3 substrate with different thickness were investigated using high resolution X-ray diffraction, small angle reflectivity, and atomic force microscope (AFM). All the films are demonstrated to be c-axis oriented. The surface and interface structure of the films were obtained. It was found that the surface morphology of the films strongly depends on the thickness, and the film will crack when the thickness of the film reach a critical thickness. The surface roughness of the films increases with the thickness. The interface between the films and the substrates are very clear. There exists a non-designed cap layer on the surface of the LCMO layer.

The Surface and Interface Microstructure of Epitaxial Pr0.7Sr0.3MnO3/La0.5Ca0.5MnO3 Bilayer Structure

2013 ◽  
Vol 372 ◽  
pp. 75-79
Author(s):  
Haiou Wang ◽  
Hao Liu ◽  
Meng Xiong Cao ◽  
Wei Shi Tan ◽  
Ping Dai ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Mass Density ◽  
Bilayer Structure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Surface And Interface ◽  
Lcmo Film ◽  
Atomic Force ◽  
Disordered Layer

Epitaxial bilayer structure consisting of ferromagnetic (FM) metallic Pr0.7Sr0.3MnO3 (PSMO) and antiferromagnetic (AFM) insulator La0.5Ca0.5MnO3 (LCMO) was fabricated on (001)-oriented single crystal SrTiO3 (STO) substrate by pulsed laser deposition technique. We studied the surface structure and interdiffusion at interface between PSMO and LCMO by using atomic force microscope and grazing incident x-ray reflectivity (GIXRR). The perfect data fitting result of GIXRR indicated that interdiffusion at the interface of Pr0.7Sr0.3MnO3/La0.5Ca0.5MnO3 (PSMO/LCMO) could not be negligible; there was a large interdiffusion zone at the PSMO/LCMO interfaces with a thickness of about 7 nm. We found that the thickness of the top layer at air/PSMO interface was about 2.5 nm and the mass density of the top layer was about 76.53% of that of PSMO layer. The surface roughness was about 1.6 nm which was consistent with observation by atomic force microscopy. Normal X-ray diffraction (NXRD) was also employed to investigate the average structure. Except from PSMO and LCMO layer diffraction peaks, we observed another additional peak, which was developed from the large disordered layer resulting from interdiffusion at the interface of PSMO/LCMO. This implied that the variation of crystalline structure of PSMO/LCMO film occurred due to interdiffusion. Surface roughness and interdiffusion played an important role in magnetic properties of FM/AFM bilayer.

Nanocrystalline Solutions as Precursors to The Spray Deposition of Cdte Thin Films

1995 ◽  
Vol 382 ◽  
Author(s):  
Martin Pehnt ◽  
Douglas L. Schulz ◽  
Calvin J. Curtis ◽  
Helio R. Moutinho ◽  
Amy Swartzlander ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Grain Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Cdte Nanoparticles ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Cdte Thin Films

ABSTRACTIn this article we report the first nanoparticle-derived route to smooth, dense, phase-pure CdTe thin films. Capped CdTe nanoparticles were prepared by injection of a mixture of Cd(CH3)2, (n-C8H17)3 PTe and (n-C8H17)3P into (n-C8H17)3PO at elevated temperatures. The resultant nanoparticles 32-45 Å in diameter were characterized by x-ray diffraction, UV-Vis spectroscopy, transmission electron microscopy, thermogravimetric analysis and energy dispersive x-ray spectroscopy. CdTe thin film deposition was accomplished by dissolving CdTe nanoparticles in butanol and then spraying the solution onto SnO2-coated glass substrates at variable susceptor temperatures. Smooth and dense CdTe thin films were obtained using growth temperatures approximately 200 °C less than conventional spray pyrolysis approaches. CdTe films were characterized by x-ray diffraction, UV-Vis spectroscopy, atomic force microscopy, and Auger electron spectroscopy. An increase in crystallinity and average grain size as determined by x-ray diffraction was noted as growth temperature was increased from 240 to 300 °C. This temperature dependence of film grain size was further confirmed by atomic force microscopy with no remnant nanocrystalline morphological features detected. UV-Vis characterization of the CdTe thin films revealed a gradual decrease of the band gap (i.e., elimination of nanocrystalline CdTe phase) as the growth temperature was increased with bulk CdTe optical properties observed for films grown at 300 °C.

Optical properties of anatase TiO2 films modified by N ion implantation

2012 ◽  
Vol 90 (1) ◽  
pp. 39-43 ◽  
Author(s):  
X. Xiang ◽  
D. Chang ◽  
Y. Jiang ◽  
C.M. Liu ◽  
X.T. Zu
Keyword(s):  
Thin Films ◽  
Ion Implantation ◽  
Photoelectron Spectroscopy ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Atomic Force ◽  
Light Region ◽  
Uv Visible ◽  
Substrate Temperatures

Anatase TiO2 thin films are deposited on K9 glass samples at different substrate temperatures by radio frequency magnetron sputtering. N ion implantation is performed in the as-deposited TiO2 thin films at ion fluences of 5 × 1016, 1 × 1017, and 5 × 1017 ions/cm2. X-ray diffraction, atomic force microscope, X-ray photoelectron spectroscopy (XPS), and UV–visible spectrophotometer are used to characterize the films. With increasing N ion fluences, the absorption edges of anatase TiO2 films shift to longer wavelengths and the absorbance increases in the visible light region. XPS results show that the red shift of TiO2 films is due to the formation of N–Ti–O compounds. As a result, photoactivity is enhanced with increasing N ion fluence.

scholarly journals Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

MICROSTRUCTURE AND BLUE PHOTOLUMINESCENCE OF HYDROGENATED SILICON CARBONITRIDE THIN FILMS

2019 ◽  
Vol 26 (04) ◽  
pp. 1850177 ◽  
Author(s):  
YINQIAO PENG ◽  
JICHENG ZHOU ◽  
GUIBIN LEI ◽  
YUANJU GAN ◽  
YUEFENG CHEN
Keyword(s):  
Thin Films ◽  
Network Structure ◽  
Energy Dispersive Spectrometer ◽  
Silicon Carbonitride ◽  
X Ray Diffraction ◽  
Hydrogenated Silicon ◽  
X Ray ◽  
Atomic Force ◽  
Scanning Electron ◽  
Blue Photoluminescence

Hydrogenated silicon carbonitride (SiCN:H) thin films were deposited by sputtering of silicon carbide target in hydrogen-doped argon and nitrogen atmospheres. The properties of the SiCN:H films were analyzed by scanning electron microscopy with energy dispersive spectrometer, atomic force microscope, Fourier transform infrared spectroscopy, X-ray diffraction and fluorescence spectrophotometer. No distinct crystal was formed in the SiCN:H films as-deposited and annealed at 600∘C and 800∘C. The SiCN:H films were mainly composed of Si–N, Si–C, Si–O, C–C, C–N, C[Formula: see text]N, N–Hn bonds and SiCxNy network structure. The strong blue photoluminescence observed from the SiCN:H film annealed at 600∘C was attributed to SiCxNy network structure.

Epitaxial BaTiO3 Thin Films on Different Substrates for Optical Waveguide Applications

1999 ◽  
Vol 597 ◽  
Author(s):  
M. Siegert ◽  
Judit G. Lisoni ◽  
C. H. Lei ◽  
A. Eckau ◽  
W. Zander ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Waveguides ◽  
Rutherford Backscattering Spectrometry ◽  
Optical Data ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Ion Channeling ◽  
Atomic Force ◽  
Transmission Electron

AbstractIn the process of developing thin film electro-optical waveguides we investigated the influence of different substrates on the optical and structural properties of epitaxial BaTiO3 thin films. These films are grown by on-axis pulsed laser deposition (PLD) on MgO(100), MgAl2O4(100), SrTiO3(100) and MgO buffered A12O3(1102) substrates. The waveguide losses and the refractive indices were measured with a prism coupling setup. The optical data are correlated to the results of Rutherford backscattering spectrometry/ion channeling (RBS/C). X-ray diffraction (XRD), atomic force microscopy (AFM) and transmission electron microscopy (TEM). BaTiO3 films on MgO(100) substrates show planar waveguide losses of 3 dB/cm and ridge waveguide losses of 5 dB/cm at a wavelength of 633 nm.

Characteristics of Pentacene with Different Polymer Gate Insulators for Organic Thin-Film Transistors

2007 ◽  
Vol 124-126 ◽  
pp. 451-454 ◽  
Author(s):  
Jung Min Kim ◽  
Hyun Jung Her ◽  
J.H. Yoon ◽  
Jae Wan Kim ◽  
Y.J. Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Gate Insulator ◽  
Poly Vinyl Alcohol ◽  
Organic Thin Film ◽  
X Ray Diffraction ◽  
Polymer Substrates ◽  
X Ray ◽  
Gate Insulators ◽  
Atomic Force ◽  
Substrate Temperatures

We investigated the characteristics of pentacene thin films of different materials for gate insulators using atomic force microscope (AFM) and x-ray diffraction (XRD). The pentacene thin films are fabricated by evaporation on different polymer substrates. We used HMDS (Hexa Methyl Di Silazane), PVA (Poly Vinyl Alcohol) and PMMA (Poly Methyl Meth Acrylate) for the polymer substrates, on which pentacene is deposited at various substrate temperatures. The case of pentacene deposited on the PMMA has the largest grain size and least trap concentration. We also fabricated pentacene TFTs with the PMMA gate insulator. Pentacene TFTs with PMMA gate insulator, shows high field-effect mobility (ｕFET= 0.03 cm2/Vs) and large on/off current ratio (>105) and small threshold voltage (Vth= -6 V).

Biocompatibility Studies of the Nitinol Thin Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C.Z. Dinu ◽  
R. Tanasa ◽  
V.C. Dinca ◽  
A. Barbalat ◽  
C. Grigoriu ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Fibroblast Cell ◽  
Vero Cells ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Fetal Bovine ◽  
Fibroblast Cell Lines

AbstractPulsed Laser Deposition method (PLD) was used to grow nitinol (NiTi) thin films with goal of investigating their biocompatibility. High purity Ni and Ti targets were alternatively ablated in vacuum with a laser beam (λ=355 nm, 10 Hz) and the material was collected on room temperature Ti substrates. X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy and atomic force microscopy analyses have been performed to investigate the chemical composition, crystalline structure and surface morphology of the NiTi films. The nitinol layers biocompatibility has been tested using as a metric the extent to whichthe cells adhereduring the culture period on the surface of NiTi layers deposited on Ti substrates. Vero and fibroblast cell lines dispersed into MEM (Eagle) solution containing 8% fetal bovine serum, at 37° C, were used for tests. Preliminary studies indicate that the interaction at the interface is specifically controlled by the surface morphology, (especially by surface roughness), and by the chemical state of the surface. Cell behavior after contact with NiTi/Ti structure for different intervals (18, 22 and 25 days for the Vero cells, and after 10 and 25 days for fibroblasts) supports the conclusion that NiTi is a very good candidate as a biocompatible material.

Effect of DC Power on Structural and Hydrophilic Activity of TiO2 Films

2008 ◽  
Vol 55-57 ◽  
pp. 925-928 ◽  
Author(s):  
C. Salawan ◽  
A. Muakngam ◽  
B. Sukbot ◽  
K. Aiempanakit ◽  
Supattanapong Dumrongrattana
Keyword(s):  
Surface Roughness ◽  
Contact Angle ◽  
Tio2 Films ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Water Contact ◽  
X Ray ◽  
Dc Power ◽  
Atomic Force ◽  
Xrd Patterns

In this work, we present the effect of DC power from 100 W to 500 W on the structural and hydrophilic activity of TiO2 films. The TiO2 films were prepared by DC magnetron sputtering on the glass substrate without any external heating. The structure of TiO2 films were analyzed by atomic force microscope and X-ray diffraction. XRD patterns indicated the films were amorphous. The surface roughness and grain size were enlarged by the increasing of the DC power while the substrate temperature was climbed up with the increasing of the DC power. From the point of energetic ion bombardment, it was related with DC power between sputtering processes. The hydrophilic activity of TiO2 films were analyzed by the contact angle meter. The water contact angle decrease with increasing of the DC power.

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