Spectroscopic investigation of non-thermal plasma generated in atmospheric pressure ‘Plasma Pencil’

2020 ◽  
Vol 34 (11) ◽  
pp. 2050112
Author(s):  
Zakia Anjum ◽  
N. U. rehman ◽  
Maria Younus ◽  
Sajjad Sarwar
Keyword(s):  
Atmospheric Pressure ◽  
Band Head ◽  
Atomic Density ◽  
Rf Plasma ◽  
Positive System ◽  
Text Line ◽  
Gas Temperature ◽  
Rf Power ◽  
Increasing Trend ◽  
Plasma Pencil

Plasma generated at atmospheric pressure has widespread applications in the field of plasma medicine. In this paper, spectroscopic investigations of homemade capacitively coupled, atmospheric pressure RF plasma pencil is reported. Optical emission spectroscopy (OES) technique is employed to characterize the plasma. Variation in rotational/gas temperature [Formula: see text], [Formula: see text] atomic density, dissociation fraction [Formula: see text] and normalized intensities of [Formula: see text], [Formula: see text] and [Formula: see text] radiation is monitored as a function of discharge parameters like RF power and different gases concentration. [Formula: see text] of [Formula: see text] mixture is estimated from [Formula: see text] band head of R branch of first negative system of nitrogen [Formula: see text], [Formula: see text], [Formula: see text] using Boltzmann plot technique. Similarly, [Formula: see text] band head of second positive system (SPS) of nitrogen [Formula: see text], [Formula: see text], [Formula: see text] is also used to estimate [Formula: see text] by fitting synthetic spectra over the experimentally recorded spectrum. It is noted that [Formula: see text] increases with increase in RF power, but it decreases with increase in [Formula: see text] concentration in the mixture. [Formula: see text] atomic density and dissociation fraction [Formula: see text], estimated from [Formula: see text] line at 750 nm and [Formula: see text] line at 844 nm using actinometry technique, show increasing trend with RF power and [Formula: see text] concentration in the mixture up to 0.7% [Formula: see text] in the mixture. The normalized [Formula: see text] radiation intensities; [Formula: see text], [Formula: see text] and [Formula: see text] show the increasing trend with increase in RF power up to 0.3% [Formula: see text] concentration in the mixture.

scholarly journals Diagnostics of Plasma Pencil Discharge for Chemical Analysis

2019 ◽  
Vol 6 (1) ◽  
pp. 95-98
Author(s):  
P. Slavíček ◽  
A. Hrdlicka ◽  
M. Dvorakova ◽  
V. Kanicky
Keyword(s):  
Atmospheric Pressure ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Sample Introduction ◽  
Rf Plasma ◽  
Aerosol Sample ◽  
Spray Chamber ◽  
Double Pass ◽  
Plasma Pencil ◽  
Nozzle Flows

We present diagnostics of plasma pencil discharge as alternative excitation source for analytical chemistry. The plasma pencil is special type of rf plasma nozzle at atmospheric pressure. Through this nozzle flows working gas argon with aerosol. The aerosol sample introduction system employed a double pass Scott spray chamber with a pneumatic concentric nebulizer. The parameters of the plasma were calculated by optical emission spectroscopy.<br /><br />

scholarly journals Magnetic nozzle radiofrequency plasma thruster approaching twenty percent thruster efficiency

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Kazunori Takahashi
Keyword(s):  
Magnetic Field ◽  
Electric Propulsion ◽  
Transfer Efficiency ◽  
Rf Plasma ◽  
Power Transfer ◽  
Rf Power ◽  
Plasma Production ◽  
Magnetic Nozzle ◽  
Plasma Thruster ◽  
Power Transfer Efficiency

AbstractDevelopment of a magnetic nozzle radiofrequency (rf) plasma thruster has been one of challenging topics in space electric propulsion technologies. The thruster typically consists of an rf plasma source and a magnetic nozzle, where the plasma produced inside the source is transported along the magnetic field and expands in the magnetic nozzle. An imparted thrust is significantly affected by the rf power coupling for the plasma production, the plasma transport, the plasma loss to the wall, and the plasma acceleration process in the magnetic nozzle. The rf power transfer efficiency and the imparted thrust are assessed for two types of rf antennas exciting azimuthal mode number of $$m=+1$$ m = + 1 and $$m=0$$ m = 0 , where propellant argon gas is introduced from the upstream of the thruster source tube. The rf power transfer efficiency and the density measured at the radial center for the $$m=+1$$ m = + 1 mode antenna are higher than those for the $$m=0$$ m = 0 mode antenna, while a larger thrust is obtained for the $$m=0$$ m = 0 mode antenna. Two-dimensional plume characterization suggests that the lowered performance for the $$m=+1$$ m = + 1 mode case is due to the plasma production at the radial center, where contribution on a thrust exerted to the magnetic nozzle is weak due to the absence of the radial magnetic field. Subsequently, the configuration is modified so as to introduce the propellant gas near the thruster exit for the $$m=0$$ m = 0 mode configuration and the thruster efficiency approaching twenty percent is successfully obtained, being highest to date in the kW-class magnetic nozzle rf plasma thrusters.

Aluminum surface treatment by the RF plasma pencil

2012 ◽  
Vol 206 (19-20) ◽  
pp. 4140-4145 ◽  
Author(s):  
V. Prysiazhnyi ◽  
T. Svoboda ◽  
M. Dvořák ◽  
M. Klíma
Keyword(s):  
Surface Treatment ◽  
Aluminum Surface ◽  
Rf Plasma ◽  
Plasma Pencil

Electron Density and Gas Temperature from Line Broadening in an Argon Surface-Wave-Sustained Discharge at Atmospheric Pressure

2004 ◽  
Vol 58 (9) ◽  
pp. 1032-1037 ◽  
Author(s):  
M. Christova ◽  
E. Castaños-Martinez ◽  
M. D. Calzada ◽  
Y. Kabouzi ◽  
J. M. Luque ◽  
...  
Keyword(s):  
Surface Wave ◽  
Electron Density ◽  
Atmospheric Pressure ◽  
Gas Temperature ◽  
Line Broadening ◽  
Sustained Discharge

scholarly journals The Effect of Plasma Pretreatment on the Morphology and Properties of Hitus Coatings

2020 ◽  
Vol 20 (1) ◽  
pp. 21-29
Author(s):  
Lenka Kvetková ◽  
Petra Hviščová ◽  
Dávid Medveď ◽  
František Lofaj
Keyword(s):  
Mechanical Properties ◽  
New Technology ◽  
Rf Plasma ◽  
Plasma Power ◽  
Rf Power ◽  
Properties Of Coatings ◽  
Plasma Pretreatment ◽  
Significant Change ◽  
Scratch Behavior

Abstract WC coatings prepared by High Target Utilization Sputtering (HITUS), a relatively new technology, were deposited on three types of substrates. These were silicon (111), steel (100Cr6), and ceramic (WC-Co). The influence of RF plasma power pretreatment on final properties of WC coatings was investigated with two interlayer materials for bonding. The morphology, roughness, and mechanical properties of coatings were studied. The relation between plasma RF power and roughness was found. No significant change in mechanical properties was detected with change in plasma RF power. The dependence of nanohardness and scratch behavior on HITUS WC coatings was investigated.

Development and Characterization of a Portable Atmospheric-Pressure Argon Plasma Jet for Sterilization

2015 ◽  
Author(s):  
Zhi-Hua Lin ◽  
Jong-Shinn Wu ◽  
Chen-Yon Tobias Tschang ◽  
Chi-Feng Su ◽  
Tuoh Wu ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Argon Plasma ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Gas Temperature ◽  
E Coli ◽  
Bacteria Inactivation ◽  
Argon Plasma Jet ◽  
Absorption Power

In this study, we would like to develop a portable round argon atmospheric-pressure plasma jet (APPJ) which can be applied for general use of bacteria inactivation. The APPJ was characterized electrically and optically, which include measurements of absorption power, gas temperature and optical properties of plasma generated species. Measured OH* number density at 5 mm downstream was estimated to be 5.8 × 1015 cm−3 and the electron density and electron temperature were estimated to be 2.4 × 1015 cm−3 and 0.34 eV, respectively, in the discharge region. This APPJ was demonstrated to effectively inactivate E. coli within seconds of treatment, which shows its great potential in the future use of general bacteria inactivation and sterilization.

Radio frequency expanding plasmas at low, intermediate, and atmospheric pressure and their applications

2008 ◽  
Vol 80 (9) ◽  
pp. 1919-1930 ◽  
Author(s):  
Gheorghe Dinescu ◽  
Eusebiu R. Ionita
Keyword(s):  
Radio Frequency ◽  
Atmospheric Pressure ◽  
Thin Film Deposition ◽  
Plasma Jets ◽  
Film Deposition ◽  
High Mass ◽  
Rf Plasma ◽  
Temperature Sensitive ◽  
Large Size ◽  
Wide Range

We report on the operation and characteristics of radio frequency (RF) plasma beam sources based on the expansion of the discharge outside of limited spaces with small interelectrode gaps. The appropriate electrode configuration, combined with high mass flow values and appropriate power levels, leads to small- or large-size plasma jets, working stably at low, intermediate, and atmospheric pressures. The sources are promising tools for a wide range of applications in thin film deposition, surface modification, and cleaning, including the case of temperature-sensitive substrates.

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