scholarly journals Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering

2021 ◽  
Vol 2021 ◽  
pp. 1-7
Author(s):  
L. Natrayan ◽  
S. Balaji ◽  
G. Bharathiraja ◽  
S. Kaliappan ◽  
Dhinakaran Veeman ◽  
...  

The mechanical properties of TiAlN deposited on the steel are explained in this study. Thin films are deposited by RF magnetron sputtering on the steel substrates to improve the wear resistance and hardness of the samples. Due to their improved microstructure and nanograins, the nanofilms have improved the mechanical properties of the steel substrate surface. The thin film deposited has improved the wear resistance by 80% and has improved the hardness by 95%. The deposited thin films are tested for hardness by nanoindentation and wear test by the pin-on-disk test. SEM has tested films for their microstructure and adhesion by nanoscratch test.

2018 ◽  
Vol 24 (8) ◽  
pp. 5872-5876
Author(s):  
G Balakrishnan ◽  
V Sathiyaraj ◽  
M Dinesh ◽  
P. Naveen Chandran ◽  
C Thamotharan

In the present work, nanostructured tungsten nitride (WN) thin films were deposited by RF reactive magnetron sputtering technique in a mixture of N2 and Argon atmosphere and its microstructure and mechanical properties were investigated. The Argon pressure was kept constant at 20 sccm, while the N2 partial pressures were varied (3%, 5%, 10% and 15%). The WN thin films are deposited on SS304 stainless steel substrates at a temperature of 500 °C. The microstructural property was analyzed using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) and mechanical properties were evaluated by nanoindentation technique. The XRD studies indicated the formation of different phases as a function of nitrogen content. The hardness and the young’s modulus values were in the range 27–39 GPa and 239–280 GPa, respectively. The high hardness values correspond to the coatings with the low nitrogen content and vice-versa. The mechanical properties of the tungsten nitride coatings were strongly influenced by the microstructure.


2006 ◽  
Vol 125 (2) ◽  
pp. 382-386 ◽  
Author(s):  
Takaaki Suzuki ◽  
Isaku Kanno ◽  
Jacob J. Loverich ◽  
Hidetoshi Kotera ◽  
Kiyotaka Wasa

2018 ◽  
Vol 24 (8) ◽  
pp. 5855-5858
Author(s):  
G Balakrishan ◽  
A. Karthik Kumar ◽  
M Kannan ◽  
K Manikandan ◽  
V Karthikeyan ◽  
...  

Aluminium nitride (AlN) thin films were deposited on AISI-1018 low carbon steel substrates at different substrate temperature (Room temperature −600 °C) using RF magnetron sputtering technique. The microstructural, mechanical and corrosion properties were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM), nanoindentation and salt spray test respectively. The microstructural and properties were investigated as a function of substrate temperature. The XRD analysis of the AlN thin films prepared at RT and 200 °C indicated the poor crystallinity of the films, while the films prepared in the temperature 400–600 °C range indicated the increased crystallinity with hexagonal (0002) and cubic (002) structure. The AFM analysis showed the average roughness of 7 nm, 5.5 nm and 16 nm for room temperature, 200 °C and 500 °C temperature respectively. The hardness of the AlN thin films were found to be 11.99 GPa, 13.05 GPa, 12.29 GPa, 23.0 GPa and 11.12 GPa at room temperature, 200 °C, 400 °C, 500 °C and 600 °C, respectively. The salt spray analysis indicated no corrosion on low carbon steel substrates for 12 hours.


2011 ◽  
Vol 380 ◽  
pp. 238-243 ◽  
Author(s):  
Hui Zhi ◽  
Jing Lin ◽  
Bo Zhang

The SiOx thin films for food packaging were deposited by RF magnetron sputtering physical vapor technology on the substrates of 20μm polyethylene terephthalate (PET) by using a pure SiO2 target. The molecular structure of thin film surface composition were detected and analyzed by Fourier transform infrared spectroscopy (FTIR); and the barrier properties of the films were examined by MOCON water vapor permeability testing instrument, also,the relationship maps between permeability and process parameters were drew and the process parameters were optimized; The mechanical properties of thin films were tested by electronic tensile testing machine, and the curves of the relationship between the mechanical properties and process parameters depicted. The SiOx/PET thin films of the lowest water vapor permeability were prepared under the pressure of 7.5×10-3 Pa, the sputtering pressure of 0.23 Pa, the deposition time of 30min and the sputtering power of 1500W. The yield strength increased 4 times and elastic modulus increased 3 times when the water vapor permeability of the SiOx/PET thin films rose about 10 times of the blank.


2019 ◽  
Vol 86 (3) ◽  
pp. 30301 ◽  
Author(s):  
Zouina Amina Ait-Djafer ◽  
Nadia Saoula ◽  
Daniel Wamwangi ◽  
Noureddine Madaoui ◽  
Hamid Aknouche

In this study, a negative substrate bias voltage is used to tune the structural, morphological, mechanical and electrochemical properties of TiAlN coatings fundamental for protective coating applications. TiAlN thin films have been deposited on glass, (001)Si and stainless steel substrates by RF magnetron sputtering at a power density of 4.41 W/cm2. The deposition rate was determined from X-ray reflectivity measurements to 7.00 ± 0.05 nm/min. TiAlN films used in this work were deposited for 60 min to yield a film thickness of 420 nm. Structural analysis has shown that TiAlN coating forms a cubic (fcc) phase with orientations in (111), (200), (220) and (222) planes. The deposited coatings present maximum hardness (H = 37.9 GPa) at −75 V. The dependence of hardness and Young's modulus and corrosion resistance on microstructure has been established. Electrochemical studies by potentiodynamic polarization in aggressive environment (3.5 wt.% NaCl) have revealed that stainless steel substrate with TiAlN coating exhibits excellent corrosion resistance.


Author(s):  
Samuel Beckford ◽  
Luke Osborn ◽  
Min Zou ◽  
Jiyu Cai ◽  
Jingyi Chen

Low friction polytetrafluoroethylene (PTFE) has been studied extensively and is widely used in tribological applications in bulk form. Tribological properties of thin film PTFE are less reported due to its poor wear resistance. Here, we show that by incorporating Au nanoparticles in PTFE thin film, it is possible to significantly increase the wear resistance of the film. PTFE/Au nanoparticle composite thin films were fabricated on stainless steel substrates by dipping the substrate into a mixture of Au nanoparticle solution and PTFE aqueous dispersion. The friction and wear test results show that Au nanoparticles significantly reduced the wear of the PTFE thin film while preserving its low coefficient of friction (COF). Furthermore, substrate surface topography was found to have a significant effect on the friction and wear performances.


1993 ◽  
Vol 308 ◽  
Author(s):  
J. G. Duh ◽  
J. C. Doong ◽  
C. T. Huang

ABSTRACTTiN films are prepared by reactive rf magnetron sputtering on carbon steel substrates which are widely applied as structural materials. The electroless Ni-P plating is introduced as an interlayer in the surface modification of TiN coating. The electroless Ni-P deposit crystallizes during rf sputtering due to the elevated sputtering temperature and thus a TiN/Ni3P/Fe coating assembly is formed.The employment of electroless Ni-P deposit results in an increase in the surface microhardness and adhesion strength. The surface hardness as high as 2266HK1 close to the hardness of bulk TiN can be achieved in the Ni3P interlayer modified TiN coating. With respect to the wear-resistance, the adhesion of the TiN coating plays an important role for the sliding wear-resistance and the interlayer Ni3P acts as a hard , barrier instead of the soft carbon steel substrate.


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