Analysis of Low Frequency Drain Current Model for Silicon Nanowire Gate-All-Around Field Effect Transistor

2014 ◽  
Vol 7 (3) ◽  
pp. 326-336
Author(s):  
Awanit Sharma

2014 ◽  
Vol 6 (2) ◽  
pp. 354-360 ◽  
Author(s):  
Norazlin Bahador ◽  
Michael Loong Peng Tan ◽  
M. T. Ahmadi ◽  
Razali Ismail




2020 ◽  
Vol 20 (8) ◽  
pp. 4699-4703
Author(s):  
Hyun-Dong Song ◽  
Hyeong-Sub Song ◽  
Sunil Babu Eadi ◽  
Hyun-Woong Choi ◽  
Ga-Won Lee ◽  
...  

In this work, noise mechanism of a tunneling field-effect transistor (TFET) on a silicon-on-insulator substrate was studied as a function of temperature. The results show that the drain current and subthreshold slope increase with increase in temperature. This temperature dependence is likely caused by the generation of greater current flow owing to decreased silicon band gap and leakage. Further, the TFET noise decreases with increase in temperature. Therefore, the effective tunneling length between the source and the channel appears to decrease and Poole–Frenkel tunneling occurs.







Sign in / Sign up

Export Citation Format

Share Document