Structure and properties of polyelectrolyte complexes of various type (chitosan chloride – polyacrilic acid) and triple polyelectrolyte-metalic complexe with cations Cu2+

2020 ◽  
Vol 42 (4) ◽  
pp. 277-282
Author(s):  
V.I. Shtompel ◽  
◽  
V.L. Demchenko ◽  
V.O. Ovsyankina ◽  
A.V. Nischimenko ◽  
...  
Keyword(s):  
Metal Complexes ◽  
Polyacrylic Acid ◽  
Thermomechanical Analysis ◽  
Amorphous Structure ◽  
Temperature Transition ◽  
X Ray Diffraction ◽  
Segmental Mobility ◽  
Polyelectrolyte Complexes ◽  
X Ray ◽  
Anionic Polyelectrolyte

Using FT-IR-spectroscopy, X-ray diffraction and thermomechanical analysis structure and thermomechanical properties of two nonstoichiometry and one stoichiometry polyelectrolyte complexes (PEC) based on opposite charged polyelectrolytes – strong cationic polyelectrolyte (chitosan chloride) and weak anionic polyelectrolyte (polyacrylic aсid) and triple polyelectrolyte-metal complexes (TPMC) based on stoichometry polyelectrolyte complexes and cations Cu(II) were investigated. It was shown, that chitosan chloride has amorphous-cristallinity structure, which is significantly different from the structure of neat chitosan, and polyacrylic acid posses amorphous structure. Meantime, all PEC samples have amorphous structure, differing from the structure of weak anionic polyelectrolyte, at the same time amorphous structure of nonstoichiometric PECs insignificantly different from that of stoichiometric polyelectrolyte complexes. Additionally, amorphous structure of TPMC has another structure, compared to all PEC. According to thermomechanical analysis, all PECs have one temperature transition from glassy to highly elastic state (from 77 to 84 °C). The deformation value of the samples of nonstoichiometric PEC is similar and somewhat less than the deformation of the stoichiometric PEC. The TPMC sample has two glass transitions (81 and 226 °C), and his high-temperature transition characterizes the segmental mobility of fragments of macromolecules of one stoichiometric PEC, the polar groups of which form chelate circles with Cu (II) cations. Deformation parameter of the TPMC is higher in comparison with the stoichiometric polyelectrolyte complexes. Keywords: structure, properties, deformation, ionic force, cationic Cu(II), polyelectrolyte, polyelectrolyte-metal complexes, chitosan chloride, polyacrylic acid, X-ray diffraction, thermomechanical analysis.

Preparation, properties and structure of some intermediate nido- and arachno-monocarbaboranes

1981 ◽  
Vol 46 (10) ◽  
pp. 2345-2353 ◽  
Author(s):  
Karel Baše ◽  
Bohumil Štíbr ◽  
Jiří Dolanský ◽  
Josef Duben
Keyword(s):  
Transition Metal ◽  
Metal Complexes ◽  
Transition Metal Complexes ◽  
Nmr Spectra ◽  
Liquid Ammonia ◽  
X Ray Diffraction ◽  
X Ray ◽  
H Nmr ◽  
Starting Compound

The 6-N(CH3)3-6-CB9H11 carbaborane reacts with sodium in liquid ammonia with the formation of 6-CB9H12- which was used as a starting compound for preparing the 4-CB8H14, 9-L-6-CB9H13 (L = (CH3)2S, CH3CN and P(C6H5)3), 1-(η5-C5H5)-1,2-FeCB9H10-, and 2,3-(η5-C5H5)2-2,31-Co2CB9H10- carboranes. The 4-CB8H14 compound was dehydrogenated at 623 K to give 4-(7)-CB8H12 carborane. Base degradation of 6-N(CH3)3-6-CB9H11 in methanol resulted in the formation of 3,4-μ-N(CH3)3CH-B5H10. The structure of all compounds was proposed on the basis of their 11B and 1H NMR spectra and X-ray diffraction was used in the case of the transition metal complexes.

scholarly journals A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy

2015 ◽  
Vol 2015 ◽  
pp. 1-7 ◽  
Author(s):  
Ruei-Cheng Lin ◽  
Tai-Kuang Lee ◽  
Der-Ho Wu ◽  
Ying-Chieh Lee
Keyword(s):  
Annealing Temperature ◽  
Phase Evolution ◽  
Amorphous Structure ◽  
High Entropy Alloy ◽  
X Ray Diffraction ◽  
Temperature Coefficient Of Resistance ◽  
X Ray ◽  
High Entropy ◽  
Transmission Electron ◽  
Thin Film Resistors

Ni-Cr-Si-Al-Ta resistive thin films were prepared on glass and Al2O3substrates by DC magnetron cosputtering from targets of Ni0.35-Cr0.25-Si0.2-Al0.2casting alloy and Ta metal. Electrical properties and microstructures of Ni-Cr-Si-Al-Ta films under different sputtering powers and annealing temperatures were investigated. The phase evolution, microstructure, and composition of Ni-Cr-Si-Al-Ta films were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), and Auger electron spectroscopy (AES). When the annealing temperature was set to 300°C, the Ni-Cr-Si-Al-Ta films with an amorphous structure were observed. When the annealing temperature was at 500°C, the Ni-Cr-Si-Al-Ta films crystallized into Al0.9Ni4.22, Cr2Ta, and Ta5Si3phases. The Ni-Cr-Si-Al-Ta films deposited at 100 W and annealed at 300°C which exhibited the higher resistivity 2215 μΩ-cm with −10 ppm/°C of temperature coefficient of resistance (TCR).

Structure and Electrochemical Behavior of Plasma-Sprayed LSGM Electrolyte Films

2002 ◽  
Vol 756 ◽  
Author(s):  
H. Zhang ◽  
X. Ma ◽  
J. Dai ◽  
S. Hui ◽  
J. Roth ◽  
...  
Keyword(s):  
Electrochemical Behavior ◽  
Electrochemical Impedance ◽  
Amorphous Structure ◽  
Solid Oxide ◽  
X Ray Diffraction ◽  
X Ray ◽  
Spray Process ◽  
Plasma Spray Process ◽  
Electrolyte Film ◽  
Plasma Sprayed

ABSTRACTAn intermediate temperature solid oxide fuel cell (SOFC) electrolyte film of La0.8Sr 0.2Ga0.8Mg0.2O2.8 (LSGM) was fabricated using a plasma spray process. The microstructure and phase were investigated using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The electrochemical behavior of the thermal sprayed LSGM film was investigated using electrochemical impedance spectroscopy (EIS). The study indicates that thermal spray can deposit a dense LSGM layer. It was found that the rapid cooling in the thermal process led to an amorphous or poor crystalline LSGM deposited layer. This amorphous structure has a significant effect on the performance of the cell. Crystallization of the deposited LSGM layer was observed during annealing between 500–600 °C. After annealing at 800 °C, the ionic conductivity of the sprayed LSGM layer can reach the same level as that of the sintered LSGM.

Metallkomplexe mit biologisch wichtigen Liganden, CXLVI [1]. Bis(allyl)-N,O-α-Aminocarboxylat-Rhodium-Komplexe / Metal Complexes of Biologically Important Ligands, CXLVI [1]. Bis(allyl)-N,O-α-Aminocarboxylate-Rhodium Complexes

2002 ◽  
Vol 57 (7) ◽  
pp. 810-818 ◽  
Author(s):  
Walter Ponikwar ◽  
Peter Mayer ◽  
Wolfgang Beck
Keyword(s):  
Amino Acids ◽  
Metal Complexes ◽  
Dynamic Behaviour ◽  
Rhodium Complexes ◽  
X Ray Diffraction ◽  
X Ray ◽  
H Nmr

The reactions of [(η3-C3H5)2Rh-μ-Cl]2 with the anions of α-amino acids (glycine, L-alanine, L-valine, L-isoleucine, L-proline, L-phenylalanine, L-phenylglycine, L-thyrosine) afford the N,O-chelates (η3-C3H5)2Rh(α-amino carboxylate). For complex (η3-C3H5)2Rh(glycinate) dynamic behaviour in solution could be observed by 1H NMR. The structure of (η3-C3H5)2Rh(L-prolinate) was determined by X-ray diffraction.

Material Characteristics and Electrical Modeling of Ultra Thin Copper Oxides in ULSI Application

2007 ◽  
Vol 561-565 ◽  
pp. 1225-1228
Author(s):  
Takayuki Ohba
Keyword(s):  
Diffraction Pattern ◽  
Barrier Height ◽  
Oxide Thickness ◽  
Amorphous Structure ◽  
Emission Model ◽  
X Ray Diffraction ◽  
Edge Structure ◽  
X Ray ◽  
Current Emission ◽  
X Ray Absorption

With the highest brilliance synchrotron radiation X-ray (SPring-8) and TEM observations, Cu oxides ranged 2-nm to 10-nm in thickness formed on sputtered Cu has been evaluated. For the plasma-assisted Cu oxide, weak Cu2O and/or CuO X-ray diffraction pattern is observed, while no diffraction pattern in native and thermally (170°C) grown oxides. Those native and thermal oxides show Cu2O coordination observed by XANES (X-ray Absorption Near Edge Structure) method. This suggests that Cu oxide formed at low temperatures consists of stoichiometric Cu2O in an amorphous structure. According to the Fowler-Nordheim (F-N) current emission model, the current emission taking place at Cu2O decreases with increasing of the oxide thickness and its mean barrier height (φB) in the MIM band structure. In case of current density at 106A/cm2 of 1V, it is estimated that the allowable thickness of Cu oxides is approximately 1.5-nm at 1 eV of barrier height.

Facile hydrothermal synthesis of Fe3O4 nanoparticle and effect of crystallinity on performances for supercapacitor

2019 ◽  
Vol 12 (02) ◽  
pp. 1950019 ◽  
Author(s):  
Yue Xu ◽  
Ying Zhang ◽  
Xiaolan Song ◽  
Hanjun Liu
Keyword(s):  
Hydrothermal Method ◽  
Reaction Times ◽  
Amorphous Structure ◽  
Electrochemical Performances ◽  
X Ray Diffraction ◽  
Oxide Electrode ◽  
Facile Hydrothermal Method ◽  
X Ray ◽  
Pseudocapacitive Behavior ◽  
Adsorption Desorption

Fe3O4 nanoparticles were synthesized by a facile hydrothermal method using triethanolamine. Effects of reaction times (2–8[Formula: see text]h) on crystallinity and electrochemical performances of Fe3O4 were investigated. Samples were analyzed by X-ray diffraction, infrared spectroscopy, N2 adsorption–desorption, scanning electron microscope, galvanostatic charge/discharge, and cyclic voltammetry. Results showed that the crystallinity of Fe3O4 was increased with hydrothermal time, and the sample prepared at 2[Formula: see text]h displayed amorphous structure with small grain size and large surface area of 165.0[Formula: see text]m2[Formula: see text]g[Formula: see text]. The sample exhibited typical pseudocapacitive behavior with capacitance of 383.2[Formula: see text]F[Formula: see text]g[Formula: see text] at 0.5 Ag[Formula: see text] in Na2SO3 electrolyte. After 2000 cycles, the capacitance retention of Fe3O4 at 2[Formula: see text]h was recorded as 83.6%, much higher than 26.3% for sample at 8[Formula: see text]h. It indicated that hydrothermal method was an effective approach to obtain amorphous Fe3O4, implying the potential application for preparing metal oxide electrode for supercapacitors.

Effect of Substrate Temperature on the Electrochromic Properties of Cobalt Hydroxide Thin Films Prepared by Reactive Sputtering

2011 ◽  
Vol 1328 ◽  
Author(s):  
KyoungMoo Lee ◽  
Yoshio Abe ◽  
Midori Kawamura ◽  
Hidenobu Itoh
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Indium Tin Oxide ◽  
Large Change ◽  
Amorphous Structure ◽  
Cobalt Hydroxide ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Substrate Temperatures

ABSTRACTCobalt hydroxide thin films with a thickness of 100 nm were deposited onto glass, Si and indium tin oxide (ITO)-coated glass substrates by reactively sputtering a Co target in H2O gas. The substrate temperature was varied from -20 to +200°C. The EC performance of the films was investigated in 0.1 M KOH aqueous solution. X-ray diffraction (XRD) and Fourier transform infrared (FTIR) spectroscopy of the samples indicated that Co3O4 films were formed at substrate temperatures above 100°C, and amorphous CoOOH films were deposited in the range from 10 to -20°C. A large change in transmittance of approximately 26% and high EC coloration efficiency of 47 cm2/C were obtained at a wavelength of 600 nm for the CoOOH thin film deposited at -20°C. The good EC performance of the CoOOH films is attributed to the low film density and amorphous structure.

scholarly journals A Study on the Characteristics of Cu–Mn–Dy Alloy Resistive Thin Films

Coatings ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 118 ◽  
Author(s):  
Ho-Yun Lee ◽  
Chi-Wei He ◽  
Ying-Chieh Lee ◽  
Da-Chuan Wu
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Annealing Temperature ◽  
Phase Evolution ◽  
Amorphous Structure ◽  
X Ray Diffraction ◽  
Temperature Coefficient Of Resistance ◽  
X Ray ◽  
Transmission Electronmicroscopy ◽  
Scanning Electron

Cu–Mn–Dy resistive thin films were prepared on glass and Al2O3 substrates, which wasachieved by co-sputtering the Cu–Mn alloy and dysprosium targets. The effects of the addition ofdysprosium on the electrical properties and microstructures of annealed Cu–Mn alloy films wereinvestigated. The composition, microstructural and phase evolution of Cu–Mn–Dy films werecharacterized using field emission scanning electron microscopy, transmission electronmicroscopy and X-ray diffraction. All Cu–Mn–Dy films showed an amorphous structure when theannealing temperature was set at 300 °C. After the annealing temperature was increased to 350 °C,the MnO and Cu phases had a significant presence in the Cu–Mn films. However, no MnO phaseswere observed in Cu–Mn–Dy films at 350 °C. Even Cu–Mn–Dy films annealed at 450 °C showedno MnO phases. This is because Dy addition can suppress MnO formation. Cu–Mn alloy filmswith 40% dysprosium addition that were annealed at 300 °C exhibited a higher resistivity of ∼2100 μΩ·cm with a temperature coefficient of resistance of –85 ppm/°C.

New method for the production of bulk amorphous materials of Nd–Fe–B alloys

2005 ◽  
Vol 20 (3) ◽  
pp. 563-566 ◽  
Author(s):  
Tetsuji Saito ◽  
Hiroyuku Takeishi ◽  
Noboru Nakayama
Keyword(s):  
Electron Microscopy ◽  
Amorphous Materials ◽  
Room Temperature ◽  
Amorphous Structure ◽  
X Ray Diffraction ◽  
Bulk Materials ◽  
X Ray ◽  
Transmission Electron ◽  
Melt Spun ◽  
Melt Spun Ribbons

We report a new compression shearing method for the production of bulk amorphous materials. In this study, amorphous Nd–Fe–B melt-spun ribbons were successfully consolidated into bulk form at room temperature by the compression shearing method. X-ray diffraction and transmission electron microscopy studies revealed that the amorphous structure was well maintained in the bulk materials. The resultant bulk materials exhibited the same magnetic properties as the original amorphous Nd–Fe–B materials.

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