Structural Characterization of Ultrathin Epitaxial ErSi2−x on Si(111)
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ABSTRACTThe epitaxial structure of ErSi2−x on Si(1 11) has been investigated using Rutherford backscattering (RBS) and transmission electron microscopy (TEM). Films 10 nm. thick show channeling minimum yields of 4% after room temperature deposition and annealing to 800°C. Plan view electron microscopy on ultrathin layers 0.5 nm. to 10 nm. thick reveals the formation of a complex microstructure involving vacancy ordering in these films. This superlattice structure is interpreted by considering domain formation and twinning in the heteroepitaxial ErSi2−x.
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2014 ◽
Vol 602-603
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pp. 19-22
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2012 ◽
Vol 557-559
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pp. 624-627
Techniques for Studying Nanoparticle Sintering by Plan-View In Situ Transmission Electron Microscopy
1998 ◽
Vol 4
(3)
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pp. 248-253
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