Heteroepitaxial Diamond Formed on Silicon Wafer Observed by High Resolution Electron Microscopy
Keyword(s):
AbstractDiamond films with high preferential orientation (111) on silicon (100) crystalline orientation substrates had been obtained by hot-filament chemical vapor deposition (HFCVD) method. X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, and high-resolution cross-sectional transmission electron microscopy (HREM) are used to characterizate the structure and morphology of the synthesised diamond films. Diamond (111) plans had been local grown epitaxially on the Si(100) substrate observed by HREM. SEM photographes show that plane diamond crystals have been obtained.
1990 ◽
Vol 48
(4)
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pp. 242-243
1999 ◽
Vol 14
(7)
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pp. 2732-2738
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