Al-21Ti-23Cr High-Temperature Protective Coating on TiAl Intermetallic Compounds by RF Magnetron Sputtering

1996 ◽  
Vol 460 ◽  
Author(s):  
J. Y. Park ◽  
H. N. Lee ◽  
S. W. Park ◽  
M. H. Oh ◽  
D. M. Wee
Keyword(s):  
High Temperature ◽  
Magnetron Sputtering ◽  
Tensile Test ◽  
Protective Coating ◽  
Cyclic Oxidation ◽  
Oxidation Behavior ◽  
Tensile Deformation ◽  
Rf Magnetron Sputtering ◽  
Deformation Properties ◽  
Before And After

ABSTRACTTi-48A1 specimens were coated with Al-21Ti-23Cr film at 200 W, 0.8 Pa and 573 K by RF magnetron sputtering. The oxidation behavior of the coated specimens was investigated through isothermal and cyclic oxidation tests, and the tensile deformation properties of the coated specimens were also investigated before and after oxidation. The isothermal and cyclic oxidation curves showed that the Al-21Ti-23Cr film was very effective in decreasing the oxidation rate of Ti-48A1. This excellent oxidation resistance is attributable to the formation of a protective Al2O3 layer on the surface of the Al-21Ti-23Cr film. It was found from the results of the tensile test that the protective Al2O3 layer on the surface of the Al-21Ti-23Cr film enabled the Ti-48A1 to maintain its tensile properties in an oxidizing environment.

Tensile Properties and Fracture Behavior of SiCp/AC4CH Composite at Loading Velocities of up to 10m/s

2004 ◽  
Vol 449-452 ◽  
pp. 305-308
Author(s):  
Lei Wang ◽  
Toshiro Kobayashi ◽  
Chun Ming Liu
Keyword(s):  
Tensile Strength ◽  
Ultimate Tensile Strength ◽  
Yield Strength ◽  
Tensile Test ◽  
Strain Rate ◽  
Fracture Behavior ◽  
Tensile Deformation ◽  
Optical Microscope ◽  
Fracture Elongation ◽  
Before And After

Tensile test at loading velocities up to 10 m·s-1(strain rate up to 3.2x102s-1) was carried out forr SiCp/AC4CH composite and AC4CH alloy. The microstructure of the composite before and after tensile deformation was carefully examined with both optical microscope and SEM. The experimental results demonstrated that the ultimate tensile strength (UTS) and yield strength (YS) increase with increasing loading velocity up to 10 m·s-1. Comparing with AC4CH alloy, the fracture elongation of the composite is sensitivity with the increasing strain rate. The YS of both the composite and AC4CH alloy shows more sensitive than that of the UTS with the increasing strain rate, especially in the range of strain rate higher than 102s-1.

High temperature cyclic oxidation behavior of a low manganese Fe12Mn9Cr5Si4Ni-NbC shape memory stainless steels

2021 ◽  
Vol 857 ◽  
pp. 158198
Author(s):  
Artur Mariano de Sousa Malafaia ◽  
Rodrigo da Silva ◽  
Carlos Alberto Della Rovere ◽  
Renato Baldan ◽  
Lucía Suárez-Fernández ◽  
...  
Keyword(s):  
High Temperature ◽  
Shape Memory ◽  
Stainless Steels ◽  
Cyclic Oxidation ◽  
Oxidation Behavior

Experimental Study and Numerical Simulation of the Tensile Test for GH4169 Coated with YSZ Coating at High Temperature

2015 ◽  
Vol 782 ◽  
pp. 237-244
Author(s):  
Lin Lin Wang ◽  
Qun Bo Fan ◽  
Hong Mei Zhang ◽  
Fu Chi Wang
Keyword(s):  
High Temperature ◽  
Tensile Test ◽  
Tensile Deformation ◽  
Axial Stress ◽  
Simulation Method ◽  
Metal Substrate ◽  
Transitional Region ◽  
Failure Initiation ◽  
Ysz Coating ◽  
High Temperature Tensile

In this study, high temperature tensile test was conducted on the specimen of superalloy GH4169 coated with wt8%-YSZ under the conditions of 950°C and 80MPa. By using finite element (FE) simulation method, the failure initiation and evolution of the metal substrate and YSZ coating were predicted. It was found that stress concentration originally occurred in the YSZ ceramic top coating, causing an axial stress and triggering severe debonding failure in the center region of the specimen at t=180s. With increased load, further interfacial debonding failure of the residual coating occurred due to the presence of oblique tensile stress and at t=900s, and only a few residues can be seen at the arc transitional region. Subsequently, the metal substrate was subjected to uniform tensile deformation and finally ruptured at t=76min with apparent necking. In addition, it was notable that YSZ coating can relieve stress significantly (nearly 40% lower), thus helping prolong the substrate's service life in the same environment. Simulated results were consistent with observed behavior.

scholarly journals High Temperature Anti-Oxidation Behavior and Mechanical Property of Radio Frequency Magnetron Sputtered Cr Coating

Metals ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1509
Author(s):  
Guangbin Li ◽  
Yanhong Liu ◽  
Yingchun Zhang ◽  
Huailin Li ◽  
Xiaojing Wang ◽  
...  
Keyword(s):  
High Temperature ◽  
Radio Frequency ◽  
Oxidation Behavior ◽  
Zirconium Alloys ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Temperature Oxidation ◽  
High Temperature Steam ◽  
High Temperature Oxidation Behavior ◽  
Cr Coating

A dense and uniform Cr coating was fabricated on the zirconium alloys fuel claddings by radio frequency (RF) magnetron sputtering to improve the mechanical and anti-oxidation properties under 1200 °C steam environment. The phase composition and the micro and macro morphologies of the specimens were investigated by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), scanning electron microscope (SEM) and optical-microtopography (OM) analyses, and the high-temperature oxidation behavior was evaluated at 1200 °C steam environment for 3000 s. In this paper, there exists a positive correlation between thickness and Vickers hardness (HV), and a negative correlation between surface roughness and bonding force. Radial tensile was introduced to investigate the deformation-resistant performance, and the displacement of the Cr-coated specimen was as low as 2.32 mm, which was much lower than the uncoated zircaloy cladding (3.05 mm). Different thicknesses of Cr coatings were deposited to investigate the oxidation degrees of zircaloy cladding under a high-temperature steam environment. The optimal 6 μm Cr-coated zirconium alloys cladding exhibited an excellent anti-oxidation property, and the weight gain was as low as ~4.12 mg/cm2, which was almost one-third of the uncoated specimen.

Comparative Study of High Temperature Anti-oxidation Property of Sputtering Deposited Stoichiometric and Si-rich SiC Films

2021 ◽  
Author(s):  
Hang-hang WANG ◽  
Wen-qi LU ◽  
Jiao ZHANG ◽  
Jun XU
Keyword(s):  
High Temperature ◽  
Photoelectron Spectroscopy ◽  
Electron Cyclotron Resonance ◽  
Rf Magnetron Sputtering ◽  
Temperature Oxidation ◽  
Ecr Plasma ◽  
Depth Direction ◽  
Before And After ◽  
Sic Film ◽  
Sic Films

Abstract Stoichiometric and silicon-rich (Si-rich) SiC films were deposited by Microwave Electron Cyclotron Resonance (MW-ECR) plasma enhanced RF magnetron sputtering method. As-deposited films were oxidized at 800, 900 and 1000 ℃ in air for 60 min. The chemical composition and structure of the films were analyzed by X-ray Photoelectron Spectroscopy (XPS), Raman spectroscopy and Fourier Transform Infrared spectroscopy (FT-IR). The surface morphology of the films before and after high temperature oxidation was measured by atomic force microscopy. The mechanical property of the films was measured by a Nano-indenter. The anti-oxidation temperature of the Si-rich SiC film is 100 ℃ higher than that of the stoichiometric SiC film. The oxidation layer thickness of the Si-rich SiC film is thinner than that of the stoichiometric SiC film in depth direction. The large amount of extra silicon in the Si-rich SiC film plays an important role in the improvement of its high temperature anti-oxidation property.

Effect of TiC Content on Oxidation Behavior of Sintered WC-TiC-TaC Alloys

2007 ◽  
Vol 534-536 ◽  
pp. 1173-1176 ◽  
Author(s):  
Hiroki Tanaka ◽  
Shigeki Mouri ◽  
Kenji Nakahara ◽  
Hideaki Sano ◽  
Guo Bin Zheng ◽  
...  
Keyword(s):  
High Temperature ◽  
Oxidation Behavior ◽  
Oxidation Mechanism ◽  
Mass Change ◽  
Composition Analysis ◽  
Oxidation Test ◽  
Before And After ◽  
Main Component ◽  
Map Analysis ◽  
Oxidation Scale

The effect of TiC content on oxidation behavior of the sintered WC-TiC-TaC alloys with 2 mass% TaC and different TiC amount of 3-45 mass% was investigated through oxidation tests in air at 973K in order to clarify their oxidation mechanism at high temperature. Based on the results of mass change, SEM observation, elemental map analysis and composition analysis of the samples before and after the oxidation test, it was revealed that with increasing TiC content in the alloys, mass changes from oxidation and thickness of the oxidation scale decreased. Thus, it is considered that the main component of the scales changed from WO3 to TiO2 gradually with increasing TiC content in the alloys, and oxygen diffusing through the oxidation scale to the alloys was inhibited more and more.

High-temperature cyclic oxidation behavior and mechanism of Mo2FeB2-based cermets with various boron contents

2021 ◽  
pp. 109665
Author(s):  
Zhen Cao ◽  
Yongxin Jian ◽  
Zhifu Huang ◽  
Liujie Xu ◽  
Jingbo Fan
Keyword(s):  
High Temperature ◽  
Cyclic Oxidation ◽  
Oxidation Behavior

Tin monosulfide (SnS) epitaxial films grown by RF magnetron sputtering and sulfurization on MgO(100) substrates

2021 ◽  
Author(s):  
Kota Takisawa ◽  
Mutsumi Sugiyama
Keyword(s):  
Electrical Properties ◽  
Grain Boundary ◽  
Magnetron Sputtering ◽  
Carrier Transport ◽  
Rotational Symmetry ◽  
Rf Magnetron Sputtering ◽  
Epitaxial Films ◽  
Level Energy ◽  
Cross Sectional ◽  
Before And After

Abstract The crystallographic and electrical properties of tin monosulfide (SnS) epitaxial thin films grown by RF magnetron sputtering and sulfurization were investigated. The SnS(040)-oriented films were grown on an MgO(100) substrate. Two types of four-fold rotational symmetrical in-plane orientations, offset by 45° from each other, were observed using X-ray diffraction. The rotational symmetry was also observed using cross-sectional transmission electron microscopy. The electrical properties of the SnS films were controlled by varying the sulfurization temperature, and the carrier transport of all the SnS epitaxial films was mainly limited by grain boundary scattering. The activation energies of the carrier concentration before and after sulfurization of the films were estimated to be approximately 0.26 ± 0.02 eV and 0.20 ± 0.01 eV, respectively, based on temperature-dependent Hall measurements. These values mainly correspond to the acceptor level energy of Sn vacancy with a high/low potential barrier height around the grain boundary.

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