scholarly journals Lateral Growth of InN on GaN/Sapphire

2001 ◽  
Vol 693 ◽  
Author(s):  
Fuh-Hsiang Yang ◽  
Jih-Hsien Hwang ◽  
Kuei-Hsien Chen ◽  
Ying-Jay Yang
Keyword(s):  
Raman Spectrum ◽  
Surface Morphology ◽  
Growth Conditions ◽  
Epitaxial Films ◽  
Lateral Growth ◽  
High Quality ◽  
Stripe Pattern ◽  
Rocking Curve ◽  
X Ray

AbstractThe lateral growth of high quality InN on the stripe-pattern GaN/sapphire substrate with an OMVPE system was studied. The surface morphology and structural properties were investigated. Epitaxial films were achieved due to the greatly reduced strain by lateral growth. Two kinds of growth mode were observed due to different growth conditions of V/III ratios. X-ray rocking curve with FWHM of 700 arcsec shows the good quality of the film and E2 mode of Raman spectrum with FWHM of 3.5 cm-1 is among the best results ever reported in the literature.

High Quality Hydrothermal ZnO Crystals

1998 ◽  
Vol 537 ◽  
Author(s):  
M. Suscavage ◽  
M. Harris ◽  
D. Bliss ◽  
P. Yip ◽  
S.-Q. Wang ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Liquid Helium ◽  
Room Temperature ◽  
Surface Preparation ◽  
Critical Factor ◽  
High Quality ◽  
Rocking Curve ◽  
X Ray ◽  
Oxide Crystals

AbstractZinc Oxide crystals have historically been grown in hydrothermal autoclaves with a basic mineralizer; however, doubts have been raised about the quality of such crystals because they have often exhibited large x-ray rocking curve widths and low photoluminescence (PL) yield with large linewidths. Several ZnO crystals were grown hydrothermally and sliced parallel to the c-plane. This resulted in opposite surfaces (the C+ and C-) exhibiting pronounced chemical and mechanical differences. Different surface treatments were investigated and compared by PL both at room temperature and liquid helium temperatures, and by double axis X-ray rocking curve measurements. The high quality of hydrothermally-grown ZnO is substantiated by the narrow rocking curve widths and sharp PL peaks obtained. A critical factor in obtaining these results was found to be surface preparation.

scholarly journals High Quality Hydrothermal ZnO Crystals

1999 ◽  
Vol 4 (S1) ◽  
pp. 287-292 ◽  
Author(s):  
M. Suscavage ◽  
M. Harris ◽  
D. Bliss ◽  
P. Yip ◽  
S.-Q. Wang ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Liquid Helium ◽  
Room Temperature ◽  
Surface Preparation ◽  
Critical Factor ◽  
High Quality ◽  
Rocking Curve ◽  
X Ray ◽  
Oxide Crystals

Zinc Oxide crystals have historically been grown in hydrothermal autoclaves with a basic mineralizer; however, doubts have been raised about the quality of such crystals because they have often exhibited large x-ray rocking curve widths and low photoluminescence (PL) yield with large linewidths. Several ZnO crystals were grown hydrothermally and sliced parallel to the c-plane. This resulted in opposite surfaces (the C+ and C−) exhibiting pronounced chemical and mechanical differences. Different surface treatments were investigated and compared by PL both at room temperature and liquid helium temperatures, and by double axis X-ray rocking curve measurements. The high quality of hydrothermally-grown ZnO is substantiated by the narrow rocking curve widths and sharp PL peaks obtained. A critical factor in obtaining these results was found to be surface preparation.

scholarly journals Mechanism for Improved Quality B12As2 Epitaxial Films on (0001) 4H-SiC Substrates by Tilting toward [1-100] Direction

2010 ◽  
Vol 1246 ◽  
Author(s):  
Yu Zhang ◽  
Hui Chen ◽  
Michael Dudley ◽  
Yi Zhang ◽  
James Edgar ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Substrate Surface ◽  
Epitaxial Films ◽  
High Quality ◽  
X Ray ◽  
Transmission Electron ◽  
Device Applications ◽  
Substrate Choice ◽  
Single Orientation

AbstractIn this work, 4H-SiC substrates intentionally misoriented from the (0001) plane toward [1-100] direction are shown to eliminate rotational twinning in icosahedral boron arsenide (B12As2, abbreviated here as IBA) epitaxial films. Previous studies of IBA on other substrates, including (100), (110), (111) Si and (0001) 6H-SiC, produced polycrystalline and twinned epilayers. Comparisons of IBA on on-axis and off-axis c-plane 4H-SiC by synchrotron white beam x-ray topography (SWBXT), and high resolution transmission electron microscopy (HRTEM) confirm the single crystalline and much higher quality of the films on the latter substrates. Furthermore, no intermediate layer between the epilayer and substrate was observed for IBA on off-axis 4H-SiC. Steps formed on the off-axis 4H-SiC substrate surface before deposition cause the film to adopt a single orientation, a process that is not seen with substrates with either no misorientation, or those tilted toward the [11-20] direction. This work demonstrates that c-plane 4H-SiC with 7° offcut toward (1-100) is potentially a good substrate choice for the growth of high-quality, untwinned B12As2 epilayers for future device applications.

Effect of HVPE GaN Substrate Condition on the Characteristics and Performance of 405 nm LEDs

2006 ◽  
Vol 916 ◽  
Author(s):  
James R Grandusky ◽  
Muhammad Jamil ◽  
Vibhu Jindal ◽  
Fatemeh Shahedipour-Sandvik ◽  
Hai Lu ◽  
...  
Keyword(s):  
Surface Morphology ◽  
Substrate Surface ◽  
Growth Conditions ◽  
Optical Microscope ◽  
Optical Quality ◽  
Crystalline Quality ◽  
Rocking Curve ◽  
Substrate Quality ◽  
And Performance

AbstractThis article reports on the effects of HVPE GaN substrate condition on the performance of 405 nm LEDs grown by MOCVD. Three 1 cm2 HVPE GaN substrates were received from a commercially available source and characterized for the substrate condition. AFM and optical microscope were used to characterize the surface morphology and this was found to vary from a “moonscaped” morphology to a smooth surface. The presence of nanoscale pits and substrate bowing were also found. XRD measurements showed a variation in crystalline quality of the substrates with the FWHM of the (0002) rocking curve varying from 87 arcsec to 192 arcsec with some substrates showing multiple peaks in the rocking curve. Photoluminescence was used to measure the optical quality of the substrates and both band edge luminescence and yellow luminescence were found to vary greatly within one substrate as well as from substrate to substrate. After characterization of each individual substrate a 405 nm LED structure was grown using identical growth conditions on each substrate, in separate growth runs. A GaN template was included in each growth for consistency. The surface morphology and crystalline quality of the device structures were then measured. Following this devices were fabricated and tested for electroluminescence optical output power and current-voltage characteristics. The device characteristics and performance as related to starting substrate quality will be presented with respect to substrate surface morphology and crystalline structure.

scholarly journals Short-pulse laser-driven x-ray radiography

2016 ◽  
Vol 4 ◽  
Author(s):  
E. Brambrink ◽  
S. Baton ◽  
M. Koenig ◽  
R. Yurchak ◽  
N. Bidaut ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Incident Angle ◽  
Laboratory Astrophysics ◽  
Signal To Noise ◽  
High Quality ◽  
X Ray ◽  
Short Pulse Laser ◽  
Short Pulse Lasers

We have developed a new radiography setup with a short-pulse laser-driven x-ray source. Using a radiography axis perpendicular to both long- and short-pulse lasers allowed optimizing the incident angle of the short-pulse laser on the x-ray source target. The setup has been tested with various x-ray source target materials and different laser wavelengths. Signal to noise ratios are presented as well as achieved spatial resolutions. The high quality of our technique is illustrated on a plasma flow radiograph obtained during a laboratory astrophysics experiment on POLARs.

Fabrication of Ultrathin Bragg Beam Splitter by Plasma Chemical Vaporization Machining

2012 ◽  
Vol 523-524 ◽  
pp. 40-45 ◽  
Author(s):  
Taito Osaka ◽  
Makina Yabashi ◽  
Yasuhisa Sano ◽  
Kensuke Tono ◽  
Yuichi Inubushi ◽  
...  
Keyword(s):  
Beam Splitter ◽  
Bragg Reflection ◽  
Free Electron Lasers ◽  
Crystalline Perfection ◽  
Plasma Chemical ◽  
High Quality ◽  
Rocking Curve ◽  
Mechanical Process ◽  
X Ray ◽  
Beam Splitters

A novel fabrication process was proposed to produce high-quality Bragg beam splitters for hard X-ray free-electron lasers (XFELs), which should consist of thin, bend-free, and robust Bragg-case crystals without any defects. A combination of a mechanical process and plasma chemical vaporization machining was employed. High crystalline perfection of the fabricated Si(110) crystal was verified with X-ray topography and rocking curve measurements. In addition, the thickness was evaluated to be 4.4 μm from the fringe period of the measured rocking curve. The crystal can be employed in Bragg beam splitters using the (220) Bragg reflection for X-ray pump-X-ray probe experiments with XFEL sources.

Investigation Of Nucleation And Initial Stage Of Gan Growth By Atomic Force Microscopy And X-Ray Diffraction

1997 ◽  
Vol 482 ◽  
Author(s):  
P. W. Yip ◽  
S.-Q. Wang ◽  
A. J. Drehman ◽  
L. D. Zhu ◽  
P. E. Norris
Keyword(s):  
Atomic Force Microscopy ◽  
Surface Morphology ◽  
Deposition Temperature ◽  
Yellow Luminescence ◽  
X Ray Diffraction ◽  
Rocking Curve ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Initial Stage

AbstractThe nucleation and initial stage of GaN growth on sapphire was investigated by atomic force microscopy, X-ray diffraction and photoluminescence. A 15 to 30 nm thick GaN buffer layer deposited at proper conditions was extremely smooth and nearly amorphous. Proper post deposition annealing resulted in the buffer crystallized. The buffer layer deposition temperature, thickness and annealing time and temperature must be coordinated. Low deposition temperature and/or insufficient annealing of the buffer results in a GaN wafer which has fine spiking surface morphology with an RMS of 3.4 nm for 1.4 μm wafer, strong yellow luminescence and wide xray rocking curve FWHM. High deposition temperature, longer crystallization time, and a low growth rate results in a wafer which exhibits strong band edge luminescence without noticeable yellow luminescence, and a narrow (002) diffraction rocking curve. However, the surface morphology exhibits well developed hexagonal feature with RMS roughness of 14.3 nm for a 570 nm thick layer. X-ray rocking curve analysis revealed buffer crystallization, domain coalescence and alignment process. The FWHM of the ω–scan of GaN (101) diffraction was 1700–2000 arc seconds for 200–1400 nm wafers which indicates that the twist of the domains is not changing much with the growth.

MOCVD Growth and Characterization of High-Quality ZnSe on GaAs

1994 ◽  
Vol 340 ◽  
Author(s):  
J. C. Chen ◽  
Bing Yang ◽  
F. Semendy ◽  
W. W. Clark ◽  
P. R. Boyd ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Defect Density ◽  
Growth Conditions ◽  
Misfit Dislocations ◽  
High Quality ◽  
Double Crystal ◽  
X Ray ◽  
Mocvd Growth ◽  
Order Of Magnitude

ABSTRACTHigh-quality ZnSe epilayers on GaAs substrates have been grown by MOCVD. Diethylzinc (DEZn) and diethylselenide (DESe) were used as source materials. Growth studies were done at 400°C under different growth conditions in an atmospheric pressure MOCVD reactor. The as-grown ZnSe epilayers were characterized by a wide variety of techniques, such as double crystal x-ray diffraction, low-temperature photoluminescence (PL), transmission electron microscopy (TEM), secondary ion mass spectrometry (SIMS), and scanning electron microscopy (SEM).The results show excellent structural and optical properties of ZnSe. The best material was grown on undoped GaAs at the VI/II ratio near unity. The full-width-at-half-maximum (FWHM) of ZnSe (∼0.2/μm thick) x-ray peak as low as 90 arc seconds was achieved. TEM results also show very low defect density. The density of stacking faults is less than 105/cm2 which is four orders of magnitude less than that of samples grown by conventional MBE [J. Petruzzello et al. J. Appl. Phys. 63, 2299 (1988)] and MOCVD [J.L. Batstone et al. Philos. Mag A, 66, 609, 1992]. The spacing between misfit dislocations is between 5 to 10,μm which is one order of magnitude larger than that of reported sample of comparable thickness.

Digital X-Ray Rocking Curve Topography

1986 ◽  
Vol 82 ◽  
Author(s):  
T. S. Ananthanarayanan ◽  
R. G. Rosemeier ◽  
W. E. Mayo ◽  
J. H. Dinan
Keyword(s):  
Bragg Reflection ◽  
Strain Tensor ◽  
Epitaxial Films ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Density Maps ◽  
First Time ◽  
Considerable Body ◽  
Double Crystal Diffractometer

SUMMARYThere is a considerable body of work available illustrating the significance of X-ray rocking curve measurements in micro-electronic applications. For the first time a high resolution (100-150µm) 2-dimensional technique called DARC (Digital Autcmated Rocking Curve) topography has been implemented. This method is an enhancement of the conventional double crystal diffractometer using a real time 2-dimensional X-ray detector.Several materials have been successfully examined using DARC topography. Same of these include: Si, GaAs, AlGaAs, InGaAs, HgMnTe, Al, Inconel, steels, etc. By choosing the appropriate Bragg reflection multi-layered micro-electronic structures have been analyzed nondestructively. Several epitaxial films, including HgCdTe and ZnCdTe, grown by molecular beam epitaxy, have also been characterized using iARC topography. The rocking curve half width maps can be translated to dislocation density maps with relative ease. This technique also allows the deconvolution of the micro-plastic lattice strain ccaponent from the total strain tensor.

Characterization and Growth Mechanism of B12As2 Epitaxial Layers Grown on (1-100) 15R-SiC

2008 ◽  
Vol 1069 ◽  
Author(s):  
Hui Chen ◽  
Guan Wang ◽  
Michael Dudley ◽  
Zhou Xu ◽  
James. H. Edgar ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Growth Mechanism ◽  
Heteroepitaxial Growth ◽  
High Quality ◽  
X Ray ◽  
Transmission Electron ◽  
Substrate Choice

ABSTRACTA systematic study is presented of the heteroepitaxial growth of B12As2 on m-plane 15R-SiC. In contrast to previous studies of B12As2 on other substrates, including (100) Si, (110) Si, (111) Si and (0001) 6H-SiC, single crystalline and untwinned B12As2 was achieved on m-plane 15R-SiC. Observations of IBA on m-plane (1100)15R-SiC by synchrotron white beam x-ray topography (SWBXT) and high resolution transmission electron microscopy (HRTEM) confirm the good quality of the films on the 15R-SiC substrates. The growth mechanism of IBA on m-plane 15R-SiC is discussed. This work demonstrates that m-plane 15R-SiC is potentially a good substrate choice to grow high quality B12As2 epilayers.

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