Nucleation And Growth of Yttria-Stabilized Zirconia Thin Films Using Combustion Chemical Vapor Deposition
Keyword(s):
ABSTRACTLiquid fuel combustion chemical vapor deposition technique was successfully used for YSZ thin film processing. The nucleation rates were obtained for the samples processed at different temperatures and total-metal-concentrations in the liquid fuel. An optimum substrate temperature was found for the highest nucleation rate. The nucleation rate was increased with the total-metal-concentration. Structural evolution of the thin film in the early processing stage was studied with regard to the formation of nuclei, crystallites and final crystals on the films. The films were found to be affected by high temperature annealing. The crystals and the thin films were characterized with scanning electron microscopy.
2006 ◽
Vol 6
(11)
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pp. 3479-3482
1991 ◽
Vol 30
(Part 1, No. 8)
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pp. 1740-1741
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2000 ◽
Vol 62
(1-2)
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pp. 193-199
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2010 ◽
Vol 81
(11)
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pp. 113903
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