Pulsed Electron Deposition (PED) - a Novel Tool for Growth of Thin Films

Pulsed Electron Deposition (PED) is a novel technique that can be applied for growing high quality thin films. In this technique, we used an electron beam with a focused diameter of about 1 mm, the energy up to 15 kV, the frequency of 1-10 Hz, the pulse width of 100 ns and the total current of 1.5 kA generated in a discharge system. A remarkable advantage of this technique is the low deviation in composition from bulk to film. By using the PED technique the transparent coducting ZnO and Cu(InGa)Se\(_{2 }\) films were prepared. The effect of some deposition conditions on the properties of film has been examined and discussed. For Cu(InGa)Se\(_{2 }\), the best film was obtained at the discharge voltage of 12 kV and substrate temperature of 400\(^\circ\)C, while for ZnO, the best film was grown at the oxygen pressure of 1.3 Pa and at 400(^\circ\)C.

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Optimization of Deposition Conditions to Grow High-Quality Fe–Se–Te Thin Films

IEEE Transactions on Applied Superconductivity ◽

10.1109/tasc.2016.2636570 ◽

2017 ◽

Vol 27 (4) ◽

pp. 1-5 ◽

Cited By ~ 3

Author(s):

Pusheng Yuan ◽

Zhongtang Xu ◽

Yanwei Ma ◽

Yue Sun ◽

Tsuyoshi Tamegai

Keyword(s):

Thin Films ◽

High Quality ◽

Deposition Conditions

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A Novel Approach for Fabricating LaMnO3 Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

Journal of Chemistry ◽

10.1155/2019/3568185 ◽

2019 ◽

Vol 2019 ◽

pp. 1-8

Author(s):

Thi Ha Tran ◽

Thi Trung Anh Tang ◽

Nguyen Hai Pham ◽

Thanh Cong Bach ◽

Cong Doanh Sai ◽

...

Keyword(s):

Thin Films ◽

Flux Ratio ◽

Combustion Method ◽

Thin Film Deposition ◽

Discharge Voltage ◽

Film Deposition ◽

X Ray ◽

Microwave Combustion ◽

Novel Approach ◽

Pulsed Electron Deposition

LaMnO3 (LMO) nanopowder was synthesized by the microwave combustion method using glycine and nitrate salts of La and Mn as precursors. The as-prepared LMO powder was pressed at high pressure and annealed at 1000°C for 8 hours to make a target for thin film deposition. The structural and elemental analysis was obtained by X-ray diffraction (XRD) and energy dispersive X-ray spectroscopy (EDS). Thin films of LMO were fabricated using pulsed electron deposition (PED) at room temperature. The effects of discharge voltage and oxygen/argon flux ratio on the produced thin films were studied. The study shows that stoichiometry and structure of the target was preserved well in the thin films prepared with a discharge voltage from 14 to 15 kV, while the oxygen/nitrogen flux ratio did not show a clear effect on the quality of thin films.

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Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4927437 ◽

2015 ◽

Vol 33 (6) ◽

pp. 061503 ◽

Cited By ~ 7

Author(s):

Fanping Meng ◽

Shou Peng ◽

Genbao Xu ◽

Yun Wang ◽

Fangfang Ge ◽

...

Keyword(s):

Thin Films ◽

Discharge Voltage ◽

Sputter Deposition ◽

Zno Thin Films ◽

High Quality ◽

Magnetron Sputter Deposition ◽

Doped Zno ◽

Magnetron Sputter

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Spectral-Component Monitoring of the Plumes Generated during the Deposition of RE(Y, Nd) Ba2Cu3O7−x Films by Pulsed Laser Ablation

MRS Proceedings ◽

10.1557/proc-502-215 ◽

1997 ◽

Vol 502 ◽

Cited By ~ 1

Author(s):

R. Biggers ◽

C. Varanasi ◽

I. Maartense ◽

D. Dempsey ◽

D. Mastc ◽

...

Keyword(s):

Thin Films ◽

Spectral Component ◽

Emission Spectra ◽

High Quality ◽

Time Resolved ◽

Control Techniques ◽

Spectral Components ◽

Krf Excimer Laser ◽

Pulse Energies ◽

Deposition Conditions

ABSTRACTYba2Cu3OT7−x (Y123) and NdBa2Cu3O7−x (Nd123) thin films were deposited by PLD using a 248 nm wavelength KrF excimer laser. The emission spectra PLD process control techniques developed to grow reproducibly high quality Y123 thin films were also applied to the Nd123 depositions. The time-resolved spectral components of plumes generated from Y123 and Nd123 targets at the same deposition conditions were compared. When the two targets were mounted at the same distance from the substrate heater, the spectral emissions at 327 ± 5 nm (Cu*) were essentially identical for similar laser pulse energies and other deposition conditions (150 mTorr oxygen pressure, 760°C substrate heater temperatures, etc.). High quality Nd 123 films (Tc ˜93 K, Jc > 2x 106 A/cm2) are considerably more difficult to produce than those of Y123. Deposition conditions associated with PLD of high quality Y123 films produce very poor Nd 123 films. This observation is consistent with the belief that the nucleation and growth of Nd 123 are significantly different than that of Y 123.

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High-quality textured SnSe thin films for self-powered, rapid-response photothermoelectric application

Nano Energy ◽

10.1016/j.nanoen.2020.104742 ◽

2020 ◽

Vol 72 ◽

pp. 104742 ◽

Cited By ~ 5

Author(s):

Yujia Zhong ◽

Li Zhang ◽

Vincent Linseis ◽

Bingchao Qin ◽

Wenduo Chen ◽

...

Keyword(s):

Thin Films ◽

Rapid Response ◽

High Quality ◽

Self Powered

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Fabrication of Transparent Mg(OH)2 Thin Films by Drop-Dry Deposition

Materials ◽

10.3390/ma14040724 ◽

2021 ◽

Vol 14 (4) ◽

pp. 724

Author(s):

Tong Li ◽

Masaya Ichimura

Keyword(s):

Thin Films ◽

Aqueous Solution ◽

Optical Properties ◽

Surface Morphology ◽

Magnesium Hydroxide ◽

Dry Deposition ◽

Visible Range ◽

Substrate Heating ◽

Water Effects ◽

Deposition Conditions

Magnesium hydroxide (Mg(OH)2) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO3)2 and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of different deposition conditions on the surface morphology and optical properties of Mg(OH)2 thin films were researched. Films with a thickness of 1−2 μm were successfully deposited, and the Raman peaks of Mg(OH)2 were observed for them. Their transmittance in the visible range was 95% or more, and the bandgap was about 5.8 eV. It was found that the thin films have resistivity of the order of 105 Ωcm. Thus, the transparent and semiconducting Mg(OH)2 thin films were successfully prepared by DDD.

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