Method and Implementation of High-Performance Diagnostics of Form of Electron Probe of Raster Electron Microscope

2020 ◽  
Vol 25 (6) ◽  
pp. 497-504
Author(s):  
I.V. Silaev ◽  
◽  
I.N. Goncharov ◽  
T.T. Magkoev ◽  
T.I. Radchenko ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Electron Probe ◽  
High Performance ◽  
Sample Plane ◽  
Raster Electron Microscope ◽  
Web Camera ◽  
Electron Image ◽  
Performance Diagnostics ◽  
Scanning Electron

An important unit of an electron microscope is the system controlling the electron beam, responsible for raster forming on the specimen and the electron probe focusing, which provides an achievement of minimum of aberrations and the maximum of resolving capacity of formed electron image. During using electron microscope the image quality gradually deteriorates, manifesting the resolving capacity reduction and the astigmatism appearance. An attachment developed for the raster electron microscope, permitting to perform the highly effective diagnostics of the configuration of the scanning electron beam, controlled by a precision magneto-optical system, has been offered. It has been shown that the direct visual observing the scanning electron probe, in particular the evaluation of the ellipticity of its cross-section using the WEB camera matrix, combined with the sample plane, as a result, provides more efficient tuning and repair of the scanning electron microscope.

Quality of the Secondary Electron Image at Low Accelerating Voltage

1970 ◽  
Vol 28 ◽  
pp. 390-391
Author(s):  
T. Kosuge ◽  
H. Hashimoto ◽  
M. Sato ◽  
S. Kimoto
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Image Quality ◽  
Electron Probe ◽  
Secondary Electron ◽  
Secondary Electron Image ◽  
Electron Image ◽  
Image Detail ◽  
Scanning Electron

A scanning electron microscope is usually operated at the accelerating voltage of 25 kV or so. The use of a lower accelerating voltage has many advantages to improve the image quality, such as presentation of fine details of the specimen surface, the prevention of the charge-up and that of the damage to the specimen by electron beam bombardment. In this paper, the quality of the secondary electron image is discussed under various accelerating voltages between 1 and 25 kV.As far it is considered that the limit of the resolution of a secondary electron image is only depend on the diameter of the incident electron probe, the higher accelerating voltage is prefered. Attainable resolutions in this experiment for various voltages are shown in Figure 1. However, as shown in Figure 2 most of the secondary electron images in which a critical resolution is not necessary reveal fine image detail with better contrast at lower voltages.

High Resolution Scanning Electron Microscopy

1991 ◽  
Vol 49 ◽  
pp. 478-479
Author(s):  
David Joy ◽  
James Pawley
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
Impact Point ◽  
Interaction Volume ◽  
Scanning Electron

The scanning electron microscope (SEM) builds up an image by sampling contiguous sub-volumes near the surface of the specimen. A fine electron beam selectively excites each sub-volume and then the intensity of some resulting signal is measured. The spatial resolution of images made using such a process is limited by at least three factors. Two of these determine the size of the interaction volume: the size of the electron probe and the extent to which detectable signal is excited from locations remote from the beam impact point. A third limitation emerges from the fact that the probing beam is composed of a finite number of discrete particles and therefore that the accuracy with which any detectable signal can be measured is limited by Poisson statistics applied to this number (or to the number of events actually detected if this is smaller).

Extracting Low Energy X-Ray Peaks From EDS and WDS Spectra

1998 ◽  
Vol 4 (S2) ◽  
pp. 218-219
Author(s):  
Robert L. Myklebust ◽  
Dale E. Newbury
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
High Performance ◽  
Incident Beam ◽  
Low Energy ◽  
Nanometer Scale ◽  
X Ray ◽  
Chemical Effects ◽  
Scanning Electron

Interest in electron beam x-ray microanalysis with low incident beam energies, defined arbitrarily as 5 keV and below, has been greatly stimulated in recent years by the development of the high performance field emission gun scanning electron microscope (FEG-SEM), which can produce a nanometer-scale probe with sufficient current to operate with both energy dispersive (EDS) and wavelength dispersive (WDS) spectrometers. Microanalysis in this regime requires the analyst to confront new spectrometry problems that are not typically encountered, or that can be safely ignored, when operating with conventional beam energies, 10 keV or greater. With low energy operation, the choice of atomic shells that can be accessed is restricted, forcing the analyst to make use of shells that have low fluorescence yields for intermediate and high atomic number elements, and possibly strong chemical effects, which are evident with high resolution x-ray spectrometry.

scholarly journals Electron Beam Current Loss at the High-Vacuum– High-Pressure Boundary in the Environmental Scanning Electron Microscope

2001 ◽  
Vol 7 (5) ◽  
pp. 397-406 ◽  
Author(s):  
Gerasimos D. Danilatos ◽  
Matthew R. Phillips ◽  
John V. Nailon
Keyword(s):  
High Pressure ◽  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
High Vacuum ◽  
Environmental Scanning ◽  
Probe Current ◽  
Prototype Instrument ◽  
Scanning Electron

AbstractA significant loss in electron probe current can occur before the electron beam enters the specimen chamber of an environmental scanning electron microscope (ESEM). This loss results from electron scattering in a gaseous jet formed inside and downstream (above) the pressure-limiting aperture (PLA), which separates the high-pressure and high-vacuum regions of the microscope. The electron beam loss above the PLA has been calculated for three different ESEMs, each with a different PLA geometry: an ElectroScan E3, a Philips XL30 ESEM, and a prototype instrument. The mass thickness of gas above the PLA in each case has been determined by Monte Carlo simulation of the gas density variation in the gas jet. It has been found that the PLA configurations used in the commercial instruments produce considerable loss in the electron probe current that dramatically degrades their performance at high chamber pressure and low accelerating voltage. These detrimental effects are minimized in the prototype instrument, which has an optimized thin-foil PLA design.

Resolution of a Transmitted Electron Image Formed by A Scanning Electron Microscope

1970 ◽  
Vol 28 ◽  
pp. 386-387
Author(s):  
S. Takashima ◽  
H. Hashimoto ◽  
S. Kimoto
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Specimen Thickness ◽  
Probe Diameter ◽  
Transmission Electron ◽  
Electron Image ◽  
Conventional Transmission Electron Microscope ◽  
Scanning Electron

The resolution of a conventional transmission electron microscope (TEM) deteriorates as the specimen thickness increases, because chromatic aberration of the objective lens is caused by the energy loss of electrons). In the case of a scanning electron microscope (SEM), chromatic aberration does not exist as the restrictive factor for the resolution of the transmitted electron image, for the SEM has no imageforming lens. It is not sure, however, that the equal resolution to the probe diameter can be obtained in the case of a thick specimen. To study the relation between the specimen thickness and the resolution of the trans-mitted electron image obtained by the SEM, the following experiment was carried out.

Edge Penetration Effects in the Low-Loss Electron Image in the SEM

1988 ◽  
Vol 46 ◽  
pp. 202-203
Author(s):  
Oliver C. Wells
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Beam Energy ◽  
Secondary Electron ◽  
Sharp Edge ◽  
Beam Diameter ◽  
Low Loss ◽  
Additional Information ◽  
Electron Image ◽  
Scanning Electron

The low-loss electron (LLE) image in the scanning electron microscope (SEM) is useful for the study of uncoated photoresist and some other poorly conducting specimens because it is less sensitive to specimen charging than is the secondary electron (SE) image. A second advantage can arise from a significant reduction in the width of the “penetration fringe” close to a sharp edge. Although both of these problems can also be solved by operating with a beam energy of about 1 keV, the LLE image has the advantage that it permits the use of a higher beam energy and therefore (for a given SEM) a smaller beam diameter. It is an additional attraction of the LLE image that it can be obtained simultaneously with the SE image, and this gives additional information in many cases. This paper shows the reduction in penetration effects given by the use of the LLE image.

X-ray micro tomography in the scanning electron microscope

1978 ◽  
Vol 36 (1) ◽  
pp. 106-107 ◽  
Author(s):  
W. Brünger
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Target Surface ◽  
The Body ◽  
X Rays ◽  
Cross Sectional ◽  
X Ray ◽  
Micro Tomography ◽  
Scanning Electron

Reconstructive tomography is a new technique in diagnostic radiology for imaging cross-sectional planes of the human body /1/. A collimated beam of X-rays is scanned through a thin slice of the body and the transmitted intensity is recorded by a detector giving a linear shadow graph or projection (see fig. 1). Many of these projections at different angles are used to reconstruct the body-layer, usually with the aid of a computer. The picture element size of present tomographic scanners is approximately 1.1 mm2.Micro tomography can be realized using the very fine X-ray source generated by the focused electron beam of a scanning electron microscope (see fig. 2). The translation of the X-ray source is done by a line scan of the electron beam on a polished target surface /2/. Projections at different angles are produced by rotating the object.During the registration of a single scan the electron beam is deflected in one direction only, while both deflections are operating in the display tube.

Slow-Scan CCD Observation of Backscattering Patterns in SEM

1992 ◽  
Vol 50 (2) ◽  
pp. 1308-1309
Author(s):  
F. Ouyang ◽  
D. A. Ray ◽  
O. L. Krivanek
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Dynamic Range ◽  
High Sensitivity ◽  
Lens System ◽  
Wide Dynamic Range ◽  
Peltier Cooler ◽  
Diffraction Patterns ◽  
Scanning Electron

Electron backscattering Kikuchi diffraction patterns (BKDP) reveal useful information about the structure and orientation of crystals under study. With the well focused electron beam in a scanning electron microscope (SEM), one can use BKDP as a microanalysis tool. BKDPs have been recorded in SEMs using a phosphor screen coupled to an intensified TV camera through a lens system, and by photographic negatives. With the development of fiber-optically coupled slow scan CCD (SSC) cameras for electron beam imaging, one can take advantage of their high sensitivity and wide dynamic range for observing BKDP in SEM.We have used the Gatan 690 SSC camera to observe backscattering patterns in a JEOL JSM-840A SEM. The CCD sensor has an active area of 13.25 mm × 8.83 mm and 576 × 384 pixels. The camera head, which consists of a single crystal YAG scintillator fiber optically coupled to the CCD chip, is located inside the SEM specimen chamber. The whole camera head is cooled to about -30°C by a Peltier cooler, which permits long integration times (up to 100 seconds).

PHAX-SCAN: Functional integration of a Scanning Electron Microscope and an energy-dispersive x-ray analyser

1989 ◽  
Vol 47 ◽  
pp. 56-57
Author(s):  
Marc H. Peeters ◽  
Max T. Otten
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
High Speed ◽  
High Performance ◽  
Functional Integration ◽  
Energy Dispersive ◽  
X Rays ◽  
X Ray ◽  
High Speed Analysis ◽  
Scanning Electron

Over the past decades, the combination of energy-dispersive analysis of X-rays and scanning electron microscopy has proved to be a powerful tool for fast and reliable elemental characterization of a large variety of specimens. The technique has evolved rapidly from a purely qualitative characterization method to a reliable quantitative way of analysis. In the last 5 years, an increasing need for automation is observed, whereby energy-dispersive analysers control the beam and stage movement of the scanning electron microscope in order to collect digital X-ray images and perform unattended point analysis over multiple locations.The Philips High-speed Analysis of X-rays system (PHAX-Scan) makes use of the high performance dual-processor structure of the EDAX PV9900 analyser and the databus structure of the Philips series 500 scanning electron microscope to provide a highly automated, user-friendly and extremely fast microanalysis system. The software that runs on the hardware described above was specifically designed to provide the ultimate attainable speed on the system.

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