scholarly journals Sub-Threshold Slope and ON/OFF Current variation in Nano-Scale MOSFETs

2019 ◽  
Author(s):  
Raja N Mir

The Multi Gate transistors (MGT) have been used to improve the transistor device performance at the nanometer scales. MGTs alleviate many problems in the planar devices due to tighter control of the gate on the channel. In this paper the change in the Fin Architecture and Gate Length of the MOS device, is correlated with the Subthreshold Slope (SS) and ON/OFF current ratio. The study is done by conducting experiments and three-dimensional simulations.

2020 ◽  
Vol 16 (2) ◽  
Author(s):  
Safayet Ahmed ◽  
Md. Tanvir Hasan

The effect of oxide thickness (EOT) on GaN-based double gate (DG) MOSFETs have been explored for low power switching device. The gate length (LG) of 8 nm with 4 nm underlap is considered. The device is turned off and on for gate voltage (VGS) of 0 V and 1 V, respectively. The effective oxide thickness (EOT) is varied from 1 nm to 0.5 nm and the device performance is evaluated. For EOT = 0.5 nm, the OFF-state current (IOFF), subthreshold slope (SS) and drain induced barrier lowering (DIBL) are obtained 2.97×10-8 A/μm, 69.67 mV/dec and 21.753 mV/V, respectively. These results indicate that, it is possible to minimize short channel effects (SCEs) by using smaller value of EOT.


2021 ◽  
Author(s):  
V. Bharath Sreenivas ◽  
Vadthiya Narendar

Abstract The main aim of this work is to study the effect of symmetric and asymmetric spacer length variations towards source and drain on n-channel SOI JL vertically stacked (VS) nanowire (NW) FET at 10 nm gate length (LG). Spacer length is proved to be one of the stringent metrics in deciding device performance along with width, height and aspect ratio (AR). The physical variants in this work are symmetric spacer length (LSD), source side spacer length (LS) and drain side spacer length (LD). The simulation results give highest ION/IOFF ratio with LD variation compared to LS and LSD, whereas latter two variations have similar effect on ION/IOFF ratio. At 25 nm (2.5 × LG) of LD, the device gives appreciable ON current with the highest ION/IOFF ratio (2.19 × 108) with optimum subthreshold slope (SS) and ensures low power and high switching drivability. Moreover, it is noticed that among optimal values of LS and LD, the device ION/IOFF ratio has an improvement of 22.69% as compared to other variations. Moreover, the effect of various spacer dielectrics on optimized device is also investigated. Finally, the CMOS inverter circuit analysis is performed on the optimized symmetric and asymmetric spacer lengths.


2015 ◽  
Vol 5 (1) ◽  
Author(s):  
Konrad Kacprzak ◽  
Krzysztof Sobczak

AbstractAn influence of the overlap on the performance of the Classical Savonius wind turbine was investigated. Unsteady two-dimensional numerical simulations were carried out for a wide range of overlap ratios. For selected configurations computation quality was verified by comparison with three-dimensional simulations and the wind tunnel experimental data available in literature. A satisfactory agreement was achieved. Power characteristics were determined for all the investigated overlap ratios for selected tip speed ratios. Obtained results indicate that the maximum device performance is achieved for the buckets overlap ratio close to 0.


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