scholarly journals Thin composite polymethyl methacrylate films with silicon dioxide nanoparticles

2021 ◽  
pp. 36-49
Author(s):  
Dmitry V. Sapsaliou ◽  
Galina B. Melnikova ◽  
Vasilina A. Lapitskaya ◽  
Tatyana N. Tolstaya ◽  
Tatyana A. Kuznetsova ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Polymethyl Methacrylate ◽  
Structural Characteristics ◽  
Composite Coatings ◽  
Sio2 Nanoparticles ◽  
Silicon Substrates ◽  
Silicon Dioxide Nanoparticles ◽  
Force Microscopy ◽  
Atomic Force ◽  
Thin Polymer

Techniques for the formation of thin polymer films based on polymethyl methacrylate and composite coatings with silicon dioxide nanoparticles on glass and silicon substrates have been optimised, and their structural characteristics have been studied by atomic force microscopy. The effect of the introduction of silicon dioxide nanoparticles and their content on the structure and wettability of the formed composite coatings is described. Experimental data are presented which prove that the incorporation of SiO2 nanoparticles into the structure of the polymethyl methacrylate polymer matrix leads to changes in the roughness parameters of the coatings.

scholarly journals HYDRO- AND OLEOPHOBIC COATINGS BASED ON POLYVINYL ALCOHOL AND SILICON DIOXIDE NANOPARTICLES

2018 ◽  
Vol 62 (3) ◽  
pp. 298-303
Author(s):  
A. E. Salamianski ◽  
D. A. Kalenchanka ◽  
G. B. Melnikova ◽  
Yu. V. Sinkevich ◽  
V. E. Agabekov
Keyword(s):  
Polyvinyl Alcohol ◽  
Silicon Dioxide ◽  
Spin Coating ◽  
Composite Coatings ◽  
Sio2 Nanoparticles ◽  
Silicon Dioxide Nanoparticles ◽  
Spin Coating Method ◽  
Coating Method

The wettability of composite coatings based on polyvinyl alcohol (PVA) and silicon dioxide formed on silicon by the spin coating method from PVA colloid solutions of SiO2 nanoparticles was studied. These coatings modified with hydrolysed heptadecafluorotetrahydrodecyltrimethoxysilane are found to exhibit superhydrophobic and oleophobic properties. It was found that PVA increases the wear stability of SiO2–PVA coatings.

ANNEALING TIME EFFECT ON NANOSTRUCTURED n-ZnO/p-Si HETEROJUNCTION PHOTODETECTOR PERFORMANCE

2015 ◽  
Vol 22 (02) ◽  
pp. 1550027 ◽  
Author(s):  
NADIR. F. HABUBI ◽  
RAID. A. ISMAIL ◽  
WALID K. HAMOUDI ◽  
HASSAM. R. ABID
Keyword(s):  
Annealing Time ◽  
Silicon Substrates ◽  
X Ray Diffraction ◽  
Zno Nps ◽  
Force Microscopy ◽  
Atomic Force ◽  
Junction Type ◽  
P Type ◽  
Quartz Substrates ◽  
Two Peaks

In this work, n- ZnO /p- Si heterojunction photodetectors were prepared by drop casting of ZnO nanoparticles (NPs) on single crystal p-type silicon substrates, followed by (15–60) min; step-annealing at 600∘C. Structural, electrical, and optical properties of the ZnO NPs films deposited on quartz substrates were studied as a function of annealing time. X-ray diffraction studies showed a polycrystalline, hexagonal wurtizte nanostructured ZnO with preferential orientation along the (100) plane. Atomic force microscopy measurements showed an average ZnO grain size within the range of 75.9 nm–99.9 nm with a corresponding root mean square (RMS) surface roughness between 0.51 nm–2.16 nm. Dark and under illumination current–voltage (I–V) characteristics of the n- ZnO /p- Si heterojunction photodetectors showed an improving rectification ratio and a decreasing saturation current at longer annealing time with an ideality factor of 3 obtained at 60 min annealing time. Capacitance–voltage (C–V) characteristics of heterojunctions were investigated in order to estimate the built-in-voltage and junction type. The photodetectors, fabricated at optimum annealing time, exhibited good linearity characteristics. Maximum sensitivity was obtained when ZnO / Si heterojunctions were annealed at 60 min. Two peaks of response, located at 650 nm and 850 nm, were observed with sensitivities of 0.12–0.19 A/W and 0.18–0.39 A/W, respectively. Detectivity of the photodetectors as function of annealing time was estimated.

scholarly journals Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

scholarly journals Influence of the Microstructure and Optical Constants on Plasmonic Properties of Copper Nanolayers

Materials ◽  
2021 ◽  
Vol 14 (23) ◽  
pp. 7292
Author(s):  
Tomasz Rerek ◽  
Beata Derkowska-Zielinska ◽  
Marek Trzcinski ◽  
Robert Szczesny ◽  
Mieczyslaw K. Naparty ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Photoelectron Spectroscopy ◽  
Surface Plasmon Polariton ◽  
Optical Constants ◽  
Localized Surface Plasmon ◽  
Silicon Substrates ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Plasmon Polariton

Copper layers with thicknesses of 12, 25, and 35 nm were thermally evaporated on silicon substrates (Si(100)) with two different deposition rates 0.5 and 5.0 Å/s. The microstructure of produced coatings was studied using atomic force microscopy (AFM) and powder X-ray diffractometer (XRD). Ellipsometric measurements were used to determine the effective dielectric functions <ε˜> as well as the quality indicators of the localized surface plasmon (LSP) and the surface plasmon polariton (SPP). The composition and purity of the produced films were analysed using X-ray photoelectron spectroscopy (XPS).

scholarly journals Electrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical Characterization

Metals ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1455
Author(s):  
Sabrina Patricia Rosoiu ◽  
Aida Ghiulnare Pantazi ◽  
Aurora Petica ◽  
Anca Cojocaru ◽  
Stefania Costovici ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Electrochemical Impedance ◽  
Composite Coatings ◽  
Choline Chloride ◽  
Physicochemical Characterization ◽  
Metallic Matrix ◽  
Deep Eutectic Solvents ◽  
Force Microscopy ◽  
Atomic Force ◽  
Reduced Graphene

The present work describes, for the first time, the electrodeposition of NiSn alloy/reduced graphene oxide composite coatings (NiSn-rGO) obtained under pulse current electrodeposition conditions from deep eutectic solvents (choline chloride: ethylene glycol eutectic mixtures) containing well-dispersed GO nanosheets. The successful incorporation of the carbon-based material into the metallic matrix has been confirmed by Raman spectroscopy and cross-section scanning electron microscopy (SEM). A decrease in the crystallite size of the coating was evidenced when graphene oxide was added to the electrolyte. Additionally, the topography and the electrical properties of the materials were investigated by atomic force microscopy (AFM). The corrosion behavior in 0.5 M NaCl solution was analyzed through potentiodynamic polarization and electrochemical impedance spectroscopy methods for different immersion periods, up to 336 h, showing a slightly better corrosion performance as compared to pure NiSn alloy.

scholarly journals Influence of Oxidation Degree of Graphene Oxide on the Shear Rheology of Poly(ethylene glycol) Suspensions

Fluids ◽  
2020 ◽  
Vol 5 (2) ◽  
pp. 41 ◽  
Author(s):  
Yago Soares ◽  
Elyff Cargnin ◽  
Mônica Naccache ◽  
Ricardo Andrade
Keyword(s):  
Graphene Oxide ◽  
Rheological Behavior ◽  
Structural Characteristics ◽  
Rheological Characterization ◽  
Polymeric Liquid ◽  
Oxidation Degree ◽  
Force Microscopy ◽  
Fluid Behavior ◽  
Atomic Force ◽  
Poly Ethylene

This work studies the influence of the concentration and oxidation degree on the rheological behavior of graphene oxide (GO) nanosheets dispersed on polyethylene glycol (PEG). The rheological characterization was fulfilled in shear flow through rotational rheometry measurements, in steady, transient and oscillatory regimes. Graphene oxide was prepared by chemical exfoliation of graphite using the modified Hummers method. The morphological and structural characteristics originating from the synthesis were analyzed by X-ray diffraction, Raman spectroscopy, thermogravimetric analysis, Fourier transform infrared spectroscopy, and atomic force microscopy. It is shown that higher oxidation times increase the functional groups, which leads to a higher dispersion and exfoliation of GO sheets in the PEG. Moreover, the addition of GO in a PEG solution results in significant growth of the suspension viscosity, and a change of the fluid behavior from Newtonian to pseudoplastic. This effect is related to the concentration and oxidation level of the obtained GO particles. The results obtained aim to contribute towards the understanding of the interactions between the GO and the polymeric liquid matrix, and their influence on the suspension rheological behavior.

Growth Front Roughening of Room Temperature Deposited Oligomer Thin Films

2000 ◽  
Vol 648 ◽  
Author(s):  
D. Tsamouras ◽  
G. Palasantzas ◽  
J. Th. M. De Hosson ◽  
G. Hadziioannou
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Room Temperature ◽  
Growth Front ◽  
Silicon Substrates ◽  
Height Distribution ◽  
Force Microscopy ◽  
Atomic Force ◽  
Roughness Amplitude ◽  
Non Gaussian

AbstractGrowth front scaling aspects are investigated for PPV-type oligomer thin films vapor- deposited onto silicon substrates at room temperature. For film thickness d~15-300 nm, commonly used in optoelectronic devices, correlation function measurement by atomic force microscopy yields roughness exponents in the range H=0.45±0.04, and an rms roughness amplitude which evolves with film thickness as a power law σ∝ dβ with β=0.28±0.05. The non-Gaussian height distribution and the measured scaling exponents (H and β) suggest a roughening mechanism close to that described by the Kardar-Parisi-Zhang scenario.

scholarly journals UV Sensitivity of Indium-Zinc Oxide Nanofibers

2018 ◽  
Vol 2018 ◽  
pp. 1-6 ◽  
Author(s):  
Nadezhda Markova ◽  
Olga Berezina ◽  
Nikolay Avdeev ◽  
Alexander Pergament
Keyword(s):  
Zinc Oxide ◽  
Indium Content ◽  
Silicon Substrates ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Indium Zinc Oxide ◽  
Electrospinning Method ◽  
Recovery Times ◽  
Response And Recovery

Indium-zinc oxide (IZO) nanofiber matrices are synthesized on SiO2-covered silicon substrates by the electrospinning method. The nanofibers’ dimensions, morphology, and crystalline structure are characterized by scanning electron microscopy, atomic force microscopy, and X-ray diffraction. The results of studying the electrical properties of nanofibers, as well as their sensitivity to UV radiation depending on the In-to-Zn concentration ratio, are presented. It is shown that the highest sensitivity to UV is observed at the indium content of about 50 atomic %. The photocurrent increment with respect to the dark current is more than 4 orders of magnitude. The response and recovery times are 60 and 500 sec, respectively. The results obtained suggest that IZO nanofibers can find application as UV sensors with improved characteristics.

Anisotropic Behaviour of Surface Roughening in Lattice Mismatched Heteroepitaxial Thin Films

1996 ◽  
Vol 436 ◽  
Author(s):  
Cengiz S. Ozkan ◽  
William D. Nix ◽  
Huajian Gao
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Lattice Mismatch ◽  
Surface Roughening ◽  
Silicon Substrates ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Annealing Experiments

AbstractHeteroepitaxial Si1-xGex. thin films deposited on silicon substrates exhibit surface roughening via surface diffusion under the effect of a compressive stress which is caused by a lattice mismatch. In these films, surface roughening can take place in the form of ridges which can be aligned along <100> or <110> directions, depending on the film thickness. In this paper, we investigate this anisotropic dependence of surface roughening and present an analysis of it. We have studied the surface roughening behaviour of 18% Ge and 22% Ge thin films subjected to controlled annealing experiments. Transmission electron microscopy and atomic force microscopy have been used to study the morphology and microstructure of the surface ridges and the dislocations that form during annealing.

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