scholarly journals Atomic Layer Deposition of aTiO2 Layer on Nitinol and Its Corrosion Resistance in a Simulated Body Fluid

Metals ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 659
Author(s):  
Rebeka Rudolf ◽  
Aleš Stambolić ◽  
Aleksandra Kocijan
Keyword(s):  
Corrosion Resistance ◽  
Simulated Body Fluid ◽  
Atomic Layer Deposition ◽  
Body Fluid ◽  
Electrochemical Impedance ◽  
Atomic Layer ◽  
Tio2 Layer ◽  
High Tendency ◽  
X Ray ◽  
Layer Deposition

Nitinol is a group of nearly equiatomic alloys composed of nickel and titanium, which was developed in the 1970s. Its properties, such as superelasticity and Shape Memory Effect, have enabled its use, especially for biomedical purposes. Due to the fact that Nitinol exhibits good corrosion resistance in a chloride environment, an unusual combination of strength and ductility, a high tendency for self-passivation, high fatigue strength, low Young’s modulus and excellent biocompatibility, its use is still increasing. In this research, Atomic Layer Deposition (ALD) experiments were performed on a continuous vertical cast (CVC) NiTi rod (made in-house) and on commercial Nitinol as the control material, which was already in the rolled state. The ALD deposition of the TiO2 layer was accomplished in a Beneq TFS 200 system at 250 °C. The pulsing times for TiCl4 and H2O were 250 ms and 180 ms, followed by appropriate purge cycles with nitrogen (3 s after the TiCl4 and 2 s after the H2O pulses). After 1100 repeated cycles of ALD depositing, the average thickness of the TiO2 layer for the CVC NiTi rod was 52.2 nm and for the commercial Nitinol, it was 51.7 nm, which was confirmed by X-ray Photoelectron Spectroscopy (XPS) and Scanning Electron Microscope (SEM) using Energy-dispersive X-ray (EDX) spectroscopy. The behaviour of the CVC NiTi and commercial Nitinol with and without the TiO2 layer was investigated in a simulated body fluid at body temperature (37 °C) to explain their corrosion resistance. Potentiodynamic polarisation measurements showed that the lowest corrosion current density (0.16 μA/cm2) and the wider passive region were achieved by the commercial NiTi with TiO2. Electrochemical Impedance Spectroscopy measurements revealed that the CVC NiTi rod and the commercial Nitinol have, for the first 48 h of immersion, only resistance through the oxide layer, as a consequence of the thin and compact layer. On the other hand, the TiO2/CVC NiTi rod and TiO2/commercial Nitinol had resistances through the oxide and porous layers the entire immersion time since the TiO2 layer was formatted on the surfaces.

scholarly journals Structure and Surface Morphology Effect on the Cytotoxicity of [Al2O3/ZnO]n/316L SS Nanolaminates Growth by Atomic Layer Deposition (ALD)

Crystals ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 620
Author(s):  
D. Osorio ◽  
J. Lopez ◽  
H. Tiznado ◽  
Mario H. Farias ◽  
M. A. Hernandez-Landaverde ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Biomedical Applications ◽  
316L Stainless Steel ◽  
Electrochemical Impedance ◽  
Steel Substrate ◽  
Chinese Hamster ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition

Recently, different biomedical applications of aluminum oxide (Al2O3) and zinc oxide (ZnO) have been studied, and they have displayed good biocompatible behavior. For this reason, this study explores nanolaminates of [Al2O3/ZnO]n obtained by atomic layer deposition (ALD) on silicon (100) and 316L stainless steel substrates with different bilayer periods: n = 1, 2, 5, and 10. The intention is to correlate the structure, chemical bonds, morphology, and electrochemical properties of ZnO and Al2O3 single layers and [Al2O3/ZnO]n nanolaminates with their cytotoxic and biocompatibility behavior, to establish their viability for biomedical applications in implants based on the 316L SS substrate. These nanolaminates have been characterized by grazing incident X-ray diffraction (XRD), finding diffraction planes for wurtzite type structure from zincite. The chemical bonding and composition for both single layers were identified through X-ray photoelectron spectroscopy (XPS). The morphology and roughness were tested with atomic force microscopy (AFM), which showed a reduction in roughness and grain size with a bilayer period increase. The thickness of the samples was measured with scanning electron microscopy, and the results confirmed the value of ~210 nm for the nanolaminate samples. The electrochemical impedance spectroscopy analysis with Hank’s balanced salt solution (HBSS) evidenced an evolution of [Al2O3/ZnO]n/316L system corrosion resistance of around 95% in relation with the uncoated steel substrate as function of the increase in the bilayers number. To identify the biocompatibility behavior of these nanolaminate systems, the lactate dehydrogenase test was performed with Chinese hamster ovary (CHO) cells for a short system of life cell evaluation. This test shows the cytotoxicity of the multilayer compared to the single layers of Al2O3, ZnO, and 316L stainless steel. The lowest cytotoxicity was found in the single layers of ZnO, which leads to cell proliferation easier than Al2O3, obtaining better adhesion and anchoring to its surface.

Ex-situ X-ray diffraction analysis of electrode strain at TiO2 atomic layer deposition/α-MoO3 interface in a novel aqueous potassium ion battery

2016 ◽  
Vol 316 ◽  
pp. 160-169 ◽  
Author(s):  
Nicholas David Schuppert ◽  
Santanu Mukherjee ◽  
Alex M. Bates ◽  
Eun-Jin Son ◽  
Moon Jong Choi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Diffraction Analysis ◽  
Atomic Layer ◽  
Potassium Ion ◽  
Ex Situ ◽  
X Ray Diffraction ◽  
X Ray ◽  
Layer Deposition

Investigation on the Preparation of High Precision Multilayer X-ray Fresnel Zone Plates Based on Atomic Layer Deposition Technology

2021 ◽  
Vol 50 (1) ◽  
pp. 156-164
Author(s):  
吴鹿杰 Lujie WU ◽  
文庆涛 Qingtao WEN ◽  
高雅增 Yazeng GAO ◽  
卢维尔 Weier LU ◽  
夏洋 Yang XIA ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Precision ◽  
Fresnel Zone ◽  
Atomic Layer ◽  
Fresnel Zone Plates ◽  
X Ray ◽  
Zone Plates ◽  
Layer Deposition ◽  
Deposition Technology

scholarly journals A modular reactor design forin situsynchrotron x-ray investigation of atomic layer deposition processes

2015 ◽  
Vol 86 (11) ◽  
pp. 113901 ◽  
Author(s):  
Jeffrey A. Klug ◽  
Matthew S. Weimer ◽  
Jonathan D. Emery ◽  
Angel Yanguas-Gil ◽  
Sönke Seifert ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Reactor Design ◽  
X Ray ◽  
Layer Deposition ◽  
Deposition Processes

The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum-Based Thin Films for Copper Diffusion Barrier Applications

2003 ◽  
Vol 766 ◽  
Author(s):  
Degang Cheng ◽  
Eric T. Eisenbraun
Keyword(s):  
Atomic Layer Deposition ◽  
Diffusion Barrier ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Barrier Properties ◽  
Tantalum Nitride ◽  
Copper Metallization ◽  
X Ray ◽  
Layer Deposition ◽  
Electron Spectrometry

AbstractA plasma-enhanced atomic layer deposition (PEALD) process for the growth of tantalumbased compounds is employed in integration studies for advanced copper metallization on a 200- mm wafer cluster tool platform. This process employs terbutylimido tris(diethylamido)tantalum (TBTDET) as precursor and hydrogen plasma as the reducing agent at a temperature of 250°C. Auger electron spectrometry, X-ray photoelectron spectrometry, and X-ray diffraction analyses indicate that the deposited films are carbide rich, and possess electrical resistivity as low as 250νΔcm, significantly lower than that of tantalum nitride deposited by conventional ALD or CVD using TBTDET and ammonia. PEALD Ta(C)N also possesses a strong resistance to oxidation, and possesses diffusion barrier properties superior to those of thermally grown TaN.

scholarly journals Air Annealing Effect on Oxygen Vacancy Defects in Al-doped ZnO Films Grown by High-Speed Atmospheric Atomic Layer Deposition

Molecules ◽  
2020 ◽  
Vol 25 (21) ◽  
pp. 5043
Author(s):  
Chia-Hsun Hsu ◽  
Xin-Peng Geng ◽  
Wan-Yu Wu ◽  
Ming-Jie Zhao ◽  
Xiao-Ying Zhang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Band Gap ◽  
Photoelectron Spectroscopy ◽  
High Speed ◽  
Oxygen Vacancies ◽  
Annealing Temperature ◽  
Atomic Layer ◽  
Zno Films ◽  
X Ray ◽  
Layer Deposition

In this study, aluminum-doped zinc oxide (Al:ZnO) thin films were grown by high-speed atmospheric atomic layer deposition (AALD), and the effects of air annealing on film properties are investigated. The experimental results show that the thermal annealing can significantly reduce the amount of oxygen vacancies defects as evidenced by X-ray photoelectron spectroscopy spectra due to the in-diffusion of oxygen from air to the films. As shown by X-ray diffraction, the annealing repairs the crystalline structure and releases the stress. The absorption coefficient of the films increases with the annealing temperature due to the increased density. The annealing temperature reaching 600 °C leads to relatively significant changes in grain size and band gap. From the results of band gap and Hall-effect measurements, the annealing temperature lower than 600 °C reduces the oxygen vacancies defects acting as shallow donors, while it is suspected that the annealing temperature higher than 600 °C can further remove the oxygen defects introduced mid-gap states.

Enhancement of properties of high-density material coated glass monocapillary X-ray condenser based on atomic layer deposition

2020 ◽  
Vol 464 ◽  
pp. 125544
Author(s):  
Yabing Wang ◽  
Yanli Li ◽  
Shangkun Shao ◽  
Xiaoyun Zhang ◽  
Yufei Li ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Density ◽  
X Ray ◽  
Coated Glass ◽  
Layer Deposition

Atomic Layer Deposition of Lithium-Silicon-Tin Oxide Nanofilms for High Performance Thin Film Batteries Anodes

2020 ◽  
Vol 299 ◽  
pp. 1058-1063
Author(s):  
Denis Nazarov ◽  
Ilya Mitrofanov ◽  
Maxim Yu. Maximov
Keyword(s):  
Thin Film ◽  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Cycling Performance ◽  
Spectral Ellipsometry ◽  
X Ray ◽  
Layer Deposition

Tin oxide is the most promising material for thin film anodes of Li-ion batteries due to its cycling performance and high theoretical capacity. It is assumed that lithium-tin oxide can demonstrate even higher performance. Lithium-silicon-tin oxide nanofilms were prepared by atomic layer deposition (ALD), using the lithium bis (trimethylsilyl) amide (LiHMDS), tetraethyltin (TET) as a metal containing reagents and ozone or water or oxygen plasma as counter-reactants. Monocrystalline silicon (100) and stainless steel (316SS) were used as supports. The thicknesses of the nanofilms were measured by spectral ellipsometry (SE) and scanning electron microscopy (SEM). It was found that oxygen plasma is the most optimal ALD counter-reactant. The composition and structure were studied by Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and X-ray diffraction (XRD). The nanofilms contain silicon as impurity, whose source is the ALD precursor (LiHMDS). The nanofilms deposited on stainless steel have shown the high Coulombic efficiency (99.1-99.8%) and cycling performance at a relatively high voltage (0.01 to 2.0V).

scholarly journals Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Energies ◽  
2020 ◽  
Vol 13 (9) ◽  
pp. 2345
Author(s):  
Maxim Maximov ◽  
Denis Nazarov ◽  
Aleksander Rumyantsev ◽  
Yury Koshtyal ◽  
Ilya Ezhov ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Silicon Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition ◽  
Nickel Silicon

Lithium nickelate (LiNiO2) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp2) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)2 precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li2SiO3 and Li2Si2O5 were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO2. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

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