scholarly journals Studies on the Processes of Electron Capture and Clustering of Benzyl Chloride by Ion Mobility Spectrometry

Molecules ◽  
2021 ◽  
Vol 26 (15) ◽  
pp. 4562
Author(s):  
Izabela Wolańska ◽  
Edyta Budzyńska ◽  
Jarosław Puton
Keyword(s):  
Electron Capture ◽  
Ion Mobility ◽  
Benzyl Chloride ◽  
Drift Time ◽  
Electron Attachment ◽  
Chloride Ions ◽  
Cluster Ions ◽  
Theoretical Interpretation ◽  
Ionic Clusters ◽  
Cluster Ion

This paper presents the results of the study on the course of the benzyl chloride (BzCl) ionization process in a drift tube ion mobility spectrometer (DT IMS) in which nitrogen was used as the carrier gas. BzCl ionization follows the dissociative electron capture mechanism. The chloride ions produced in this process take part in the formation of cluster ions. Using DT IMS allows for estimation of the value of the electron attachment rate for BzCl and the equilibrium constant for the cluster ion formation. The basic experimental method used in this work was to analyze drift time spectra obtained for the introduction of the sample to the spectrometer with the drift gas. The theoretical interpretation of the results is based on the mathematical description of the ion transport. This description takes into account the phenomenon of diffusion, as well as the processes of formation and dissociation of ionic clusters occurring during the movement of ions in the drift section.

scholarly journals Proteoform Differentiation using Tandem Trapped Ion Mobility, Electron Capture Dissociation, and ToF Mass Spectrometry

2021 ◽  
Author(s):  
Kevin Jeanne Dit Fouque ◽  
Desmond Kaplan ◽  
Valery G. Voinov ◽  
Frederik H. V. Holck ◽  
Ole N. Jensen ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Electron Capture ◽  
Electron Capture Dissociation ◽  
Ion Mobility ◽  
Trapped Ion

SPUTTERING WITH GAS CLUSTER-ION BEAMS

1996 ◽  
Vol 03 (01) ◽  
pp. 1017-1021 ◽  
Author(s):  
J. MATSUO ◽  
M. AKIZUKI ◽  
J. NORTHBY ◽  
G.H. TAKAOKA ◽  
I. YAMADA
Keyword(s):  
Ion Irradiation ◽  
Removal Rate ◽  
Ion Beam ◽  
Solid Surfaces ◽  
Silicon Surfaces ◽  
Cluster Ions ◽  
Mass Filter ◽  
Cluster Bombardment ◽  
Cluster Ion Beams ◽  
Cluster Ion

A high-current (~100 nA) cluster-ion-beam equipment with a new mass filter has been developed to study the energetic cluster-bombardment effects on solid surfaces. A dramatic reduction of Cu concentration on silicon surfaces has been achieved by 20-keV Ar cluster (N~3000) ion bombardment. The removal rate of Cu with cluster ions is two orders of magnitude higher than that with monomer ions. A significantly higher sputtering yield is expected for cluster-ion irradiation. An energetic cluster-ion beam is quite suitable for removal of metal.

Structure-drift time relationships in ion mobility mass spectrometry

2013 ◽  
Vol 16 (2) ◽  
pp. 117-132 ◽  
Author(s):  
Maíra Fasciotti ◽  
Priscila M. Lalli ◽  
Gabriel Heerdt ◽  
Rafael A. Steffen ◽  
Yuri E. Corilo ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Ion Mobility ◽  
Drift Time ◽  
Ion Mobility Mass Spectrometry

A New Type of Cluster-Ion Source for Thin Film Deposition

1990 ◽  
Vol 206 ◽  
Author(s):  
Hellmut Haberland ◽  
Martin Karrais ◽  
Martin Mall
Keyword(s):  
Electron Impact ◽  
Plane Surface ◽  
Thin Film Deposition ◽  
Ion Source ◽  
Film Deposition ◽  
Cluster Ions ◽  
Cluster Ion ◽  
Impact Ionisation ◽  
Aggregation Technique ◽  
High Degree

ABSTRACTAtoms are gas discharge sputtered from a solid target. They are condensed to form clusters using the gas aggregation technique. An intense beam of clusters of all solid materials can be obtained. Up to 80 % of the clusters can be ionised without using additional electron impact ionisation. Total deposition rates vary between 1 and 1000 Å per second depending on cluster diameter, which can be varied between 3 and 500 nm. Thin films of Al, Cu, and Mo have been produced so far. For non accelerated beams a weakly adhering mostly coulored deposit is obtained. Accelerating the cluster ions this changes to a strongly adhering film, having a shiny metallic appearance, and a very sharp and plane surface as seen in an electron microscope. The advantages compared to Kyoto ICB-method are: easy control of the cluster size, no electron impact ionisation, high degree of ionisation, and sputtering is used instead of thermal evaporation, which allows the use of high melting point materials.

scholarly journals Electron capture dissociation and drift tube ion mobility-mass spectrometry coupled with site directed mutations provide insights into the conformational diversity of a metamorphic protein

2015 ◽  
Vol 17 (16) ◽  
pp. 10538-10550 ◽  
Author(s):  
Sophie R. Harvey ◽  
Massimiliano Porrini ◽  
Robert C. Tyler ◽  
Cait E. MacPhee ◽  
Brian F. Volkman ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Electron Capture ◽  
Electron Capture Dissociation ◽  
Ion Mobility ◽  
Drift Tube ◽  
Ion Mobility Mass Spectrometry ◽  
Top Down ◽  
Conformational Diversity ◽  
Metamorphic Protein

Ion mobility mass spectrometry can be combined with data from top-down sequencing to discern adopted conformations of proteins in the absence of solvent.

MASS SPECTRA AND DISSOCIATION PATTERNS OF TELLURIUM CLUSTERS USING POSITIVE AND NEGATIVE SECONDARY-ION MASS SPECTROMETRY

1996 ◽  
Vol 03 (01) ◽  
pp. 577-582 ◽  
Author(s):  
H. ITO ◽  
T. SAKURAI ◽  
T. MATSUO ◽  
T. ICHIHARA ◽  
I. KATAKUSE
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Cluster Ions ◽  
Mass Spectrometers ◽  
Scanning Method ◽  
Ion Mass Spectrometry ◽  
Cluster Ion ◽  
Sector Type ◽  
Fragmentation Patterns ◽  
Secondary Ion

Size distribution of positive and negative tellurium clusters in the size range from 2 to 56 atoms was investigated by secondary-ion mass spectrometry (SIMS). Cluster ions were produced by the 12-keV Xe+ ions bombardment of a sample tellurium sheet and were mass-analyzed using sector-type double-focusing mass spectrometers. It was found that a discontinuous variation of cluster-ion intensity appeared at specific numbers of n. These numbers were 5, 8, 12, 15, 19, and 23 for positive clusters and 6, 10, 13, and 16 for negative clusters. The dissociation pattern was also investigated by an acceleration-voltage scanning method. It was found that Te2, Te5, and Te6 fragmentation events occurred at a large probability. Observation of specific fragmentation patterns suggested the existence of nonsequential fragment channels.

Application of Cluster Ion Beam Smoothing to SiC and YBCO Surfaces

1999 ◽  
Vol 585 ◽  
Author(s):  
D. Fathy ◽  
O. W. Holland ◽  
R. Liu ◽  
J. Wosik ◽  
W. K Chu
Keyword(s):  
Surface Topography ◽  
Ion Irradiation ◽  
Ion Beam ◽  
High Temperature Superconductors ◽  
Cluster Ions ◽  
Microwave Surface Resistance ◽  
Average Roughness ◽  
Cross Sectional ◽  
Cluster Ion Beams ◽  
Cluster Ion

AbstractOptimization of the surface topography, especially in high-temperature superconductors (HTS) and silicon carbide is crucial for device processing. Surface smoothing in these materials was investigated using Gas Cluster Ion Beams (GCIB) capable of delivering cluster ions of ≥ 2000 Ar atoms with energies of up to 30keV. Examination of the surface topography after cluster-ion irradiation was done using cross-sectional transmission electron microscopy (TEM) and atomic force microscopy (AFM). The results indicate that typical as-deposited YBCO films on MgO substrates have an average roughness of the order of 40 nm, and interpeak distance between 300–600 nm. Application of GCIB to the surface planarization reduces the roughness to only 10 nm. Also power handling and microwave surface resistance of the YBCO film and its relationship to surface smoothness are reported. Similar observations using bulk SiC are discussed.

scholarly journals Distinguishing between halogenated alkanes containing the same halogen based on the reaction kinetic parameter using negative ion mobility spectrometry at atmospheric pressure

RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29441-29449
Author(s):  
Haiyan Han ◽  
Shihu Du ◽  
Yongliang Yan ◽  
Xiuhong Liu ◽  
Qiaofen Zhu ◽  
...  
Keyword(s):  
Kinetic Parameter ◽  
Ion Mobility Spectrometry ◽  
Ion Mobility ◽  
Atmospheric Pressure ◽  
Reaction Kinetic ◽  
Electron Attachment ◽  
High Sensitivity ◽  
Negative Ion ◽  
Volatile Organic ◽  
Halogenated Alkanes

Electron attachment ionization ion mobility spectrometry can be used to detect halogen-containing volatile organic compounds with high sensitivity.

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