scholarly journals Amorphization and Nano-Crystallization of Ni-Nb Coating on GH3039 Alloys by High Current Pulsed Electron Beam

Nanomaterials ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 347
Author(s):  
Conglin Zhang ◽  
Xuesu Ji ◽  
Jiahong Wang ◽  
Lingfan Lu ◽  
Zirun Yang ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Beam ◽  
Amorphous Layer ◽  
Pulse Number ◽  
Nano Particles ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Transmission Electron ◽  
Pulsed Irradiation

In this paper, the Ni-Nb coatings were successfully prepared onto the GH3039 alloys by High current pulsed electron beam (HCPEB). The transmission electron microscopy (TEM) results confirmed that the Ni-Nb layer of 10-pulsed samples exhibited partial amorphization, which was consisted of γ-Ni particles, rod-like Ni3Nb particles and nano Ni3Nb with 30 nm in size. After 20-pulsed irradiation, the results show that only Ni3Nb clusters with around 3 nm in size were dispersed in fully amorphization layer. With increased pulse number to 30, the nano-particles embedded into the amorphous layer were grown up, the size of which was about 8 nm. The microstructure evolution during HCPEB irradiation was from the partial amorphous to fully amorphous and then to nano-crystallization. The 20-pulsed samples possessed the best hardness and corrosion resistance. The ultrafine clusters uniformly embedded into amorphous layer were main reason for improving properties.

Transmission electron microscopy studying of structural features of NiTi B2 phase formed under pulsed electron-beam impact

2015 ◽  
Author(s):  
Ludmila L. Meisner ◽  
Alexey A. Neiman ◽  
Alexander I. Lotkov ◽  
Nikolai N. Koval ◽  
Viktor O. Semin ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Beam ◽  
Structural Features ◽  
Pulsed Electron Beam ◽  
Transmission Electron ◽  
B2 Phase

The Self-assembled Deposition on the Surface of Mono-crystalline Silicon Induced by High-Current Pulsed Electron Beam

2017 ◽  
Vol 36 (6) ◽  
pp. 593-597
Author(s):  
Zhang Conglin ◽  
Guan Qingfeng ◽  
Chen Jie ◽  
Yan Pengcheng ◽  
Lv Peng
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Crystalline Silicon ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Atomic Force ◽  
Transmission Electron ◽  
Si Nanoparticles ◽  
Surface Microstructures ◽  
Pulsed Irradiation

AbstractHigh-current pulsed electron beam (HCPEB) technique was applied to irradiate the surface of mono-crystalline silicon wafers. Surface microstructures of the irradiated surface were investigated in detail by atomic force microscope (AFM), scanning electron microscope (SEM) and transmission electron microscope (TEM). The experimental results show that HCPEB irradiation with energy density 4 J/cm2 caused evaporation of the irradiated surface. Subsequently, the evaporation Si-droplets was deposited to form Si-nanoparticles on the surface. Meanwhile, the structures of intensive plastic deformation were also introduced within the irradiated surface layer. The dislocation configurations with rectangular and approximate hexagonal network were formed on the surface of Si wafer after 5-pulsed irradiation. The periodic self-deposited structures appear to be related to the configuration of regular dislocations arrays, which were favorable locations for the deposited Si-nanoparticles.

scholarly journals Nanocrystalline Cr-Ni Alloying Layer Induced by High-Current Pulsed Electron Beam

Nanomaterials ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 74 ◽  
Author(s):  
Lingyan Zhang ◽  
Ching-Tun Peng ◽  
Jintong Guan ◽  
Peng Lv ◽  
Qingfeng Guan ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Strengthening Mechanism ◽  
High Current ◽  
Nickel Substrate ◽  
X Ray Diffraction ◽  
Pulsed Electron Beam ◽  
Solid Solution Strengthening ◽  
Transmission Electron ◽  
Solution Strengthening

In this investigation, chromium (Cr) was adopted as an alloying element on a nickel substrate, and the alloying process was materialized via high-current pulsed electron beam (HCPEB) irradiation. X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were also conducted for microstructure characterization. The results showed that after HCPEB irradiation a nanocrystalline Cr-Ni alloying layer was formed and numerous dislocations were generated, resulting in a great deal of diffusion paths for Cr elements. Moreover, properties including hardness, wear and electrochemical performance were significantly improved after HCPEB irradiation, which was mainly due to the formation of the nanocrystalline Cr–Ni alloying layer. In addition, each strengthening mechanism that contributed to the hardness of the HCPEB-irradiated sample was mathematically analyzed, and solid solution strengthening was found to be of great importance.

Self And Ion Beam Annealing of P,Ar, And Kr In Silicon

1985 ◽  
Vol 51 ◽  
Author(s):  
S. Cannavo ◽  
A. La Ferla ◽  
S.U. Campisano ◽  
E. Rimini ◽  
G. Ferla ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Current Density ◽  
Ion Beam ◽  
Amorphous Layer ◽  
High Current ◽  
Tem Analysis ◽  
Ion Channeling ◽  
Transmission Electron ◽  
Fluence Range

ABSTRACTThe damage produced by high current density ∿l0µA/cm2 implants of 120 keV P+ into <111> and <100> silicon wafers, 500 °m thick, has been investigated in the fluence range 1×l01 5/cm2-l×l016 /cm2 by ion channeling and by transmission electron microscopy. For both orientations the thickness of the damage layers increases with the fluence up to 2×1015 /cm2 and then decreases. The rate of regrowth is a factor two faster for the <100> with respect to the <111> oriented Si crystals. Similar ratios have been found in pre-amorphized samples and irradiated with Kr+ ions in the temperature range 350°C-430°C. The TEM analysis reveals the presence of hexagonal silicon and of twins in small amounts for both orientations. The beam induced epitaxial growth depends also on the species present in the amorphous layer. A comparison between self-annealing and beam annealing in Si <100> preamorphized with Ar+ or P+ shows a noticeable retardation of the growth rate in the presence of Ar+.

Surface Modification of Pure Titanium by High Current Pulsed Electron Beam

2012 ◽  
Vol 560-561 ◽  
pp. 994-999
Author(s):  
Jie Cai ◽  
Ming Zhen Wan ◽  
Yang Zou ◽  
Peng Lv ◽  
Zhi Yong Han ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Surface Modification ◽  
Electron Beam ◽  
Pure Titanium ◽  
Optical Microscope ◽  
Material Surface ◽  
Material Strength ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Transmission Electron

Polycrystalline pure titanium was irradiated by high-current pulsed electron beam (HCPEB). The microstructure changes and material strength were investigated by using microhardness tester, optical microscope, scanning electron microscopy (SEM), and transmission electron microscopy (TEM) technique. The experimental results indicate that many craters are inevitably formed on the irradiated surface. The eruption of the craters makes the material surface cleaned, which can improve the corrosion resistance of materials. Furthermore, martensitic structure, ultra-fine grains and high-density dislocations are formed on the irradiated surface, which increase the hardness of the treated samples. The microhardness of 20-pulsed sample reaches 286Hv, which is 71% higher than the initial sample. Martensitic transformation, grain refinement and dislocation strengthening induced by HCPEB treatment are the dominating mechanism for the improvements of material strength. It is suggested that HCPEB technique is becoming an effective approach to surface modification for pure titanium and titanium alloy.

scholarly journals Surface Alloys of 0.45 C Carbon Steel Produced by High Current Pulsed Electron Beam

2019 ◽  
Vol 38 (2019) ◽  
pp. 444-451 ◽  
Author(s):  
Lingyan Zhang ◽  
Yunxue Jin ◽  
Xitong Wang ◽  
Jie Cai ◽  
Qingfeng Guan
Keyword(s):  
Electron Microscopy ◽  
Corrosion Resistance ◽  
Electron Beam ◽  
Carbon Steel ◽  
Medium Carbon Steel ◽  
High Current ◽  
Medium Carbon ◽  
Pulsed Electron Beam ◽  
Transmission Electron ◽  
Before And After

AbstractThe chromium was deposited on the surface of 0.45 C medium carbon steel by high current pulsed electron beam (HCPEB) alloying treatment to obtain a high quality alloying layer. The microstructure of the alloying layer was studied by X-ray diffraction, optical microscopy, scanning electron microscopy (SEM), and transmission electron microscopy. The hardness of the surface was measured by Vickers durometer. The corrosion resistance of samples before and after HCPEB irradiation was also measured by an electrochemical workstation. The results showed that the alloying layer with a dept of about 4–9 μm on the surface was formed after HCPEB alloying treatment. TEM results revealed that the Cr element is dissolved on the surface and alloyed with C element in the substrate to form Cr23C6 enhanced particles. The microhardness and corrosion resistance of the medium carbon steel subjected to a HCPEB alloying processing were remarkably improved compared with the original one.

scholarly journals Surface Alloying and Improved Property of Nb on TC4 Induced by High Current Pulsed Electron Beam

Nanomaterials ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 2906
Author(s):  
Xueze Du ◽  
Nana Tian ◽  
Conglin Zhang ◽  
Peng Lyu ◽  
Jie Cai ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Corrosion Resistance ◽  
Electron Beam ◽  
Surface Hardness ◽  
High Current ◽  
X Ray Diffraction ◽  
Pulsed Electron Beam ◽  
Transmission Electron ◽  
Tc4 Alloy ◽  
Nb Alloying

In this paper, an Nb alloying layer on a TC4 alloy was fabricated by using high-current pulsed electron beam (HCPEB) irradiation to improve surface performance. X-ray diffraction (XRD), optical microscopy (OM), laser surface microscope (LSM), scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to characterize the phase composition and microstructure of the surface layer. The microhardness, wear tests and corrosion resistance were also examined. The results show that after HCPEB alloying, a Nb-alloyed layer was formed with about 3.6 μm in thickness on the surface of the sample, which was mainly composed of α’-Ti martensite, β-Ti equiaxial crystals, and NbTi4 particles. After HCPEB irradiation, the surface hardness, wear resistance and corrosion resistance of Nb alloying layer on TC4 alloy were improved compared to the initial samples.

Techniques for Transmission Electron Microscopy of Fiber-Matrix Interfaces in Aluminum Alloy-Boron Composites by Ion Erosio

1971 ◽  
Vol 29 ◽  
pp. 204-205
Author(s):  
G. G. Shaw
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Aluminum Alloy ◽  
Electron Beam ◽  
Pure Aluminum ◽  
Ion Milling ◽  
Transmission Electron ◽  
Fiber Matrix ◽  
Ion Erosion ◽  
Row Of Fibers

The morphology and composition of the fiber-matrix interface can best be studied by transmission electron microscopy and electron diffraction. For some composites satisfactory samples can be prepared by electropolishing. For others such as aluminum alloy-boron composites ion erosion is necessary.When one wishes to examine a specimen with the electron beam perpendicular to the fiber, preparation is as follows: A 1/8 in. disk is cut from the sample with a cylindrical tool by spark machining. Thin slices, 5 mils thick, containing one row of fibers, are then, spark-machined from the disk. After spark machining, the slice is carefully polished with diamond paste until the row of fibers is exposed on each side, as shown in Figure 1.In the case where examination is desired with the electron beam parallel to the fiber, preparation is as follows: Experimental composites are usually 50 mils or less in thickness so an auxiliary holder is necessary during ion milling and for easy transfer to the electron microscope. This holder is pure aluminum sheet, 3 mils thick.

Effects of High-Energy Ions on Synthetic Quartz

1972 ◽  
Vol 30 ◽  
pp. 544-545
Author(s):  
Joseph J. Comer ◽  
Charles Bergeron ◽  
Lester F. Lowe
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Beam ◽  
High Energy ◽  
Transmission Electron ◽  
Kikuchi Lines ◽  
High Energy Ions ◽  
Diffraction Patterns ◽  
Dauphiné Twinning ◽  
Beam Damage

Using a Van De Graaff Accelerator thinned specimens were subjected to bombardment by 3 MeV N+ ions to fluences ranging from 4x1013 to 2x1016 ions/cm2. They were then examined by transmission electron microscopy and reflection electron diffraction using a 100 KV electron beam.At the lowest fluence of 4x1013 ions/cm2 diffraction patterns of the specimens contained Kikuchi lines which appeared somewhat broader and more diffuse than those obtained on unirradiated material. No damage could be detected by transmission electron microscopy in unannealed specimens. However, Dauphiné twinning was particularly pronounced after heating to 665°C for one hour and cooling to room temperature. The twins, seen in Fig. 1, were often less than .25 μm in size, smaller than those formed in unirradiated material and present in greater number. The results are in agreement with earlier observations on the effect of electron beam damage on Dauphiné twinning.

Transmission Electron Microscopy of Evaporated Perylene Thin Films

1990 ◽  
Vol 48 (2) ◽  
pp. 336-337
Author(s):  
C. Ewins ◽  
J.R. Fryer
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Molecular Electronics ◽  
High Vacuum ◽  
Amorphous Layer ◽  
Electric Heater ◽  
Transmission Electron ◽  
Polycyclic Aromatic

The preparation of thin films of organic molecules is currently receiving much attention because of the need to produce good quality thin films for molecular electronics. We have produced thin films of the polycyclic aromatic, perylene C10H12 by evaporation under high vacuum onto a potassium chloride (KCl) substrate. The role of substrate temperature in determining the morphology and crystallography of the films was then investigated by transmission electron microscopy (TEM).The substrate studied was the (001) face of a freshly cleaved crystal of KCl. The temperature of the KCl was controlled by an electric heater or a cold finger. The KCl was heated to 200°C under a vacuum of 10-6 torr and allowed to cool to the desired temperature. The perylene was then evaporated over a period of one minute from a molybdenum boat at a distance of 10cm from the KCl. The perylene thin film was then backed with an amorphous layer of carbon and floated onto copper microscope grids.

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