A Micro-fabrication Tool for Automatic Large-area Patterning Using Polymer Pen Lithography

Lipid-based membranes play crucial roles in regulating the interface between cells and their external environment, the communication within cells, and cellular sensing. To study these important processes, various lipid-based artificial membrane models have been developed in recent years and, indeed, large-area arrays of supported lipid bilayers suit the needs of many of these studies remarkably well. Here, the direct-write scanning probe lithography technique called polymer pen lithography (PPL) was used as a tool for the creation of lipid micropatterns over large areas via polymer-stamp-mediated transfer of lipid-containing inks onto glass substrates. In order to better understand and control the lipid transfer in PPL, we conducted a systematic study of the influence of dwell time (i.e., duration of contact between tip and sample), humidity, and printing pressure on the outcome of PPL with phospholipids and discuss results in comparison to the more often studied dip-pen nanolithography with phospholipids. This is the first systematic study in phospholipid printing with PPL. Biocompatibility of the obtained substrates with up to two different ink compositions was demonstrated. The patterns are suitable to serve as a platform for mast cell activation experiments.

Download Full-text

Preparation of Strongly Hydrophobic Film with Large Area and Flexibility Based on Micro Fabrication

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.645-646.195 ◽

2015 ◽

Vol 645-646 ◽

pp. 195-200

Author(s):

Yi Bo Zeng ◽

Ting Ting Wang ◽

Jian Yan Wang ◽

Hang Guo

Keyword(s):

Silicon Wafer ◽

Polyvinylidene Fluoride ◽

Large Scale ◽

Composite Layer ◽

Scale Production ◽

Micro Channel ◽

Large Area ◽

Micro Fabrication ◽

Chemical Grafting ◽

Micro Molding

In order to gain strongly hydrophobic film with large area and flexibility conveniently and effectively, how to prepare film with combination of technologies including micro fabrication, chemical grafting and micro molding is discussed. Firstly, micro channel arrays that the width is 5μm on the silicon wafer are prepared by micro fabrication. Then after spraying PVDF (Polyvinylidene Fluoride) lotion and pouring PDMS (Polydimethylsiloxane) glue solution onto the silicon wafer as the mould successively, the mixture need to be precured, which constructs rough structures in micro and nanoscale on the low surface energy film. Finally chemical grafting for film is carried out under the condition of O2 and 130°C so that the modification layer easy to adhesive on the boundary between PVDF and PDMS can be formed. Through the above technical routes, the strongly hydrophobic film that the general contact angle exceeds above 145o, the area is 180mm×64mm, the thickness is 0.9mm and the composite layer is firmly combined is gained. Compared to other hydrophobic materials the film is available in large area and has an advantage of flexibility. Meanwhile, the way that the film prepared by micro molding and in virtue of the silicon wafer with micro channel arrays as the mould contributes to large scale production.

Download Full-text

Large-area molecular patterning with polymer pen lithography

Nature Protocols ◽

10.1038/nprot.2013.159 ◽

2013 ◽

Vol 8 (12) ◽

pp. 2548-2560 ◽

Cited By ~ 55

Author(s):

Daniel J Eichelsdoerfer ◽

Xing Liao ◽

Maria D Cabezas ◽

William Morris ◽

Boya Radha ◽

...

Keyword(s):

Large Area ◽

Molecular Patterning ◽

Polymer Pen Lithography

Download Full-text

Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography

Nanofabrication ◽

10.1515/nanofab-2015-0002 ◽

2015 ◽

Vol 2 (1) ◽

Cited By ~ 9

Author(s):

Soma Biswas ◽

Falko Brinkmann ◽

Michael Hirtz ◽

Harald Fuchs

Keyword(s):

Quantum Dots ◽

Large Area ◽

Pattern Design ◽

Contact Printing ◽

Polymer Pen Lithography ◽

Intermediate Pattern ◽

Dip Pen Nanolithography

AbstractWe present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.

Download Full-text

Laser Direct Write micro-fabrication of large area electronics on flexible substrates

Applied Surface Science ◽

10.1016/j.apsusc.2015.10.066 ◽

2016 ◽

Vol 374 ◽

pp. 117-123 ◽

Cited By ~ 19

Author(s):

F. Zacharatos ◽

M. Makrygianni ◽

R. Geremia ◽

E. Biver ◽

D. Karnakis ◽

...

Keyword(s):

Flexible Substrates ◽

Direct Write ◽

Large Area ◽

Micro Fabrication ◽

Laser Direct Write ◽

Large Area Electronics

Download Full-text

Polymer Pen Lithography with Lipids for Large-Area Gradient Patterns

Langmuir ◽

10.1021/acs.langmuir.7b01368 ◽

2017 ◽

Vol 33 (35) ◽

pp. 8739-8748 ◽

Cited By ~ 13

Author(s):

Ravi Kumar ◽

Ainhoa Urtizberea ◽

Souvik Ghosh ◽

Uwe Bog ◽

Quinn Rainer ◽

...

Keyword(s):

Large Area ◽

Polymer Pen Lithography

Download Full-text

In situ synthesis of large-area single sub-10 nm nanoparticle arrays by polymer pen lithography

Nanoscale ◽

10.1039/c3nr05033e ◽

2014 ◽

Vol 6 (2) ◽

pp. 749-752 ◽

Cited By ~ 31

Author(s):

Jin Wu ◽

Xiaoli Zan ◽

Shaozhou Li ◽

Yayuan Liu ◽

Chenlong Cui ◽

...

Keyword(s):

In Situ Synthesis ◽

Nanoparticle Arrays ◽

Large Area ◽

Polymer Pen Lithography

Download Full-text

Convergent Beam Electron Diffraction

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100070072 ◽

1978 ◽

Vol 36 (3) ◽

pp. 304-315

Author(s):

G. Lehmpfuhl

Keyword(s):

Electron Diffraction ◽

Diffraction Pattern ◽

Crystal Surface ◽

Diffraction Spot ◽

Crystal Thickness ◽

Large Area ◽

Electron Microscopic ◽

Additional Information ◽

Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

Download Full-text

TEM Study of a Tilt Boundary in Hot-Pressed Silicon

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100097454 ◽

1981 ◽

Vol 39 ◽

pp. 160-161

Author(s):

C. B. Carter ◽

J. Rose ◽

D. G. Ast

Keyword(s):

Electron Diffraction ◽

Imaging Technique ◽

Interface Structure ◽

Large Area ◽

Weak Beam ◽

Lattice Fringe ◽

Electron Diffraction Technique ◽

Tilt Boundaries ◽

Beam Technique ◽

Twist Boundaries

The hot-pressing technique which has been successfully used to manufacture twist boundaries in silicon has now been used to form tilt boundaries in this material. In the present study, weak-beam imaging, lattice-fringe imaging and electron diffraction techniques have been combined to identify different features of the interface structure. The weak-beam technique gives an overall picture of the geometry of the boundary and in particular allows steps in the plane of the boundary which are normal to the dislocation lines to be identified. It also allows pockets of amorphous SiO2 remaining in the interface to be recognized. The lattice-fringe imaging technique allows the boundary plane parallel to the dislocation to be identified. Finally the electron diffraction technique allows the periodic structure of the boundary to be evaluated over a large area - this is particularly valuable when the dislocations are closely spaced - and can also provide information on the structural width of the interface.

Download Full-text

New type electron gun with electrostatic and electromagnetic lenses

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100107459 ◽

1978 ◽

Vol 36 (1) ◽

pp. 62-63

Author(s):

T. Ichinokawa ◽

H. Maeda

Keyword(s):

Electron Microscopy ◽

Electron Beam ◽

Optimum Condition ◽

Bias Voltage ◽

Electron Gun ◽

Charge Effect ◽

Micro Fabrication ◽

Maximum Brightness ◽

New Type ◽

The Ideal

I. IntroductionThermionic electron gun with the Wehnelt grid is popularly used in the electron microscopy and electron beam micro-fabrication. It is well known that this gun could get the ideal brightness caluculated from the Lengumier and Richardson equations under the optimum condition. However, the design and ajustment to the optimum condition is not so easy. The gun has following properties with respect to the Wehnelt bias; (1) The maximum brightness is got only in the optimum bias. (2) In the larger bias than the optimum, the brightness decreases with increasing the bias voltage on account of the space charge effect. (3) In the smaller bias than the optimum, the brightness decreases with bias voltage on account of spreading of the cross over spot due to the aberrations of the electrostatic immersion lens.In the present experiment, a new type electron gun with the electrostatic and electromagnetic lens is designed, and its properties are examined experimentally.

Download Full-text