Effects of Annealing Process on the Structural, Optical and Electrical Properties of Copper Oxide Thin Films Grown by Immersion Technique

2016 ◽  
Vol 1133 ◽  
pp. 439-443
Author(s):  
Mohd Fauzee Nurfazliana ◽  
Sharul Ashikin Kamaruddin ◽  
Nayan Nafarizal ◽  
Hashim Saim ◽  
Mohd Zainizan Sahdan
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Oxide Films ◽  
Annealing Process ◽  
Oxide Thin Films ◽  
X Ray ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Large Clusters ◽  
Small Clusters

The synthesized and characterization on the growth of copper oxide thin films on fluorine-doped tin oxide (FTO) coated glass with annealing and without annealing process has been studied by immersion techniques. Furthermore, ZnO layer has been used in order to improved the absorption spectrum of CuO films. The copper oxide films were analyzed on the morphological, structural, optical and electrical by field emission scanning electron microscopy (FESEM), X-ray diffractometer (XRD), UV-Vis spectroscopy (absorbance) and I-V characteristics instruments. The atomic force microscope (AFM) was used in order to characterize the surface imaging of copper oxide films and the thicknesses were measured using a surface profiler. The AFM studies revealed that the roughness of the CuO films increased after annealing was applied this is due to the formation of large clusters of grains from the merging of small clusters grains. The CuO films thicknesses also becomes two times higher than the CuO films without annealing process.

Nanocrystalline Solutions as Precursors to The Spray Deposition of Cdte Thin Films

1995 ◽  
Vol 382 ◽  
Author(s):  
Martin Pehnt ◽  
Douglas L. Schulz ◽  
Calvin J. Curtis ◽  
Helio R. Moutinho ◽  
Amy Swartzlander ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Grain Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Cdte Nanoparticles ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Cdte Thin Films

ABSTRACTIn this article we report the first nanoparticle-derived route to smooth, dense, phase-pure CdTe thin films. Capped CdTe nanoparticles were prepared by injection of a mixture of Cd(CH3)2, (n-C8H17)3 PTe and (n-C8H17)3P into (n-C8H17)3PO at elevated temperatures. The resultant nanoparticles 32-45 Å in diameter were characterized by x-ray diffraction, UV-Vis spectroscopy, transmission electron microscopy, thermogravimetric analysis and energy dispersive x-ray spectroscopy. CdTe thin film deposition was accomplished by dissolving CdTe nanoparticles in butanol and then spraying the solution onto SnO2-coated glass substrates at variable susceptor temperatures. Smooth and dense CdTe thin films were obtained using growth temperatures approximately 200 °C less than conventional spray pyrolysis approaches. CdTe films were characterized by x-ray diffraction, UV-Vis spectroscopy, atomic force microscopy, and Auger electron spectroscopy. An increase in crystallinity and average grain size as determined by x-ray diffraction was noted as growth temperature was increased from 240 to 300 °C. This temperature dependence of film grain size was further confirmed by atomic force microscopy with no remnant nanocrystalline morphological features detected. UV-Vis characterization of the CdTe thin films revealed a gradual decrease of the band gap (i.e., elimination of nanocrystalline CdTe phase) as the growth temperature was increased with bulk CdTe optical properties observed for films grown at 300 °C.

scholarly journals Temperature-dependent phase evolution of copper-oxide thin-films on Au(111)

2018 ◽  
Vol 20 (8) ◽  
pp. 5636-5643 ◽  
Author(s):  
Christoph Möller ◽  
Hanna Fedderwitz ◽  
Claudine Noguera ◽  
Jacek Goniakowski ◽  
Niklas Nilius
Keyword(s):  
Thin Films ◽  
Phase Transitions ◽  
Dft Calculations ◽  
Copper Oxide ◽  
Structural Phase ◽  
Oxide Films ◽  
Phase Evolution ◽  
Structural Phase Transitions ◽  
Oxide Thin Films ◽  
Temperature Dependent

STM and DFT calculations are employed to explore structural phase transitions in thin copper-oxide films grown on Au(111).

scholarly journals The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films

RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29394-29401
Author(s):  
Chandrasekaran Abinaya ◽  
Kevin Bethke ◽  
Virgil Andrei ◽  
Jonas Baumann ◽  
Beatrix Pollakowski-Herrmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Thermoelectric Properties ◽  
Oxide Films ◽  
Thermoelectric Performance ◽  
Annealing Atmosphere ◽  
Oxide Thin Films ◽  
Post Deposition Annealing ◽  
Annealing Conditions ◽  
Post Deposition

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.

Synthesis and Characterization of Nb-Doped TiO2 Thin Films Prepared by RF Magnetron Sputtering

2015 ◽  
Vol 1117 ◽  
pp. 139-142 ◽  
Author(s):  
Marius Dobromir ◽  
Radu Paul Apetrei ◽  
A.V. Rogachev ◽  
Dmitry L. Kovalenko ◽  
Dumitru Luca
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Diffraction Patterns

Amorphous Nb-doped TiO2 thin films were deposited on (100) Si and glass substrates at room temperature by RF magnetron sputtering and a mosaic-type Nb2O5-TiO2 sputtering target. To adjust the amount of the niobium dopant in the film samples, appropriate numbers of Nb2O5 pellets were placed on the circular area of the magnetron target with intensive sputtering. By adjusting the discharge conditions and the number of niobium oxide pellets, films with dopant content varying between 0 and 16.2 at.% were prepared, as demonstrated by X-ray photoelectron spectroscopy data. The X-ray diffraction patterns of the as-deposited samples showed the lack of crystalline ordering in the samples. Surfaces roughness and energy band gap values increase with dopant concentration, as showed by atomic force microscopy and UV-Vis spectroscopy measurements.

scholarly journals Synthesis, characterization, and optical properties of copper oxide thin films obtained by spray pyrolysis deposition

2019 ◽  
Vol 11 (22) ◽  
pp. 64-71
Author(s):  
Rawaa A. Faris
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Spray Pyrolysis ◽  
Average Particle Size ◽  
Average Particle ◽  
Oxide Thin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Spray Pyrolysis Deposition ◽  
Xrd Patterns

     Copper oxide thin films were synthesized by using spray pyrolysis deposition technique, in the temperature around 400°C in atmosphere from alcoholic solutions. Copper (II) chloride as precursor and glass as a substrate. The textural and structural properties of the films were characterized by atomic force microscopy (AFM), X-ray diffraction (XRD). The average particle size determined from the AFM images ranged from 30 to 90 nm and the roughness average was equal to 9.3 nm. The XRD patterns revealed the formation of a polycrystalline hexagonal CuO. The absorption and transmission spectrum, band gap, film thickness was investigated. The films were tested as an optical limiter. The experiments were performed using Q-switched Nd:YAG laser at 532nm and 1064 nm at different intensities. Copper oxide thin films appear to be attractive candidates for optical limiting application and sensor application.

EFFECT OF SUBSTRATE TEMPERATURE ON THE GROWTH OF COPPER OXIDE THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION TECHNIQUE

2018 ◽  
Vol 25 (02) ◽  
pp. 1850053 ◽  
Author(s):  
MUHAMMAD KAIF SHABBIR ◽  
SHAZIA BASHIR ◽  
QAZI SALMAN AHMED ◽  
NAZISH YASEEN ◽  
SOHAIL ABDUL JALIL ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Copper Oxide ◽  
Growth Temperature ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Oxide Thin Films ◽  
Vis Spectroscopy ◽  
Substrate Temperatures ◽  
Deposited Films

The effect of substrate temperature on growth of pulsed laser deposited copper oxide thin films has been investigated by employing Nd: YAG laser (532[Formula: see text]nm, 6[Formula: see text]ns, 10[Formula: see text]Hz) irradiation at a fluence of 8.2[Formula: see text]J/cm2. XRD analysis reveals that copper oxide films deposited at room temperature are amorphous in nature, whereas films deposited at higher substrate temperatures are polycrystalline in nature. SEM and AFM analyses revealed that films deposited at substrate temperatures, ranging from room temperature to 300[Formula: see text]C are comprised of large sized clusters, islands and particulates, whereas uniform films with an appearance of granular morphology and distinct bump formation are grown at higher substrate temperatures of 400[Formula: see text]C and 500[Formula: see text]C. The optical bandgap of deposited films is evaluated by UV-VIS spectroscopy and shows a decreasing trend with increasing substrate temperature. Four point probe analysis reveals that electrical conductivity of the deposited films increases with increase in the substrate temperature, and is maximum for highest growth temperature of 500[Formula: see text]C. It is revealed that growth temperature plays a significant role for structure, texture, optical and electrical behavior of copper oxide thin films. The surface and structural properties of the deposited films are well correlated with their electrical and optical response.

Influence of oxygen partial pressure on the metastable copper oxide thin films

2016 ◽  
Vol 30 (35) ◽  
pp. 1530012 ◽  
Author(s):  
Birol Geçici ◽  
Şadan Korkmaz ◽  
Soner Özen ◽  
Volkan Şenay ◽  
Suat Pat
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Films ◽  
High Frequency Region ◽  
Glass Substrates ◽  
Atomic Force ◽  
Diffraction Peaks ◽  
Xrd Patterns ◽  
Reactive Rf Magnetron Sputtering

Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O2) gas mixture atmospheres. Ar/O2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39[Formula: see text] and 35.49[Formula: see text], corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region.

W-Doped Vanadium Oxide Thin Films Prepared by Reactive Magnetron Sputtering

2013 ◽  
Vol 652-654 ◽  
pp. 1747-1750
Author(s):  
Shuang Chen ◽  
Li Fang Zhang ◽  
Cui Zhi Dong ◽  
Kuai Zhang ◽  
Xiudong Zhu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Vanadium Oxide Thin Films

W-doped Vanadium oxide thin films were prepared on the substrates of glass and Si (100) by reactive magnetron sputtering after annealing in vacuum. The structure and morphology were characterized by X-ray diffractometer and atomic force microscopy(AFM), respectively. The results show that,when the oxygen volume percent (Po2) increasing from 15% to 25%, the films on the Si(100) were vanadium oxides with high-valences. After vacuum annealing at 500°C for 2h, the major phase of W doped films on glass is VO2. The surface roughness of the film increase for the longer time annealing.

scholarly journals Cu 4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

2021 ◽  
Vol 67 (3 May-Jun) ◽  
pp. 495
Author(s):  
M. A. Cruz Almazán ◽  
E. Vigueras Santiago ◽  
R. López ◽  
S. Hernández López ◽  
V. Hugo Castrejón Sánchez ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Copper Oxide ◽  
Cuprous Oxide ◽  
Cupric Oxide ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
X Ray ◽  
Reactive Rf Magnetron Sputtering

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000 °C for 24 h in airatmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed by a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However,Raman measurements indicated that the Cu4O3 thin films are also composed by amorphous CuO and Cu2O.

scholarly journals Biosynthesis and Fabrication of Copper Oxide Thin Films as a P-Type Semiconductor for Solar Cell Applications

Coatings ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 1545
Author(s):  
Emeka Charles Nwanna ◽  
Patrick Ehi Imoisili ◽  
Sarah Oluwabunmi Bitire ◽  
Tien-Chien Jen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Copper Oxide ◽  
Ftir Spectroscopy ◽  
Sol Gel ◽  
Xrd Analysis ◽  
Synthetic Approach ◽  
X Ray ◽  
Vis Spectroscopy ◽  
Visible Spectra

This study aimed to synthesize copper oxide (CuO) thin films using an eco-friendly green synthetic approach. A sol-gel spin coating technique was employed for the synthesis of the CuO thin film using Allium cepa as a reducing agent. The fabricated CuO thin film was investigated using the Fourier Transform-Infrared (FTIR) spectroscopy, Ultraviolet-visible spectra studies (UV-Vis), energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD) analysis, scanning electron microscopy (SEM), and the Four-Point Probe measurement. The SEM micrographs revealed that the particles were spherically shaped, while the EDX analysis revealed that the CuO thin film was composed of copper and oxygen elements. Furthermore, the XRD analysis confirmed the monoclinic crystalline structure of the CuO thin film, while the FTIR spectroscopy investigated the chemical bonds formed during the production process. Contrarily, the UV-Vis spectroscopy reported a strong absorption of the film at the visible spectra with an estimated optical energy band gap of 1.48 eV. The electrical analysis, however, disclosed that the synthesized thin film portrayed good semiconducting behaviors.

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