Effect of Ge Nanoislands on Lateral Photoconductivity of Ge-SiOX-Si Structures

2011 ◽  
Vol 276 ◽  
pp. 179-186 ◽  
Author(s):  
V.S. Lysenko ◽  
Yu.V. Gomeniuk ◽  
Yu.N. Kozyrev ◽  
M.Yu. Rubezhanska ◽  
V.K. Skylar ◽  
...  
Keyword(s):  
Density Of States ◽  
Experimental Studies ◽  
Surface Recombination ◽  
Fundamental Absorption Edge ◽  
Surface Region ◽  
Near Surface ◽  
Surface Recombination Rate ◽  
Equilibrium Charge ◽  
Effects Of Disorder ◽  
Gap Width

The results of the experimental studies of the effect of nanoislands on the lateral photoconductivity in structures with Ge nanoislands formed on the SiOx layer using molecular beam epitaxy are reported. It is shown that nanoislands increase the surface recombination rate and affect the fundamental absorption edge of c-Si. The generation of lateral photocurrent in the range 0.8 – 1.0 eV was observed due to transitions between tails in the density of states of the near-surface c-Si, which is described by Urbach dependence. It was shown that the absorption spectrum of nanoislands is typical for the disordered Ge and is due to transitions between density-of-states tails of the valence and conductance bands. The mechanism is proposed of lateral photoconductivity involving the non-equilibrium charge carriers, generated in Ge nanoislands. It is suggested that the optical absorption and lateral photocurrent in Ge-SiOx-Si structures are affected by fluctuations of the surface potential in the near-surface region of c-Si, fluctuations of the Si band gap width and by effects of disorder in Ge nanoislands.

Double Beam Photoconductivity Modulation System and its Application to the Characterization of a Process of Photoresist Removal

1992 ◽  
Vol 259 ◽  
Author(s):  
A. Usami ◽  
H. Fujiwara ◽  
T. Nakai ◽  
K. Matsuki ◽  
T. Takeuchi ◽  
...  
Keyword(s):  
Penetration Depth ◽  
Surface Recombination ◽  
Surface Region ◽  
Surface Recombination Velocity ◽  
Carrier Injection ◽  
Near Surface ◽  
Yag Lasers ◽  
Double Beam ◽  
The Difference ◽  
Recombination Velocity

ABSTRACTA laser/microwave method using two lasers of different wavelengths for carrier injection is proposed to evaluate near surface regions. These lasers are a He-Ne (wavelength=633nm, penetration depth=∼3μm) and a YAG lasers (wavelength=1060nm, penetration depth=∼500μm). Using a microwave probe, the amount of injected excess carriers can be detected. The carrier concentration is mainly dependent on the condition of the surface when carriers are excited by the He-Ne laser. It is mainly dependent on the condition of the bulk region when carriers are excited by YAG laser. We refer to microwave intensities detected by the He-Ne and the YAG lasers as the surface-recombination-velocity-related microwave intensity (SRMI) and bulkrelated microwave intensity (BRMI), respectively. We refer to the difference between SRMI and BRMI as relative SRMI (R-SRNI), which is closely related to the condition of surface and surface active region. We evaluate the near surface regions of the samples after plasma and wet etching for removing the photoresist layer. And we evaluate the near surface regions of the samples after a heat treatment which is done to recover the damage introduced by plasma etching. It is found that the R-SRMI method is better suited to near surface region evaluation than conventional lifetime measurements.

scholarly journals Experimental studies of vortex disconnection and connection at a free surface

1996 ◽  
Vol 321 ◽  
pp. 59-86 ◽  
Author(s):  
Morteza Gharib ◽  
Alexander Weigand
Keyword(s):  
Free Surface ◽  
Vortex Ring ◽  
Experimental Studies ◽  
Local Strain ◽  
Surface Region ◽  
Vorticity Field ◽  
Core Diameter ◽  
Near Surface ◽  
Spatial And Temporal Scales ◽  
Rate Analysis

An experimental study is presented that examines the interaction of a vortex ring with a free surface. The main objective of this study is to identify the physical mechanisms that are responsible for the self-disconnection of vortex filaments in the near-surface region and the subsequent connection of disconnected vortex elements to the free surface. The understanding of those mechanisms is essential for the identification and estimation of the appropriate spatial and temporal scales of the disconnection and connection process. In this regard, the velocity and vorticity fields of an obliquely approaching laminar vortex ring with a Reynolds number of 1150 were mapped by using Digital Particle Image Velocimetry (DPIV). The evolution of the near-surface vorticity field indicates that the connection process starts in the side regions of the approaching vortex ring where surface-normal vorticity already exists in the bulk. A local strain rate analysis was conducted to support this conclusion. Disconnection in the near-surface tip region of the vortex ring occurs because of the removal of surfaceparallel vorticity by the viscous flux of vorticity through the surface. Temporal and spatial mapping of the vorticity field at the surface and in the perpendicular plane of symmetry shows that the viscous flux is balanced by a local deceleration of the flow at the surface. It is found that the observed timescales of the disconnection and connection process scale with the near-surface vorticity gradient rather than with the core diameter of the vortex ring.

The Influence of Point Defects on Two Dimensional Diffusion Kinetics

1986 ◽  
Vol 71 ◽  
Author(s):  
P.B. Griffin ◽  
J.D. Plummer
Keyword(s):  
Point Defects ◽  
Surface Recombination ◽  
Surface Region ◽  
Diffusion Profile ◽  
Two Dimensional ◽  
Recombination Rates ◽  
Near Surface ◽  
Steady State Condition ◽  
Dimensional Diffusion ◽  
Lateral Extent

AbstractThe problems associated with two-dimensional diffusion of impurities coupled with point defects are outlined. The relative importance of the generation, diffusion and surface recombination rates are examined and the implications for 2-D modelling are discussed. Experimental results for the diffusion coefficient of interstitials indicate that the point defects can have orders of magnitude faster diffusivity than dopants. For accurate 2-Dprofiles, a large simulation space is needed to solve for the defects even though the impurity diffusion of interest occurs in the near surface region. The lateral extent of the diffusion profile is determined by the surface recombination rates of the defects. Results indicate that different technologically important interfaces, such as nitride and pad oxide have different recombination rates. The time dependence of the lateral decay isexperimentally investigated and indicates a steady state condition being reached. Parameters are extracted for the 2-D process simulator SUPREM-IV and the computer simulations are compared with experiment.

Preparation of cross-sectional samples for near-surface TEM studies

1987 ◽  
Vol 45 ◽  
pp. 380-381
Author(s):  
R.C. Dickenson ◽  
K.R. Lawless
Keyword(s):  
Standard Sample ◽  
Surface Region ◽  
Specimen Preparation ◽  
Thick Sheet ◽  
Drill Bit ◽  
Sample Holder ◽  
Metal Interface ◽  
Cross Sectional ◽  
Near Surface ◽  
Cold Worked

In thermal oxidation studies, the structure of the oxide-metal interface and the near-surface region is of great importance. A technique has been developed for constructing cross-sectional samples of oxidized aluminum alloys, which reveal these regions. The specimen preparation procedure is as follows: An ultra-sonic drill is used to cut a 3mm diameter disc from a 1.0mm thick sheet of the material. The disc is mounted on a brass block with low-melting wax, and a 1.0mm hole is drilled in the disc using a #60 drill bit. The drill is positioned so that the edge of the hole is tangent to the center of the disc (Fig. 1) . The disc is removed from the mount and cleaned with acetone to remove any traces of wax. To remove the cold-worked layer from the surface of the hole, the disc is placed in a standard sample holder for a Tenupol electropolisher so that the hole is in the center of the area to be polished.

The Effects of Ion Implantation on the Surface Features of Inconel 600

1985 ◽  
Vol 43 ◽  
pp. 288-289
Author(s):  
John D. Rubio
Keyword(s):  
Grain Boundary ◽  
Ion Implantation ◽  
Nuclear Power ◽  
Power Plants ◽  
Surface Region ◽  
Selective Dissolution ◽  
Boundary Region ◽  
Near Surface ◽  
Inconel 600 ◽  
Steam Generator Tubing

The degradation of steam generator tubing at nuclear power plants has become an important problem for the electric utilities generating nuclear power. The material used for the tubing, Inconel 600, has been found to be succeptible to intergranular attack (IGA). IGA is the selective dissolution of material along its grain boundaries. The author believes that the sensitivity of Inconel 600 to IGA can be minimized by homogenizing the near-surface region using ion implantation. The collisions between the implanted ions and the atoms in the grain boundary region would displace the atoms and thus effectively smear the grain boundary.To determine the validity of this hypothesis, an Inconel 600 sample was implanted with 100kV N2+ ions to a dose of 1x1016 ions/cm2 and electrolytically etched in a 5% Nital solution at 5V for 20 seconds. The etched sample was then examined using a JEOL JSM25S scanning electron microscope.

Microstructural changes of Aluminum Nitride after laser irradiation and electroless copper deposition

1994 ◽  
Vol 52 ◽  
pp. 636-637
Author(s):  
S. Cao ◽  
A. J. Pedraza ◽  
L. F. Allard
Keyword(s):  
Aluminum Nitride ◽  
Laser Irradiation ◽  
Electroless Deposition ◽  
Thermal Evaporation ◽  
Surface Region ◽  
Near Surface ◽  
Laser Patterning ◽  
Electroless Copper ◽  
Excimer Laser Irradiation ◽  
Laser Effect

Excimer-laser irradiation strongly modifies the near-surface region of aluminum nitride (AIN) substrates. The surface acquires a distinctive metallic appearance and the electrical resistivity of the near-surface region drastically decreases after laser irradiation. These results indicate that Al forms at the surface as a result of the decomposition of the Al (which has been confirmed by XPS). A computer model that incorporates two opposing phenomena, decomposition of the AIN that leaves a metallic Al film on the surface, and thermal evaporation of the Al, demonstrated that saturation of film thickness and, hence, of electrical resistance is reached when the rate of Al evaporation equals the rate of AIN decomposition. In an electroless copper bath, Cu is only deposited in laser-irradiated areas. This laser effect has been designated laser activation for electroless deposition. Laser activation eliminates the need of seeding for nucleating the initial layer of electroless Cu. Thus, AIN metallization can be achieved by laser patterning followed by electroless deposition.

Annealing Effects at the Near-Surface Region of Gallium Arsenide

1992 ◽  
Vol 105-110 ◽  
pp. 1383-1386 ◽  
Author(s):  
Hugh E. Evans ◽  
D.L. Smith ◽  
P.C. Rice-Evans ◽  
G.A. Gledhill ◽  
A.M. Moore
Keyword(s):  
Gallium Arsenide ◽  
Surface Region ◽  
Near Surface ◽  
Annealing Effects

scholarly journals Interactions of Ruddlesden-Popper Phases and Migration-Induced Field-Stabilized Polar Phase in Strontium Titanate

Crystals ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 693
Author(s):  
Christian Ludt ◽  
Elena Ovchinnikova ◽  
Anton Kulikov ◽  
Dmitri Novikov ◽  
Sibylle Gemming ◽  
...  
Keyword(s):  
Strontium Titanate ◽  
Density Functional ◽  
Surface Region ◽  
Point Of View ◽  
Polar Phase ◽  
Near Surface ◽  
Atomic Displacements ◽  
Induced Field ◽  
And Migration ◽  
Novel Concept

This work focuses on the validation of a possible connection of the known Ruddlesden-Popper (RP) phases and the novel concept of the migration-induced field-stabilized polar (MFP) phase. To study this subject, model structures of RP phases in bulk strontium titanate are analyzed by means of density functional theory (DFT). The obtained geometries are compared to experimental MFP data. Good agreement can be found concerning atomic displacements in the pm range and lattice strain inferred by the RP phases. Looking at the energy point of view, the defect structures are on the convex hull of the Gibb’s free energy. Although the dynamics to form the discussed defect models are not addressed in detail, the interplay and stability of the described defect model will add to the possible structure scenarios within the near-surface region of strontium titanate. As a result, it can be suggested that RP phases generally favor the MFP formation.

Electronic Impact of Inclusions in Diamond

2009 ◽  
Vol 1203 ◽  
Author(s):  
Erik M. Muller ◽  
John Smedley ◽  
Balaji Raghothamachar ◽  
Mengjia Gaowei ◽  
Jeffrey W. Keister ◽  
...  
Keyword(s):  
Charge Trapping ◽  
Secondary Phase ◽  
Surface Region ◽  
Phase Region ◽  
Electron Trapping ◽  
Near Surface ◽  
X Ray ◽  
Photoconductive Gain ◽  
Single Crystal Diamond ◽  
Topography Data

AbstractX-ray topography data are compared with photodiode responsivity maps to identify potential candidates for electron trapping in high purity, single crystal diamond. X-ray topography data reveal the defects that exist in the diamond material, which are dominated by non-electrically active linear dislocations. However, many diamonds also contain defects configurations (groups of threading dislocations originating from a secondary phase region or inclusion) in the bulk of the wafer which map well to regions of photoconductive gain, indicating that these inclusions are a source of electron trapping which affect the performance of diamond X-ray detectors. It was determined that photoconductive gain is only possible with the combination of an injecting contact and charge trapping in the near surface region. Typical photoconductive gain regions are 0.2 mm across; away from these near-surface inclusions the device yields the expected diode responsivity.

scholarly journals Enhanced Diffusion of Dopants in Vacancy Supersaturation Produced by MeV Implantation

1997 ◽  
Vol 469 ◽  
Author(s):  
V. C. Venezia ◽  
T. E. Haynes ◽  
A. Agarwal ◽  
H. -J. Gossmann ◽  
D. J. Eaglesham
Keyword(s):  
Surface Layer ◽  
Surface Region ◽  
Silicon On Insulator ◽  
Rich Region ◽  
Near Surface ◽  
Enhanced Diffusion ◽  
Float Zone ◽  
Transient Enhanced Diffusion

ABSTRACTThe diffusion of Sb and B markers has been studied in vacancy supersaturations produced by MeV Si implantation in float zone (FZ) silicon and bonded etch-back silicon-on-insulator (BESOI) substrates. MeV Si implantation produces a vacancy supersaturated near-surface region and an interstitial-rich region at the projected ion range. Transient enhanced diffusion (TED) of Sb in the near surface layer was observed as a result of a 2 MeV Si+, 1×1016/cm2, implant. A 4× larger TED of Sb was observed in BESOI than in FZ silicon, demonstrating that the vacancy supersaturation persists longer in BESOI than in FZ. B markers in samples with MeV Si implant showed a factor of 10× smaller diffusion relative to markers without the MeV Si+ implant. This data demonstrates that a 2 MeV Si+ implant injects vacancies into the near surface region.

Sign in / Sign up

Export Citation Format

Share Document