Study on Nano-SiO2 Measured by Atomic Force Microscope

2011 ◽  
Vol 399-401 ◽  
pp. 2130-2133
Author(s):  
Zhang Jing ◽  
Qi Zhi Cao ◽  
Jian Ying Li

The morphology and structural evolution of nano-SiO2powers obtained by pressuring samples and sintering in muffle at different temperatures were studied by X-ray diffraction (XRD) and atomic force microscope (AFM). The experimental results show that the particle sizes of nano-SiO2increase with temperature rising, and it meets the physical mechanism of particle growth.

1998 ◽  
Vol 13 (9) ◽  
pp. 2588-2596 ◽  
Author(s):  
K. H. Ryu ◽  
J-M. Yang

The low temperature pressureless sintering of a nanosized Si3N4 powder with doped sintering additives was investigated. The microstructural evolution during sintering at different temperatures was analyzed using x-ray diffraction and scanning electron microscopy. The effect of using nanosized Si3N4 powder as a catalyst to accelerate the α→β–Si3N4 transformation of a commercial Si3N4 powder with larger particle sizes was also investigated. Finally, two stage sintering was used to study the feasibility of controlling the microstructure and the mechanical properties of the nanosized silicon nitride.


Nano LIFE ◽  
2014 ◽  
Vol 04 (04) ◽  
pp. 1441014 ◽  
Author(s):  
Qi Liu ◽  
Weiping Hao ◽  
Yongguang Yang ◽  
Aurore Richel ◽  
Canbin Ouyang ◽  
...  

Nanocrystalline celluloses (NCCs) were separated from four commercial microcrystalline celluloses (MCCs) by an acid hydrolysis–sonication treatment. Transmission electron microscopy (TEM), atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectrum, X-ray diffraction (XRD) and thermogravimetric analysis (TGA) were conducted to investigate the NCCs. MCCs with different morphologies and particle sizes showed different aggregation degrees. The aggregation of MCCs followed the order MCC1 > MCC3 > MCC2 > MCC4, which is the same order of the heights of the resulting NCCs. The best uniformity and thermal stability were characterized for NCC3, which was produced by MCC3 with smallest original particle size and good dispersity among the four MCCs. This result suggests that both the original particle size and dispersity of MCCs had significant effects on separated NCCs.


1992 ◽  
Vol 280 ◽  
Author(s):  
Rama I. Hegde ◽  
Mark A. Chonko ◽  
Philip J. Tobin

ABSTRACTThe growth and surface morphology of thin LPCVD silicon films were investigated with an atomic force microscope (AFM). Silicon films of 30 nm thicknesses were deposited on SiO2 using SiH4 at four different temperatures between 550 °C and 625 °C. These AFM results permitted visualization of silicon surface granularity, roughness, and the transition with temperature from amorphous to crystalline structure between 550 °C and 580 °C. The surface of the amorphous film deposited at 550 °C is very smooth and the film is continuous physically, while the film formed at 580 °C appears crystalline, rough and porous. At 600 °C and 625 °C the films are fully crystalline. For these higher temperature films surface roughness and the average grain size decreased significantly compared to 580 °C film. Crystallinity and film continuity were further examined by x-ray diffraction (XRD) and cross-sectional TEM measurements.


2019 ◽  
Vol 27 (2) ◽  
pp. 228-237 ◽  
Author(s):  
Rashed T. Rasheed ◽  
Sariya D. Al-Algawi ◽  
Rosul M. N.

Manganese dioxide (MnO2) nanopowder has been synthesized by hydrothermal method. MnO2 was annealed at different temperatures (250, 400, 550, 700˚C). The crystal structure and surface morphology of these nanostructures were characterized by X-ray diffraction (XRD), Atomic Force Microscope (AFM) and Scanning Electron Microscopy (SEM). The catalase mimic activity (catalytic activity) of MnO2 against hydrogen peroxide (H2O2) was studied by using the new method and found that 400˚C is the best annealing temperature.


1994 ◽  
Vol 362 ◽  
Author(s):  
J. Dille ◽  
J.-L. Delplancke ◽  
J. Charlier ◽  
R. Winand

AbstractThin copper foils (100 micrometers thick) are produced by electrolysis on anodized titanium substrates. A sharp distribution of grain diameter is observed around 200 nanometers. The X-ray diffraction pattern shows a slight preferential orientation of the crystals with the (111) planes parallel to the substrate. This X-ray diffraction pattern evolves at room temperature. After 60 days, a preferential orientation of the (200) planes parallel to the substrate is observed. This effect is associated with the recrystallisation of the foil with growth of large copper grains (diameter higher than 5 micrometers) as observed by high resolution transmission electron microscopy.The structural evolution of the copper foils is studied by electron microscopy, X-ray and electron diffractions at different temperatures.The mechanical properties of the foils are also studied as a function of time after electrodeposition.


2007 ◽  
Vol 336-338 ◽  
pp. 763-764
Author(s):  
Wei Bing Ma ◽  
Yan Xia Hao ◽  
Yuan Fang Qu ◽  
Ting Xian Xu

Samples of La(TixMn1-x)O3 (0.1 ≤ x ≤ 0.7) were sintered at different temperatures. The experimental results showed that the resistivity-temperature curves of the samples match NTC characteristic. The crystal structure was analyzed using X-ray diffraction and the microstructure was observed by scanning electron microscope.


2015 ◽  
Vol 778 ◽  
pp. 136-139
Author(s):  
Tao Bai ◽  
Shi Gen Zhu

This study prepared a Graphene/TiO2(G/TiO2) thin films by using a sol–gel method The structure and morphology of the materials were characterized using X-ray diffraction (XRD), atomic force microscope (AFM) and thermo gravimetric- differential scanning calorimeter techniques (TG/DTG).AFM images showed that the G/TiO2 film is typically amorphous hot-treated at 300°C. When the temperature was increased to 500 °C, G/TiO2 thin films are all crystalline. The XRD results showed that G/TiO2 thin films contained crystalline phase of anatase after calcining at 500°C. TG/DTG measurement showed that the change of the crystal phase did not occur in gel until to 500°C.


1992 ◽  
Vol 295 ◽  
Author(s):  
Rama I. Hegde ◽  
Mark A. Chonko ◽  
Philip J. Tobin

AbstractThe growth and surface morphology of thin LPCVD silicon films were investigated with an atomic force microscope (AFM). Silicon films of 30 nm thicknesses were deposited on SiO2 using SiH4 at four different temperatures between 550 °C and 625 °C. These AFM results permitted visualization of silicon surface granularity, roughness, and the transition with temperature from amorphous to crystalline structure between 550 °C and 580 °C. The surface of the amorphous film deposited at 550 °C is very smooth and the film is continuous physically, while the film formed at 580 °C appears crystalline, rough and porous. At 600 °C and 625 °C the films are fully crystalline. For these higher temperature films surface roughness and the average grain size decreased significantly compared to 580 °C film. Crystallinity and film continuity were further examined by x-ray diffraction (XRD) and cross-sectional TEM measurements.


2015 ◽  
Vol 22 (01) ◽  
pp. 1550011 ◽  
Author(s):  
PARTHASARATHI BERA ◽  
M. DINESH KUMAR ◽  
CHINNASAMY ANANDAN ◽  
C. SHIVAKUMARA

Ni – W alloy coatings are electrodeposited with direct and pulse current using gluconate bath at pH5. Effects of direct current (DC) and pulse current (PC) on structural characteristics of the coatings have been investigated by energy dispersive X-ray spectroscopy (EDXS), X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), differential scanning calorimetry (DSC) and X-ray photoelectron spectroscopy (XPS). EDXS shows that W contents are 13.3 and 12.6 at.% in DC and PC (10:40) Ni – W coatings, respectively. FESEM analysis exhibits the homogeneous coarse nodular morphology in DC plated deposits. DSC studies reveal that Ni – W coatings are thermally stable up to 400°C. XPS studies demonstrate that DC plated coating has significant amount of Ni and W in elemental form along with their respective oxidized species. In contrast, mainly oxidized metals are present in the as-deposited coatings prepared with PC plating. The microhardness of pulse current (100:400) deposited Ni – W coating is about 750 HK that is much higher than DC plated coating (635 HK). Heat treatment of the deposits carried out at different temperatures show a significant increase in microhardness which can be comparable with hard chromium coatings.


Sign in / Sign up

Export Citation Format

Share Document