Fabrication of Poly(diphenylsilylenemethylene) Matrix Nanocomposite Thin Films by Laser Ablation

2008 ◽  
Vol 47-50 ◽  
pp. 558-561
Author(s):  
Ren Guo Song ◽  
Fang Er Yang ◽  
Xiao Hong Weng ◽  
Wang Zhao He
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Size Distribution ◽  
Copper Nanoparticles ◽  
Ring Opening ◽  
Ring Opening Polymerization ◽  
Silicon Substrates ◽  
Air Atmosphere ◽  
Nanocomposite Thin Films ◽  
Matrix Nanocomposite

We have developed a new method to fabricate poly(diphenylsilylenemethylene) (PDPhSM) matrix nanocomposite thin films containing copper nanoparticles produced by laser ablation in this paper. First of all, 1,1,3,3-tetra- phenyl-1,3-disilacyclobutane (TPDC) films were deposited on 4 cm2 silicon substrates cut from c-Si wafers by conventional vacuum evaporation under a pressure of 3.0×10-5 Torr; then copper nanoparticles were deposited onto the TPDC films by laser ablation; finally the TPDC films with copper nanoparticles were heated in an electric furnace in an air atmosphere at 553 K for 10 min to induce ring-opening polymerization of TPDC. The results indicated that it is possible to fabricate PDPhSM matrix nanocomposite thin films using copper nanoparticles produced by laser ablation. The morphology and size distribution of copper nanoparticles can be controlled by laser ablation conditions. Also, the polymerization efficiency depends on the size and chemical state of copper nanoparticles.

Fabrication of PDPhSM matrix nanocomposite thin films by pulsed laser ablation

2010 ◽  
Vol 31 (4) ◽  
pp. 1746-1748
Author(s):  
Ren-Guo Song ◽  
Fang-Er Yang ◽  
Xiao-Hong Weng ◽  
Wang-Zhao He
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Nanocomposite Thin Films ◽  
Matrix Nanocomposite

Synthesis, Characterization and Optical Properties of PLA / P3HT Blends Thin Films

2021 ◽  
Vol 19 (5) ◽  
pp. 132-138
Author(s):  
Maan Abd-Alameer Salih ◽  
Q.S. Kareem ◽  
Mohammed Hadi Shinen
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Spin Coating ◽  
Ring Opening ◽  
Energy Gap ◽  
Ring Opening Polymerization ◽  
X Ray Diffraction ◽  
X Ray ◽  
Conductivity Increase ◽  
Ft Ir

In this exploration Poly lactic corrosive (PLA) was orchestrated the ring-opening polymerization Poly lactic corrosive (PLA) blended with poly(3-hexylthiophene) (P3HT) which prepared by solution. Blends thin films Synthesis by spin coating technique and using Tetrahydrofuran (THF) as solvent. PLA powder was 'characterized by' 'X-ray' 'diffraction', '(FT-IR)'. pure Optical properties (PLA), (PLA)/P3HT blends thin films with different percentage of P3HT (0, 1, 2, and 3) wt% were investigated using UV-VS spectroscopy The results showed that the absorption, absorption coefficient, extinction coefficient and conductivity increase with increasing the rate of deformation P3HT, The energy gap decreases with increasing deformation.

scholarly journals Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates

2003 ◽  
Vol 83 (15) ◽  
pp. 3129-3131 ◽  
Author(s):  
Nguyen Hoa Hong ◽  
Joe Sakai ◽  
W. Prellier ◽  
Awatef Hassini
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Silicon Substrates ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Co Doped

scholarly journals Integration of highly anisotropic multiferroic BaTiO3–Fe nanocomposite thin films on Si towards device applications

2020 ◽  
Vol 2 (9) ◽  
pp. 4172-4178
Author(s):  
Matias Kalaswad ◽  
Bruce Zhang ◽  
Xuejing Wang ◽  
Han Wang ◽  
Xingyao Gao ◽  
...  
Keyword(s):  
Thin Films ◽  
Power Consumption ◽  
Low Power ◽  
High Speed ◽  
Low Cost ◽  
Low Power Consumption ◽  
Silicon Substrates ◽  
Critical Step ◽  
Nanocomposite Thin Films ◽  
Device Applications

Integration of highly anisotropic multiferroic thin films on silicon substrates is a critical step towards low-cost devices, especially high-speed and low-power consumption memories.

Analysis of Corona Resistant Performance of Polyimide Matrix Nanocomposite Thin Films by PCA

2015 ◽  
Vol 12 (5) ◽  
pp. 890-893 ◽  
Author(s):  
Hai Guo ◽  
Jinghua Yin ◽  
Jingying Zhao ◽  
Yuanyuan Liu ◽  
Lei Yao ◽  
...  
Keyword(s):  
Thin Films ◽  
Nanocomposite Thin Films ◽  
Polyimide Matrix ◽  
Matrix Nanocomposite

Optical interpretation for plasmonic adjustment of nanostructured Ag-NiO thin films

2021 ◽  
Vol 35 (06) ◽  
pp. 2150093
Author(s):  
A. Stamatelatos ◽  
M. Tsarmpopoulou ◽  
A. G. Chronis ◽  
N. Kanistras ◽  
D. I. Anyfantis ◽  
...  
Keyword(s):  
Thin Films ◽  
Theoretical Calculations ◽  
Annealing Treatment ◽  
Silicon Substrates ◽  
Surface Plasmon Resonances ◽  
Corning Glass ◽  
Post Annealing ◽  
Nanocomposite Thin Films ◽  
Plasmon Resonances ◽  
Growth Properties

Ultrathin Ag and Ni/NiO films are sequentially produced on Corning glass and silicon substrates by means of magnetron sputtering. Post annealing treatment in a furnace with air at [Formula: see text]C and [Formula: see text]C may lead to the formation of Ag nanostructures in NiO environment. Some of these samples present local surface plasmon resonances (SPRs). The sequence in which each layer is deposited, as well as, the state of the structure on which the layer is deposited, appears to play a pivotal role in the optical properties of these nanostructures, which are attributed to the growth properties of the nanocomposite thin films. Ultimately, rigorous theoretical calculations have been made for comparison and discussion with the experimental results.

scholarly journals Photoexcitation in thin films deposited on silicon substrates by reactive pulsed laser ablation

2001 ◽  
Vol 3 (4) ◽  
pp. 213-216 ◽  
Author(s):  
A. Giardini Guidoni ◽  
V. Marotta ◽  
S. Orlando ◽  
G. P. Parisi
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Laser Wavelength ◽  
Physical Parameters ◽  
Silicon Substrates ◽  
Halogen Lamp ◽  
Simultaneous Exposure ◽  
Flight Mass Spectrometry

Reactive pulsed laser ablation is a very interesting method to deposit thin films of several materials and compounds such as oxides, nitrides, semiconductors and superconductors. This technique relies on photoablation of pure elements, or a mixture of materials, with simultaneous exposure to a reactive atmosphere. In the case of oxides, reactions between the laser vaporized metals and oxygen lead to the formation of intermediate complexes and finally to oxide thin films. The reactivity of the plume has been already studied by our group in other oxides and nitrides productions and ascertained by Time of Flight Mass Spectrometry measurements [1].Thin films of semiconducting oxides such asIn2O3,SnO2, and multilayers of these two compounds have been deposited by Reactive Pulsed Laser Ablation, with the aim to evaluate the behaviour of such films under variable halogen lamp illumination.Deposition of these thin films has been carried out by a frequency doubled Nd-YAG laser (wavelength = 532 nm) on Silicon (100) substrates. A comparison, among indium oxide, tin oxide, and multilayers of indium and tin oxides, has been performed. The influence of physical parameters, such as substrate temperature and oxygen pressure in the deposition chamber, has been investigated. The deposited films have been characterized by Electric Resistance measurements.

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