Structural and Optical Properties of In0.27Ga0.73N/Si (111) Film Grown Using PA-MBE Technique
2012 ◽
Vol 620
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pp. 368-372
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Keyword(s):
X Ray
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In this paper, InGaN/GaN/AlN/Si (111) structure was grown using a plasma-assisted molecular beam epitaxy (PA-MBE) technique. The structural and optical properties of grown film have been characterized using scanning electron microscopy (SEM), atomic force microscopy (AFM), high resolution X-ray diffraction (HR-XRD) and photoluminescence (PL). Indium-mole fraction has been computed to be 0.27 using XRD data and Vegards law with high grain size and low tensile strain. Room-temperature photoluminescence revealed an intense peak at 534 nm (2.3 eV) related to our sample In0.27Ga0.73N.
2012 ◽
Vol 116
(9)
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pp. 5868-5880
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2021 ◽
Vol 2114
(1)
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pp. 012012
2013 ◽
Vol 678
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pp. 131-135
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