The Influence of Thin Film Thickness on the Characteristics of Bismuth Titanate Oxide

2007 ◽  
Vol 336-338 ◽  
pp. 129-132
Author(s):  
Cheng Fu Yang ◽  
Wei Kuo Chia ◽  
Ying Chung Chen ◽  
Chien Min Cheng
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Room Temperature ◽  
Bismuth Titanate ◽  
Electrical Breakdown ◽  
Rf Magnetron Sputtering ◽  
The Other ◽  
Thin Film Thickness ◽  
Sims Analysis ◽  
Xrd Patterns

Bi4Ti3O12 thin films were deposited on Pt/Ti/Si(p-100) substrate by RF magnetron sputtering at room temperature, and crystallized in a RTA furnace at temperature of 675°C for 10 minutes. SIMS analysis identifies that bismuth content in the Bi4Ti3O12 thin film reduced slightly from the surface into a depth of approximately 200 nm. XRD patterns revealed (117) phase was dominated regardless the film thickness, and the intensity of the other peaks increased with the increase of film thickness. (200) peak became dominant when the thickness of films were greater than 680 nm. SEM observation showed that the grains were stripe plate-like, and the grain size increased with the increase of film thickness. Dielectric constant increased with the increase of film thickness, and kept around a certain value with the thickness ranging from 300 to 640 nm, then it rose again as the film thickness above 680 nm. The leakage current and electrical breakdown also strongly depended on the film thickness.

Deformation Property of Dense Oxide Coated Magnesium Alloy Surface

2021 ◽  
Vol 1016 ◽  
pp. 1591-1596
Author(s):  
Akira Watazu ◽  
Tsutomu Sonoda
Keyword(s):  
Thin Film ◽  
Magnesium Alloy ◽  
Film Thickness ◽  
Magnesium Oxide ◽  
Single Phase ◽  
Deformation Property ◽  
The Other ◽  
Oxide Thin Film ◽  
Radio Frequency Magnetron Sputtering ◽  
Thin Film Thickness

Dense oxide coated AZ 31 magnesium alloy surfaces were uniformly formed using a radio frequency magnetron sputtering method. The magnesium oxide thin film thickness was about 240 nm. XRD results of the film indicated that film of magnesium oxide single phase was deposited. The surface of the film was uniform and no crack was observed. The Vickers hardness measured by the nanoindenter was about Hv80 and Hv200 for the AZ31 substrate and the sample coated with the thin film, respectively. The dynamic hardness of the AZ31 substrate and the sample coated with the thin film were almost the same. In the curve at the time of pressurization, a step was observed in the sample coated with the thin film. On the other hand, many steps were observed in the data curve for the thin film deposited on the glass substrate.

Organic thin film thickness-dependent photocurrents polarity in graphene heterojunction phototransistor

Carbon ◽  
2021 ◽  
Vol 178 ◽  
pp. 506-514
Author(s):  
Meiyu He ◽  
Jiayue Han ◽  
Xingwei Han ◽  
Jun Gou ◽  
Ming Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Organic Thin Film ◽  
Thin Film Thickness

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

scholarly journals Optimization of Fiber Bragg Gratings Inscribed in Thin Films Deposited on D-Shaped Optical Fibers

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 4056
Author(s):  
José Javier Imas ◽  
Carlos R. Zamarreño ◽  
Ignacio del Villar ◽  
Ignacio R. Matías
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Optical Fibers ◽  
Flat Surface ◽  
Sno2 Thin Film ◽  
Thin Film Thickness ◽  
A Value ◽  
Surrounding Refractive Index ◽  
Reflected Power ◽  
Fabrication Parameters

A fiber Bragg grating patterned on a SnO2 thin film deposited on the flat surface of a D-shaped polished optical fiber is studied in this work. The fabrication parameters of this structure were optimized to achieve a trade-off among reflected power, full width half maximum (FWHM), sensitivity to the surrounding refractive index (SRI), and figure of merit (FOM). In the first place, the influence of the thin film thickness, the cladding thickness between the core and the flat surface of the D-shaped fiber (neck), and the length of the D-shaped zone over the reflected power and the FWHM were assessed. Reflected peak powers in the range from −2 dB to −10 dB can be easily achieved with FWHM below 100 pm. In the second place, the sensitivity to the SRI, the FWHM, and the FOM were analyzed for variations of the SRI in the 1.33–1.4 range, the neck, and the thin-film thickness. The best sensitivities theoretically achieved for this device are next to 40 nm/RIU, while the best FOM has a value of 114 RIU−1.

Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

2019 ◽  
Vol 682 ◽  
pp. 109-120 ◽  
Author(s):  
Wjatscheslaw Sakiew ◽  
Stefan Schrameyer ◽  
Marco Jupé ◽  
Philippe Schwerdtner ◽  
Nick Erhart ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Sputtering ◽  
Thin Film Thickness ◽  
Optical Thin Film ◽  
Beam Sputtering ◽  
Beam Parameters
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