Recent Advances in the Doping of 4H-SiC by Channeled Ion Implantation
2019 ◽
Vol 963
◽
pp. 375-381
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Keyword(s):
The effect of lattice thermal vibrations on the channeling of 100 keV Al ions in 4H-SiC is investigated. By implanting at room temperature in the direction, the depth distribution of the incident ions is shown to be about 7 times deeper than for random implantations. At higher implantation temperatures, the channeling is reduced by the lattice vibrations and, for instance, at 600 °C implantation the distribution is about 3-4 times deeper than for a RT random implantation. The results are of technological interest for further development of implantation technology for 4H-SiC device manufacturing.
2019 ◽
Vol 963
◽
pp. 382-385
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2020 ◽
Vol 23
(28)
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pp. 3206-3225
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2018 ◽
Vol 61
(9)
◽
pp. 524
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Keyword(s):