Ultra Fine Pitch RDL Development in Multi-layer eWLB (embedded Wafer Level BGA) Packages

2016 ◽  
Vol 2016 (DPC) ◽  
pp. 000809-000825
Author(s):  
Bernard Adams ◽  
Won Kyung Choi ◽  
Duk Ju Na ◽  
Andy Yong ◽  
Seung Wook Yoon ◽  
...  
Keyword(s):  
Line Width ◽  
High Performance ◽  
Process Development ◽  
Data Access ◽  
Electrical Performance ◽  
Logic Device ◽  
Wafer Level ◽  
Component Level ◽  
Wafer Level Packaging ◽  
Fine Pitch

The market for portable and mobile data access devices connected to a virtual cloud access point is exploding and driving increased functional convergence as well as increased packaging complexity and sophistication. This is creating unprecedented demand for higher input/output (I/O) density, higher bandwidths and low power consumption in smaller package sizes. There are exciting interconnect technologies in wafer level packaging such as eWLB (embedded Wafer Level Ball Grid Array), 2.5D interposers, thin PoP (Package-on-Package) and TSV (Through Silicon Via) interposer solutions to meet these needs. eWLB technologies with the ability to extend the package size beyond the area of the chip are leading the way to the next level of high density, thin packaging capability. eWLB provides a robust packaging platform supporting very dense interconnection and routing of multiple die in very reliable, low profile, low warpage 2.5D and 3D solutions. The use of these embedded eWLB packages in a side-by-side configuration to replace a stacked package configuration is critical to enable a more cost effective mobile market capability. Combining the analog or memory device with digital logic device in a semiconductor package can provide an optimum solution for achieving the best performance in thin, multiple-die integration aimed at very high performance. One of the greatest challenges facing wafer level packaging at present is the availability of routing and interconnecting high I/O fine pitch area array. RDL (redistribution layer) allows signal and supply I/O's to be redistributed to a footprint larger than the chip footprint in eWLB . Required line widths and spacing of 2/2 μm for eWLB applications support the bump pitch of less than 40um. Finer line width and spacing are critical for further design flexibility as well as electrical performance improvement. This paper highlights the rapidly moving trend towards eWLB packaging technologies with ultra fine 2/2um line width and line spacing and multi-layer RDL. A package design study, process development and optimization, and mechanical characterization will be discussed as well as test vehicle preparation. JEDEC component level reliability test results will also be presented.

Ultra Fine Pitch RDL Development in Multi-layer eWLB (embedded Wafer Level BGA) Packages

2015 ◽  
Vol 2015 (1) ◽  
pp. 000822-000826 ◽  
Author(s):  
Won Kyoung Choi ◽  
Duk Ju Na ◽  
Kyaw Oo Aung ◽  
Andy Yong ◽  
Jaesik Lee ◽  
...  
Keyword(s):  
High Performance ◽  
Process Development ◽  
Cost Effective ◽  
Access Point ◽  
Data Access ◽  
Memory Device ◽  
Logic Device ◽  
Wafer Level ◽  
Component Level ◽  
Fine Pitch

The market for portable and mobile data access devices connected to a virtual cloud access point is exploding and driving increased functional convergence as well as increased packaging complexity and sophistication. This is creating unprecedented demand for higher input/output (I/O) density, higher bandwidths and low power consumption in smaller package sizes. There are exciting interconnect technologies in wafer level packaging such as eWLB (embedded Wafer Level Ball Grid Array), 2.5D interposers, thin PoP (Package-on-Package) and TSV (Through Silicon Via) interposer solutions to meet these needs. eWLB technologies with the ability to extend the package size beyond the area of the chip are leading the way to the next level of high density, thin packaging capability. eWLB provides a robust packaging platform supporting very dense interconnection and routing of multiple die in very reliable, low profile, low warpage 2.5D and 3D solutions. The use of these embedded eWLB packages in a side-by-side configuration to replace a stacked package configuration is critical to enable a more cost effective mobile market capability. Combining the analog or memory device with digital logic device in a semiconductor package can provide an optimum solution for achieving the best performance in thin, multiple-die integration aimed at very high performance. This paper highlights the rapidly moving trend towards eWLB packaging technologies with ultra fine 2/2μm line width and line spacing and multi-layer RDL. A package design study, process development and optimization, and mechanical characterization will be discussed as well as test vehicle preparation. JEDEC component level reliability test results will also be presented.

Fine Pitch(40μm) Integration Platform for Flexible Hybrid Electronics using Fan-Out Wafer-level Packaging

2018 ◽  
Vol 2018 (1) ◽  
pp. 000064-000068
Author(s):  
Amir Hanna ◽  
Arsalan Alam ◽  
G. Ezhilarasu ◽  
Subramanian S. Iyer
Keyword(s):  
High Performance ◽  
Metal Films ◽  
Heterogeneous Integration ◽  
Wafer Level ◽  
Integration Platform ◽  
Wafer Level Packaging ◽  
Fine Pitch ◽  
Mechanical Bending

Abstract A flexible fan-out wafer-level packaging (FOWLP) process for heterogeneous integration of high performance dies in a flexible and biocompatible elastomeric package (FlexTrateTM) was used to assemble 625 dies with co-planarity and tilt <1μm, average die-shift of 3.28 μm with σ < 2.23 μm. Fine pitch interconnects (40μm pitch) were defined using a novel corrugated topography to mitigate the buckling phenomenon of metal films deposited on elastomeric substrates. Corrugated interconnects were then used to interconnect 200 dies, and then tested for cyclic mechanical bending reliability and have shown less than 7% change in resistance after bending down to 1 mm radius for 1,000 cycles.

No Flow Underfill Process Development for Fine Pitch Flip Chip Silicon to Silicon Wafer Level Integration

2010 ◽  
Vol 2010 (DPC) ◽  
pp. 000708-000735 ◽  
Author(s):  
Zhaozhi Li ◽  
John L. Evans ◽  
Paul N. Houston ◽  
Brian J. Lewis ◽  
Daniel F. Baldwin ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Process Development ◽  
Low Cost ◽  
Three Dimensional ◽  
High Yield ◽  
Process Time ◽  
Assembly Process ◽  
Wafer Level ◽  
Fine Pitch

The industry has witnessed the adoption of flip chip for its low cost, small form factor, high performance and great I/O flexibility. As the Three Dimensional (3D) packaging technology moves to the forefront, the flip chip to wafer integration, which is also a silicon to silicon assembly, is gaining more and more popularity. Most flip chip packages require underfill to overcome the CTE mismatch between the die and substrate. Although the flip chip to wafer assembly is a silicon to silicon integration, the underfill is necessary to overcome the Z-axis thermal expansion as well as the mechanical impact stresses that occur during shipping and handling. No flow underfill is of special interest for the wafer level flip chip assembly as it can dramatically reduce the process time as well as bring down the average package cost since there is a reduction in the number of process steps and the dispenser and cure oven that would be necessary for the standard capillary underfill process. Chip floating and underfill outgassing are the most problematic issues that are associated with no flow underfill applications. The chip floating is normally associated with the size/thickness of the die and volume of the underfill dispensed. The outgassing of the no flow underfill is often induced by the reflow profile used to form the solder joint. In this paper, both issues will be addressed. A very thin, fine pitch flip chip and 2x2 Wafer Level CSP tiles are used to mimic the assembly process at the wafer level. A chip floating model will be developed in this application to understand the chip floating mechanism and define the optimal no flow underfill volume needed for the process. Different reflow profiles will be studied to reduce the underfill voiding as well as improve the processing yield. The no flow assembly process developed in this paper will help the industry understand better the chip floating and voiding issues regarding the no flow underfill applications. A stable, high yield, fine pitch flip chip no flow underfill assembly process that will be developed will be a very promising wafer level assembly technique in terms of reducing the assembly cost and improving the throughput.

300mm Scaling of Critical Silicon Etches for Image Sensor Wafer-Level Packaging Based on Tessera's MVP (TSV) Technology

2011 ◽  
Vol 2011 (DPC) ◽  
pp. 002254-002271
Author(s):  
Dave Thomas ◽  
Matthew Muggeridge ◽  
Mike Steel ◽  
Dorleta Cortaberria Sanz ◽  
Hefin Griffiths ◽  
...  
Keyword(s):  
High Performance ◽  
Form Factors ◽  
Image Sensor ◽  
Electrical Performance ◽  
Depth Range ◽  
Back Side ◽  
Wafer Level ◽  
Wafer Level Packaging ◽  
Profile Control ◽  
Bond Pads

Miniature, high performance camera modules are found in a range of consumer devices including phones, PDAs, cameras and gaming consoles. According to Gartner the $1B image sensor market will grow to $2.3B by 2013. Image sensor packaging technologies are increasingly required to deliver greater reliability within smaller form factors. Tessera's OptiML™ Micro Via Pad (MVP) wafer-level packaging technology is in production on 200mm wafers. This paper will report on the first joint activity that scales this technology to 300mm. We focus on three critical silicon etches that form the back-bone of the structure. These etches are carried out from the wafer back-side while bonded to a glass carrier. First there is a blanket dry etch. This removes stress introduced by the back-grind. Uniformity control to < ±5% is essential for this process. Second, after a lithography step, tapered silicon trenches are etched forming streets to a certain depth. The trench etch uniformity is critical because it defines the depth range for the subsequent Vias. Profile control is needed to ease the subsequent spray-coat lithography. Lastly, vias are then etched down to metal bond pads on the device side of the wafer. CD and taper control is required here both within wafer and between wafers. End-pointing represents a way of ensuring process reproducibility. In 2010 Tessera carried out 300mm demos with key suppliers. As part of this activity SPTS scaled the above critical silicon etches. The wafers were further processed into functional die. We will describe the etch equipment used, report on the critical processes developed emphasizing the relationships between 200mm and 300mm results and the essential control parameters. We will also demonstrate successful scaling by including data on the electrical performance of packaged devices.

Pre-Applied Underfill (PAUF) for Fine Pitch Flip Chip 3D Chip Stacking

2012 ◽  
Vol 2012 (DPC) ◽  
pp. 001432-001451
Author(s):  
Anupam Choubey ◽  
E. Anzures ◽  
A. Dhoble ◽  
D. Fleming ◽  
M. Gallagher ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Fatigue Testing ◽  
Electrical Performance ◽  
Process Time ◽  
Wafer Level ◽  
Fine Pitch ◽  
Semiconductor Packages ◽  
Reliability Performance ◽  
3D Chip Stacking

Current demands of the industry on performance and cost has triggered the electronics industry to use high I/O counts semiconductor packages. Copper pillar technology has been widely adopted for introducing high I/O counts in Flip Chip and 3D Chip Stacking. With the introduction of flipchip technology new avenues have been generated involving 3D chip stacking to expand the need for high performance. With the increase in the demand for high density, copper pillar technology is being adopted in the industry to address the fine pitch requirements in addition to providing enhanced thermal and electrical performance. For this study, Copper pillars and SnAg were electrolytically deposited using Dow's electroplating chemistry on internally developed test structures. After plating, wafers were diced and bonded using thermocompression bonding techniques. Copper pillar technology has been enabled to pass reliability requirements by using Underfill materials during the bonding. Underfill materials assist in redistributing the stress generated during reliability such as thermal fatigue testing. Out of the several Underfill technologies available, we have focused on pre-applied or wafer level underfill materials with 60% silica filler for this study. In the pre-applied underfill process the underfill is applied prior to bonding by coating directly on the whole wafer. Pre-applied underfill reduces the underfill dispense process time by being present prior to bonding. In this study, we have demonstrated the application of wafer level underfill for fine pitch bonding of internally developed test vehicles with SnAg-capped copper pillars with 25 μm diameter and 50 μm bump pitch. This paper demonstrates bonding alignment for fine pitch assembly with wafer level underfill to achieve 100% good solder joins after bonding. Wafer level underfill has been demonstrated successfully to bond and pass JEDEC level 3 preconditioning and standard TCT, HTS and HAST reliability tests. This paper also discusses defect mechanisms which have been found to optimize the bonding process and reliability performance. Alan/Rey ok move from Flip Chip and Wafer Level Packaging 1-6-12.

Advanced Wafer Level Packaging of RF-MEMS with RDL Inductor

2016 ◽  
Vol 2016 (1) ◽  
pp. 000185-000189 ◽  
Author(s):  
Paul Castillou ◽  
Roberto Gaddi ◽  
Rob van Kampen ◽  
Yaojian Lin ◽  
Babak Jamshidi ◽  
...  
Keyword(s):  
Rf Mems ◽  
Data Access ◽  
Silicon On Insulator ◽  
Electrical Performance ◽  
Battery Life ◽  
Wafer Level ◽  
Integrated Inductor ◽  
Wafer Level Packaging ◽  
Mems Technology ◽  
Rf Performance

Abstract The market for portable and mobile data access devices that are wirelessly connected to the cloud anytime and anywhere is exploding. The trend to access any network from anywhere is driving increased functional convergence in the radio, which translates into increased packaging complexity and sophistication. This is creating unprecedented demand for RF components providing more integration- in smaller package sizes. There are exciting interconnect technologies in wafer level packaging such as wafer level chip scale packaging (WLCSP) or fan-out wafer level packaging (FO-WLP) solutions such as embedded Wafer Level Ball Grid Array (eWLB) to meet these needs. One of the most promising solutions to enable the required RF performance levels in mobile and wearable devices is the use of RF MEMS Tuners. Mobile original equipment manufacturers (OEMs) are rapidly adopting antenna tuning solutions to be able to provide the required signal strength across the large number of LTE spectrum bands used globally. With RF MEMS technology now maturing, the biggest challenge to address the fast growing opportunity was to find a suitable packaging technology that can deliver RF MEMS tuners in the smallest possible form factor, while maintaining the excellent performance characteristics of the RF MEMS technology. After careful analysis, an eWLB/FO-WLP package was adopted and released to volume production in 2015. The commercial eWLB/FO-WLP RF MEMS tuners outperform traditional RF silicon-on-insulator (SOI) switch-based antenna tuning solutions, resulting in much higher data rates (up to 2×) and improved battery life (up to 40%). Redistribution layers (RDL) in eWLB are utilized for higher electrical performance and complex routing to meet electrical requirements. The ability to utilize embedded passives in a multi-layer eWLB structure provides a number of advantages including cost reduction, footprint reduction and increased reliability. Inductors in eWLB offer significantly better performance compared to inductors in standard on-chip technologies. In this paper, we examine the WLCSP and eWLB packaging assembly flow, solutions to RF design challenges as well as characterization of RF performance. Further improvement of the quality factor of the integrated inductor and capacitors by using low-loss thin-film dielectrics and molding compound in eWLB will be reported as well. Package level reliability test results will also be presented in this paper.

Innovative Integration Solutions for SiP Packages Using Fan-Out Wafer Level eWLB Technology

2017 ◽  
Vol 2017 (1) ◽  
pp. 000263-000269 ◽  
Author(s):  
Jacinta Aman Lim ◽  
Vinayak Pandey
Keyword(s):  
Form Factor ◽  
Line Width ◽  
Graphics Processing Units ◽  
Power Efficiency ◽  
Building Blocks ◽  
Electrical Performance ◽  
Rf Power Amplifiers ◽  
Wafer Level ◽  
Central Processing ◽  
Wafer Level Packaging

Abstract Fan-Out Wafer Level Packaging (FOWLP) has been established as one of the most versatile packaging technologies in the recent past and already accounts for a market value of over 1 billion USD due to its unique advantages. The technology combines high performance, increased functionality with a high potential for heterogeneous integration and reduced overall form factor as well as cost effectiveness. The increasing complexities in achieving a higher degree of performance, bandwidth and better power efficiency in various markets are pushing the boundaries of emerging packaging technologies to smaller form factor packaging designs with finer line/width spacing as well as improved thermal/electrical performance and the integration of System-in-Package (SiP) or 3D capabilities. SiP technology has been evolving through utilization of various package technology building blocks to serve the market needs with respect to miniaturization, higher integration, and smaller form factor as cited above, with the added benefits of lower cost and faster time to market as compared to silicon (Si) level integration, which is commonly called system-on-chip or SoC. As such, SiP incorporates flip chip (FC), wire bond (WB), and fan-out wafer-level packaging (FOWLP) as its technology building blocks and serves various end applications ranging from radio frequency (RF), power amplifiers (PA), Micro-Electro-Mechanical-Systems (MEMS) and Sensors, and connectivity, to more advanced application processors (AP), and other logic devices such as graphics processing units (GPUs)/central processing units (CPUs). FOWLP, also referred to as advanced embedded Wafer Level Ball Grid Array (eWLB) technology, provides a versatile platform for the semiconductor industry's technology evolution from single or multi-die 2D package designs to 2.5D interposers and 3D SiP configurations. This paper presents developments in SiP applications with eWLB/Fan-out WLP technology, integration of various functional blocks such as wire bonding, Package-on-Package (PoP), 2.5D, 3D, smaller form factor, embedded passives, multiple redistribution layer routing and z-height reduction. Test vehicles have been designed and fabricated to demonstrate and characterize these low profile and integrated packaging solutions for mobile products including Internet of Things (IoT)/wearable electronics (WE), MEMS and sensors. Finer line/width spacing of 2/2mm with multiple redistribution layers (RDL) are fabricated and implemented on the eWLB platform to enable higher interconnect density and signal routing. Assembly process details, component level reliability, board level reliability and characterization results for eWLB SiP will be discussed.

Assembly Process Development for Fine Pitch Flip Chip Silicon-to-Silicon 3D Wafer Level Integration with No Flow Underfill

2010 ◽  
Vol 7 (3) ◽  
pp. 146-151 ◽  
Author(s):  
Zhaozhi Li ◽  
Sangil Lee ◽  
Brian J. Lewis ◽  
Paul N. Houston ◽  
Daniel F. Baldwin ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Process Development ◽  
Low Cost ◽  
Three Dimensional ◽  
Process Time ◽  
Wafer Level ◽  
Fine Pitch ◽  
3D Packaging ◽  
Small Form Factor

The industry has witnessed the adoption of the flip chip for its low cost, small form factor, high performance, and great I/O flexibility. As three-dimensional (3D) packaging technology moves to the forefront, the flip chip to wafer integration, which is also a silicon-to-silicon assembly, is gaining more and more popularity. No flow underfill is of special interest for the wafer level flip chip assembly, as it can dramatically reduce the process time and the cost per package, due to the reduction in the number of process steps as well as the dispenser and cure oven that would otherwise be necessary for the standard capillary underfill process. This paper introduces the development of a no flow underfill process for a sub-100 micron pitch flip chip to CSP wafer level assembly. Challenges addressed include the no flow underfill reflow profile study, underfill dispense amount study, chip floating control, underfill voiding reduction, and yield improvement. Also, different no flow underfill candidates were investigated to determine the best performing processing material.

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