Effects of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RE Magnetron Sputtering

2004 ◽  
Vol 41 (2) ◽  
pp. 106-110 ◽  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Crystallographic Orientation ◽  
Oxygen Flow ◽  
Flow Ratio

The Structure and Magnetic Properties of NiZn-Ferrite Films Deposited by Magnetron Sputtering at Room Temperature

2013 ◽  
Vol 690-693 ◽  
pp. 1702-1706 ◽  
Author(s):  
Shuang Jun Nie ◽  
Hao Geng ◽  
Jun Bao Wang ◽  
Lai Sen Wang ◽  
Zhen Wei Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Saturation Magnetization ◽  
Room Temperature ◽  
Oxygen Flow ◽  
Flow Ratio ◽  
Study Results ◽  
Ferrite Thin Films ◽  
Ferrite Films

NiZn-ferrite thin films were deposited onto silicon and glass substrates by radio frequency magnetron sputtering at room temperature. The effects of the relative oxygen flow ratio on the structure and magnetic properties of the thin films were investigated. The study results reveal that the films deposited under higher relative oxygen flow ratio show a better crystallinity. Static magnetic measurement results indicated that the saturation magnetization of the films was greatly affected by the crystallinity, grain dimension, and cation distribution in the NiZn-ferrite films. The NiZn-ferrite thin films with a maximum saturation magnetization of 151 emucm-3, which is about 40% of the bulk NiZn ferrite, was obtained under relative oxygen flow ratio of 60%.

PROPERTIES OF Ta2O5 THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

2009 ◽  
Vol 23 (27) ◽  
pp. 5275-5282 ◽  
Author(s):  
JICHENG ZHOU ◽  
DITIAN LUO ◽  
YOUZHEN LI ◽  
ZHENG LIU
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface Characteristics ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Root Mean Square Roughness ◽  
Reactive Magnetron ◽  
Flow Ratio ◽  
Dc Reactive Magnetron Sputtering ◽  
Xrd Patterns

Ta 2 O 5 thin films were deposited at different oxygen flow ratio ( O 2/( O 2+Ar) = 10 ~ 80%) by DC reactive magnetron sputtering. Influence of oxygen flow ratio on depositing rate, surface characteristics, microstructure, and optical properties are discussed in this paper. With the increasing of oxygen, deposition rate decreases exponentially, the root mean square roughness and the maximum roughness decrease according to the atom force microscope images. XRD patterns indicate the as-deposited Ta 2 O 5 films are amorphous. Based on the envelop method, the samples' optical constants are calculated from the curve of transmission spectrum. The results indicate that refractive index n increases from 2.01 to 2.20 (λ = 500 nm ) for the oxygen flow ratio increases from 20% to 60%, the extinction coefficient k appears to decrease.

Influence of Oxygen Flow Ratio on Properties of Zn2SnO4Thin Films Deposited by RF Magnetron Sputtering

2004 ◽  
Vol 44 (1) ◽  
pp. L34-L37 ◽  
Author(s):  
Kazuo Satoh ◽  
Yoshiharu Kakehi ◽  
Akio Okamoto ◽  
Shuichi Murakami ◽  
Fumihiro Uratani ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Oxygen Flow ◽  
Flow Ratio

Effect of Oxygen Flow Rate and Post Annealing on Vanadium Oxide Thin Films Prepared by DC Pulse Magnetron Sputtering

2016 ◽  
Vol 675-676 ◽  
pp. 233-236 ◽  
Author(s):  
Wantanee Hincheeranun ◽  
Montri Aiempanakit ◽  
Kamon Aiempanakit ◽  
Mati Horprathum ◽  
Viyapon Patthanasetakul ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Optical Transmission ◽  
Film Surface ◽  
Film Deposition ◽  
Oxygen Flow ◽  
Ambient Conditions ◽  
Flow Rates ◽  
Air Atmosphere ◽  
Post Annealing

In this work, we investigated V2O5 thin films prepared by a DC pulse reactive magnetron sputtering at ambient conditions. The effects of oxygen flow rates during the film deposition and post annealing in air atmosphere were explored. The V2O5 thin films were sputtered from vanadium target onto silicon wafer and glass slide substrates at room temperature. The as-deposited V2O5 thin films were annealed at 200°C under air atmosphere. The films were then examined for their crystallinity, physical microstructures, and optical transmission. The crystallinity and morphology of the films were investigated by grazing incident x-ray diffraction, atomic force microscopy, and field-emission scanning electron microscopy. The optical transmission was determined by UV-Vis Spectrophotometer. The results showed that the as-deposited films were amorphous, whereas the post annealed films indicated V2O5 phase in all samples. The increase in the oxygen flow rates during the deposition led to the decrease in the deposition rate, film thickness, and film surface roughness. In addition, the oxygen flow can increase the average transmission of the V2O5 thin films. The effects of the annealing treatment of the optical transmission spectra will be discussed.

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